JP5697992B2 - ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 - Google Patents

ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 Download PDF

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Publication number
JP5697992B2
JP5697992B2 JP2010544653A JP2010544653A JP5697992B2 JP 5697992 B2 JP5697992 B2 JP 5697992B2 JP 2010544653 A JP2010544653 A JP 2010544653A JP 2010544653 A JP2010544653 A JP 2010544653A JP 5697992 B2 JP5697992 B2 JP 5697992B2
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alkyl
phenyl
composition
substituted
compound
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Japanese (ja)
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JP2011514393A5 (OSRAM
JP2011514393A (ja
Inventor
ステュデ カティア
ステュデ カティア
ディートリカー クルト
ディートリカー クルト
ユング トゥンヤ
ユング トゥンヤ
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BASF SE
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BASF SE
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dental Preparations (AREA)
  • Polymerization Catalysts (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2010544653A 2008-01-28 2009-01-06 ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 Expired - Fee Related JP5697992B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08150721.2 2008-01-28
EP08150721 2008-01-28
PCT/EP2009/050066 WO2009095282A2 (en) 2008-01-28 2009-01-06 Photolatent amidine bases for redox curing of radically curable formulations

Publications (3)

Publication Number Publication Date
JP2011514393A JP2011514393A (ja) 2011-05-06
JP2011514393A5 JP2011514393A5 (OSRAM) 2013-03-14
JP5697992B2 true JP5697992B2 (ja) 2015-04-08

Family

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Family Applications (1)

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JP2010544653A Expired - Fee Related JP5697992B2 (ja) 2008-01-28 2009-01-06 ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基

Country Status (5)

Country Link
US (1) US20110190412A1 (OSRAM)
EP (1) EP2238178B1 (OSRAM)
JP (1) JP5697992B2 (OSRAM)
CN (1) CN101925616A (OSRAM)
WO (1) WO2009095282A2 (OSRAM)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5809780B2 (ja) * 2010-04-02 2015-11-11 Dicグラフィックス株式会社 紫外線硬化性コーティングニス
TWI572690B (zh) * 2011-09-14 2017-03-01 Denka Company Ltd The composition and the temporary fixation of the components using it
EP2882808B1 (de) * 2012-08-09 2016-10-12 Basf Se Strahlungshärtbare formulierungen mit hoher haftung
JP5725515B2 (ja) * 2012-11-15 2015-05-27 学校法人東京理科大学 光塩基発生剤及び当該光塩基発生剤を含有する感光性樹脂組成物
US9650526B2 (en) * 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
KR20170068475A (ko) * 2014-10-06 2017-06-19 다우 글로벌 테크놀로지스 엘엘씨 금속 무함유 광제어 조절 라디칼 중합을 달성하기 위한 유기 광산화환원 촉매의 사용
FR3030526B1 (fr) * 2014-12-18 2018-06-15 Arkema France Polymerisation radicalaire d'alcoxyamines a basse temperature
EP3288999B1 (en) 2015-04-29 2020-08-12 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
WO2018085190A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
WO2018085550A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Method of applying a sealant to an aircraft component
WO2018085534A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
JP6873417B2 (ja) * 2016-11-10 2021-05-19 学校法人東京理科大学 光反応性組成物
JP7109438B2 (ja) * 2016-12-05 2022-07-29 アーケマ・インコーポレイテッド 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む3dプリンティングに有用な光硬化性組成物
WO2018160667A1 (en) * 2017-02-28 2018-09-07 Basf Se Curable sealant composition
WO2018160691A1 (en) * 2017-02-28 2018-09-07 Basf Se Curable sealant composition
GB2567242B (en) * 2017-10-09 2021-08-11 Henkel IP & Holding GmbH Anaerobically curable compositions comprising 1, 2, 3, 4-tetrahydro benzo(h)quinolin-3-ol or derivatives thereof
CN112752803A (zh) 2018-09-27 2021-05-04 3M创新有限公司 包含氨基官能硅烷的组合物以及将密封剂施用到基材的方法
CN111040644A (zh) * 2018-10-15 2020-04-21 烟台德邦科技有限公司 一种可光催化聚合的丙烯酸酯结构胶
WO2020153269A1 (ja) * 2019-01-21 2020-07-30 三井化学株式会社 光重合開始剤、光硬化性組成物、硬化物、及び、歯科材料
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
WO2023167201A1 (ja) * 2022-03-02 2023-09-07 株式会社カネカ 活性エネルギー線硬化性組成物、及び硬化物の製造方法
KR20250169219A (ko) * 2023-03-30 2025-12-02 닛토 신코 가부시키가이샤 코팅용 경화성 조성물, 및 그의 경화물
TWI885621B (zh) * 2023-11-30 2025-06-01 國家中山科學研究院 乙烯基酯樹脂之固化方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018266A (en) * 1960-07-29 1962-01-23 American Cyanamid Co Polymerizable elastomer-vinyl aromatic compound composition containing a catalyst promoter system and method of polymerizing same
DE3612442A1 (de) * 1986-04-12 1987-10-22 Bayer Ag Verfahren zur herstellung von uv-gehaerteten deckend pigmentierten beschichtungen
JPH1149835A (ja) * 1997-08-05 1999-02-23 Showa Highpolymer Co Ltd コンクリート構築物用プライマー組成物及びその硬化方法
EP0898202B1 (en) * 1997-08-22 2000-07-19 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones
TW436491B (en) * 1997-08-22 2001-05-28 Ciba Sc Holding Ag Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions
AU6032501A (en) * 2000-05-26 2001-12-11 Akzo Nobel Nv Photoactivatable coating composition
ATE360629T1 (de) * 2001-10-17 2007-05-15 Ciba Sc Holding Ag Photoaktivierbare stickstoffbasen
US6664357B1 (en) * 2003-01-21 2003-12-16 National Starch And Chemical Investment Holding Corporation Method for the preparation of a stable anaerobic/UV/visible light curable adhesive
JP2008506826A (ja) * 2004-07-21 2008-03-06 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 光活性化方法及び逆転した2段階工程による触媒の使用
DE102005010327A1 (de) * 2005-03-03 2006-09-07 Basf Ag Ratikalisch härtbare Beschichtungsmassen
JP4967276B2 (ja) * 2005-08-09 2012-07-04 日立化成工業株式会社 回路接続材料並びに回路端子の接続構造体及び接続方法
CN101522745B (zh) * 2006-09-29 2013-06-19 西巴控股有限公司 以封闭异氰酸酯为基础的体系的光潜碱

Also Published As

Publication number Publication date
US20110190412A1 (en) 2011-08-04
WO2009095282A3 (en) 2009-11-12
JP2011514393A (ja) 2011-05-06
CN101925616A (zh) 2010-12-22
EP2238178A2 (en) 2010-10-13
EP2238178B1 (en) 2014-09-10
WO2009095282A4 (en) 2010-01-14
WO2009095282A2 (en) 2009-08-06

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