JP2011512684A5 - - Google Patents

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Publication number
JP2011512684A5
JP2011512684A5 JP2010547146A JP2010547146A JP2011512684A5 JP 2011512684 A5 JP2011512684 A5 JP 2011512684A5 JP 2010547146 A JP2010547146 A JP 2010547146A JP 2010547146 A JP2010547146 A JP 2010547146A JP 2011512684 A5 JP2011512684 A5 JP 2011512684A5
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JP
Japan
Prior art keywords
processing chamber
absorbing member
getter
vocs
getter pump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010547146A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011512684A (ja
JP5411167B2 (ja
Filing date
Publication date
Priority claimed from IT000282A external-priority patent/ITMI20080282A1/it
Application filed filed Critical
Publication of JP2011512684A publication Critical patent/JP2011512684A/ja
Publication of JP2011512684A5 publication Critical patent/JP2011512684A5/ja
Application granted granted Critical
Publication of JP5411167B2 publication Critical patent/JP5411167B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010547146A 2008-02-22 2009-02-10 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置 Active JP5411167B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ITMI2008A000282 2008-02-22
IT000282A ITMI20080282A1 (it) 2008-02-22 2008-02-22 Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter
PCT/EP2009/051516 WO2009103631A1 (en) 2008-02-22 2009-02-10 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013100962A Division JP5357356B2 (ja) 2008-02-22 2013-05-13 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置

Publications (3)

Publication Number Publication Date
JP2011512684A JP2011512684A (ja) 2011-04-21
JP2011512684A5 true JP2011512684A5 (https=) 2012-01-19
JP5411167B2 JP5411167B2 (ja) 2014-02-12

Family

ID=40291682

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2010547146A Active JP5411167B2 (ja) 2008-02-22 2009-02-10 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置
JP2013100962A Active JP5357356B2 (ja) 2008-02-22 2013-05-13 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013100962A Active JP5357356B2 (ja) 2008-02-22 2013-05-13 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置

Country Status (10)

Country Link
US (1) US8399861B2 (https=)
EP (1) EP2255252B1 (https=)
JP (2) JP5411167B2 (https=)
KR (1) KR101429440B1 (https=)
CN (2) CN101971098B (https=)
AT (1) ATE514973T1 (https=)
CA (1) CA2711616A1 (https=)
IT (1) ITMI20080282A1 (https=)
TW (1) TW200951628A (https=)
WO (1) WO2009103631A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0696395B2 (ja) 1991-04-30 1994-11-30 工業技術院長 形状可変型多輪全方向移動ビークル
JP5315100B2 (ja) * 2009-03-18 2013-10-16 株式会社ニューフレアテクノロジー 描画装置
ITMI20121732A1 (it) 2012-10-15 2014-04-16 Getters Spa Pompa getter
TWI660125B (zh) * 2014-04-03 2019-05-21 義大利商沙斯格特斯公司 吸氣泵
DE102016213830B3 (de) * 2016-07-27 2017-12-07 Carl Zeiss Smt Gmbh Quell-Hohlkörper sowie EUV-Plasma-Lichtquelle mit einem derartigen Quell-Hohlkörper
KR20220076913A (ko) 2020-12-01 2022-06-08 포항공과대학교 산학협력단 나노 리소그래피 장치
CN113042160A (zh) * 2021-03-10 2021-06-29 南京华东电子真空材料有限公司 一种应用于极紫外设备的吸气剂及制备装置
DE102021205985A1 (de) * 2021-06-11 2022-12-15 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Regenerieren eines gasbindenden Bauteils
DE102022102478A1 (de) * 2022-02-02 2023-08-03 Asml Netherlands B.V. EUV-Lithographiesystem mit einem gasbindenden Bauteil
DE102023200375A1 (de) * 2023-01-18 2024-07-18 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Kontaminationsreduzierung in einem optischen System für die Mikrolithographie

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969556A (en) * 1988-05-10 1990-11-13 Hajime Ishimaru Vacuum container
US5911560A (en) * 1994-10-31 1999-06-15 Saes Pure Gas, Inc. Getter pump module and system
US5972183A (en) * 1994-10-31 1999-10-26 Saes Getter S.P.A Getter pump module and system
IT237018Y1 (it) * 1995-07-10 2000-08-31 Getters Spa Pompa getter perfezionata in particolare per uno strumento dianalisi chimiche portatile
IT1295340B1 (it) * 1997-10-15 1999-05-12 Getters Spa Pompa getter ad elevata velocita' di assorbimento di gas
US6391090B1 (en) * 2001-04-02 2002-05-21 Aeronex, Inc. Method for purification of lens gases used in photolithography
JP2004053264A (ja) 2002-07-16 2004-02-19 Konica Minolta Holdings Inc 放射線像変換パネルおよび製造方法
JP2004214480A (ja) 2003-01-07 2004-07-29 Nikon Corp 露光装置
JP4613167B2 (ja) 2003-05-22 2011-01-12 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 少なくとも一つの光学要素を洗浄する方法および装置
SG112047A1 (en) 2003-11-11 2005-06-29 Asml Netherlands Bv Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby
JP2005244016A (ja) * 2004-02-27 2005-09-08 Nikon Corp 露光装置、露光方法、及び微細パターンを有するデバイスの製造方法
US7732789B2 (en) 2004-07-22 2010-06-08 Koninklijke Philips Electronics N.V. Optical system having a cleaning arrangement
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2006245254A (ja) * 2005-03-03 2006-09-14 Nikon Corp 露光装置、露光方法、および微細パターンを有するデバイスの製造方法
JP2007018931A (ja) 2005-07-08 2007-01-25 Canon Inc 光源装置、露光装置及びデバイス製造方法
US7473908B2 (en) * 2006-07-14 2009-01-06 Asml Netherlands B.V. Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
DE102006036488A1 (de) 2006-08-04 2008-02-07 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv in der Mikrolithographie
US20080050680A1 (en) * 2006-08-24 2008-02-28 Stefan Brandl Lithography systems and methods
US7959310B2 (en) * 2006-09-13 2011-06-14 Carl Zeiss Smt Gmbh Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
DE102006044591A1 (de) * 2006-09-19 2008-04-03 Carl Zeiss Smt Ag Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination
US7671348B2 (en) 2007-06-26 2010-03-02 Advanced Micro Devices, Inc. Hydrocarbon getter for lithographic exposure tools

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