JP2011513176A - 透過性材料、透過性材料でできた物品、および製造方法 - Google Patents
透過性材料、透過性材料でできた物品、および製造方法 Download PDFInfo
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Abstract
Description
1モルのリチウム・フルオロヘクトライト[Li(Mg2Li)Si4O10F2)]またはリチウム・ヒドロキシヘクトライト[Li(Mg2Li)Si4O10(OH)2)](またはそれらの混合物、リチウム(フルオロ/ヒドロキシ)ヘクトライト[Li(Mg2Li)Si4O10(OH)F)]の固溶体を含む)と、1.5〜4モルの活性化カオリンを含む、水性のゲル状のスラリー(以後「スラリー」ともいう)またはゲルを形成し、
スラリーまたはゲルが、押出成形または他の方法で成形されて「未焼成」体を形成するように含水量を調整することにより、ゲル状のスラリーの濃さを調整し、
前記「未焼成」体を1000℃〜1250℃の温度で1〜100時間焼成して、セラミック物品を形成し、
前記セラミック物品を冷却する、
各工程を有してなる。さらなる実施の形態では、焼成温度および時間は、1100℃〜1200℃で40〜60時間である。別の実施の形態では、本方法は、水性スラリー中、リチウム・フルオロヘクトライト(および/またはヒドロキシヘクトライト)にカオリンを加えた全重量に基づいて、最大20重量%の過剰のSiO2の添加を含む。さらなる実施の形態では、過剰のSiO2は、リチウム・フルオロヘクトライト(および/またはヒドロキシヘクトライト)にカオリンを加えた全重量の最大10%の量で加えられる(ヘクトライト材料およびカオリンは、本明細書では集合的に「無機物」とも称される)。未焼成体は、焼成の前に、乾燥して過剰の水分を除去することもできる。乾燥は、通常は電気的に行われ、典型的には350〜500℃の温度で5〜30分間、行われる。乾燥は、未焼成体を「固める」助けとなり、したがって、焼成サイクルの間のたるみは、殆どまたは全くない。別の実施の形態では、ハニカム40%を超える全孔隙率を有する。さらなる実施の形態では、ハニカムは50%を超える全孔隙率を有する。本発明の方法は、孔隙形成添加剤の使用を必要とせずに、比較的高い孔隙率を達成するという利点を有する。
リチウム・フルオロヘクトライト[Li(Mg2Li)Si4O10F2)]またはリチウム・ヒドロキシヘクトライト[Li(Mg2Li)Si4O10(OH)2)]または(フルオロ/ヒドロキシ)ヘクトライトLi(Mg2Li)Si4O10(OH)F)]およびそれらの混合物と、活性化カオリンを、1:1.5〜1:4のモル比でそれぞれ含む、水性のゲル状スラリーまたはゲルを形成し、
スラリーが押出成形されて「未焼成」体を形成することができるように、含水量の調整によってゲル状のスラリーまたはゲルの濃さを調節し、
前記「未焼成」体を1100℃〜1200℃の温度で40〜50時間焼成してセラミック物品を形成し、
前記セラミック物品を冷却する、
各工程を有してなる。別の実施の形態では、本方法は、水性スラリーまたはゲルにおけるリチウム・フルオロヘクトライト(またはヒドロキシヘクトライト)にカオリンを加えた全重量に基づいて、最大20重量%の過剰のSiO2を添加する工程を含む。さらなる実施の形態では、過剰のSiO2を、リチウム・フルオロヘクトライト(またはヒドロキシヘクトライト)にカオリン(無機物)を加えた全重量の最大10%の量で加える。未焼成体は、焼成の前に乾燥させて過剰の水分を除去することもできる。乾燥は、通常、電気的に行われるか、または誘導加熱によって行われるが、典型的には350〜500℃の温度で5〜30分間行われる。乾燥は、未焼成体を「固める」助けとなり、したがって焼成サイクルの間のたるみは殆どまたは全くない。本発明の方法は、孔隙形成添加剤の使用を必要とせずに、比較的高い孔隙率を達成するという利点を有する。
活性化カオリンおよび、リチウム・フルオロヘクトライト、リチウム・ヒドロキシヘクトライトおよびリチウム(フルオロ/ヒドロキシ)ヘクトライトならびにそれらの混合物からなる群より選択される材料を含む、ゲル状のスラリーまたはゲルを形成し、
前記スラリーまたはゲルから未焼成体を形成し、
前記未焼成体を乾燥し、
前記未焼成体を焼成してコージエライトおよびβ−スポジュミンを含む組成物を有するハニカムを形成する、
各工程を有してなる方法を対象とする。未焼成体を焼成する前に、随意的に、無機物の全重量に基づいて、最大20重量%の追加のシリカを組成物に加えてもよい。好ましい実施の形態では、最大10重量%の追加のシリカを添加する。本方法は、全孔隙率が30%を超える、好ましくは40%を超える、さらに好ましくは50%を超える物品を生産する。物品は5μm未満の平均孔隙径を有する。
最初の組成物は、モル単位に基づいて、3モルの活性化カオリンに対し、およそ1モルのフルオロヘクトライトであった。押出成形、焼成などの後、X線回折は、コージエライトおよびβ−スポジュミンに加えて、多少のスピネル(<10重量%、典型的には<5%)、MgAl2O4の存在を明らかにした。焼成体におけるスピネルの量は、過剰のシリカを組成物に加えることによって調節することができる。例えば、スピネルの代わりにコージエライトを生じる反応を助けるため、追加のシリカを、100%(組成物の全重量)の5および10%過剰量で組成物に加えた。上記式における例では、出発材料の全重量は1039.3gである。5%の追加のSiO2では、52gの追加のSiO2が添加されるであろう。得られた材料は低減したスピネル含量を有し、選択された特性について評価した。追加のSiO2は、最終製品内のスピネル相の形成を阻害する、および/または最終製品内のスピネル相の量を低減するために加えられる。追加のシリカは、粉末(例えば限定はしないが、Cabot Corporation社製のCab−O−Sil(商標))または「スラリー」または「懸濁液」(例えば限定はしないが、Grace Chemical社製のLudox(商標))として加えることができる。
過剰のSiO2なし:CTE(22〜1000℃)=19.4×10-7/℃;
5%過剰のSiO2:CTE(22〜1000℃)=10.1×10-7/℃;および
10%過剰のSiO2:CTE(22〜1000℃)=10.7×10-7/℃。
過剰のSiO2なし:47.7%のPVおよび3.1μmのMPD;
5%過剰のSiO2:55.2%のPVおよび3.6μmのMPD;および
10%過剰のSiO2:58.3%のPVおよび1.78μmのMPD。
Claims (4)
- 30%を超える全孔隙率および5μm未満の平均孔径を有する、コージエライトおよびβ−スポジュミンを含むハニカム。
- 前記孔隙率が50%を超えることを特徴とする請求項1記載のハニカム。
- 前記ハニカムが、22〜1000℃の温度範囲にわたり、15×10-7/℃未満のCTEを有することを特徴とする請求項1記載のハニカム。
- 前記ハニカムが、22〜1000℃の温度範囲にわたり、15×10-7/℃未満のCTEを有することを特徴とする請求項2記載のハニカム。
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Application Number | Priority Date | Filing Date | Title |
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US6768608P | 2008-02-29 | 2008-02-29 | |
PCT/US2009/001211 WO2009108330A1 (en) | 2008-02-29 | 2009-02-26 | Permeable material, articles made therefrom and method of manufacture |
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JP2011513176A true JP2011513176A (ja) | 2011-04-28 |
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JP2010548718A Pending JP2011513176A (ja) | 2008-02-29 | 2009-02-26 | 透過性材料、透過性材料でできた物品、および製造方法 |
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Country | Link |
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US (2) | US8425830B2 (ja) |
EP (1) | EP2262747B1 (ja) |
JP (1) | JP2011513176A (ja) |
CN (1) | CN102007087A (ja) |
WO (1) | WO2009108330A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013180231A1 (ja) | 2012-06-01 | 2013-12-05 | 凸版印刷株式会社 | 異方性反射表示体、並びに異方性反射表示体を用いた情報記録体 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011066148A2 (en) | 2009-11-30 | 2011-06-03 | Corning Incorporated | Beta-spodumene-cordierite composition, article, and method |
US8609032B2 (en) * | 2010-11-29 | 2013-12-17 | Corning Incorporated | Porous ceramic honeycomb articles and methods for making the same |
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JPS55142539A (en) * | 1979-03-26 | 1980-11-07 | Corning Glass Works | Inorganic gel and its preparation* and inorganic paper* film* fiber* board and coating manufactured from said inorganic gel and these preparation |
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JPH01298078A (ja) * | 1988-05-26 | 1989-12-01 | Matsushita Electric Ind Co Ltd | セラミック多孔体 |
JP2008543701A (ja) * | 2005-05-09 | 2008-12-04 | コーニング インコーポレイテッド | ジオポリマー複合体およびそれから形成された構造体 |
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US3881944A (en) * | 1972-12-11 | 1975-05-06 | Corning Glass Works | Porous glass-ceramic bodies for catalyst supports |
US4442175A (en) * | 1983-01-27 | 1984-04-10 | Corning Glass Works | Cellular ceramic bodies and method making same |
US4483944A (en) * | 1983-07-27 | 1984-11-20 | Corning Glass Works | Aluminum titanate-mullite ceramic articles |
JPS60141667A (ja) * | 1983-12-28 | 1985-07-26 | 日本碍子株式会社 | セラミックハニカム構造体を接合若しくはコーティングまたは封着するためのセラミック材料組成物 |
US4808460A (en) * | 1987-06-02 | 1989-02-28 | Corning Glass Works | Laminated structures containing an inorganic corrugated or honeycomb member |
JP2938740B2 (ja) * | 1993-12-14 | 1999-08-25 | 日本碍子株式会社 | コージェライト質セラミックフィルタとその製造方法 |
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WO2002024600A1 (fr) * | 2000-09-20 | 2002-03-28 | Sumitomo Metal Industries, Ltd. | Ceramique a faible dilatation thermique et element pour systeme d'exposition |
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2009
- 2009-02-26 US US12/866,944 patent/US8425830B2/en not_active Expired - Fee Related
- 2009-02-26 EP EP20090714584 patent/EP2262747B1/en not_active Not-in-force
- 2009-02-26 WO PCT/US2009/001211 patent/WO2009108330A1/en active Application Filing
- 2009-02-26 CN CN2009801144892A patent/CN102007087A/zh active Pending
- 2009-02-26 JP JP2010548718A patent/JP2011513176A/ja active Pending
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2013
- 2013-02-25 US US13/775,339 patent/US20130160412A1/en not_active Abandoned
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JPS55142539A (en) * | 1979-03-26 | 1980-11-07 | Corning Glass Works | Inorganic gel and its preparation* and inorganic paper* film* fiber* board and coating manufactured from said inorganic gel and these preparation |
JPH01297145A (ja) * | 1988-05-26 | 1989-11-30 | Matsushita Electric Ind Co Ltd | 触媒体 |
JPH01298078A (ja) * | 1988-05-26 | 1989-12-01 | Matsushita Electric Ind Co Ltd | セラミック多孔体 |
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WO2013180231A1 (ja) | 2012-06-01 | 2013-12-05 | 凸版印刷株式会社 | 異方性反射表示体、並びに異方性反射表示体を用いた情報記録体 |
EP3865919A1 (en) | 2012-06-01 | 2021-08-18 | Toppan Printing Co., Ltd. | Unisometric reflection display, information holder using unisometric reflection display |
EP3882674A1 (en) | 2012-06-01 | 2021-09-22 | Toppan Printing Co., Ltd. | Process of forming a unisometric reflection display |
Also Published As
Publication number | Publication date |
---|---|
CN102007087A (zh) | 2011-04-06 |
US20100326029A1 (en) | 2010-12-30 |
US20130160412A1 (en) | 2013-06-27 |
EP2262747B1 (en) | 2013-06-05 |
EP2262747A1 (en) | 2010-12-22 |
US8425830B2 (en) | 2013-04-23 |
WO2009108330A1 (en) | 2009-09-03 |
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