ITMI20080282A1 - Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter - Google Patents

Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter Download PDF

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Publication number
ITMI20080282A1
ITMI20080282A1 IT000282A ITMI20080282A ITMI20080282A1 IT MI20080282 A1 ITMI20080282 A1 IT MI20080282A1 IT 000282 A IT000282 A IT 000282A IT MI20080282 A ITMI20080282 A IT MI20080282A IT MI20080282 A1 ITMI20080282 A1 IT MI20080282A1
Authority
IT
Italy
Prior art keywords
radiation
getter
getter material
pump
process chamber
Prior art date
Application number
IT000282A
Other languages
English (en)
Italian (it)
Inventor
Andrea Conte
Paolo Manini
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Priority to IT000282A priority Critical patent/ITMI20080282A1/it
Priority to JP2010547146A priority patent/JP5411167B2/ja
Priority to CA2711616A priority patent/CA2711616A1/en
Priority to PCT/EP2009/051516 priority patent/WO2009103631A1/en
Priority to US12/812,948 priority patent/US8399861B2/en
Priority to KR1020107020658A priority patent/KR101429440B1/ko
Priority to AT09711636T priority patent/ATE514973T1/de
Priority to CN201310276167.6A priority patent/CN103345127B/zh
Priority to EP09711636A priority patent/EP2255252B1/en
Priority to CN200980103842.7A priority patent/CN101971098B/zh
Priority to TW098104833A priority patent/TW200951628A/zh
Publication of ITMI20080282A1 publication Critical patent/ITMI20080282A1/it
Priority to JP2013100962A priority patent/JP5357356B2/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Tubes For Measurement (AREA)
IT000282A 2008-02-22 2008-02-22 Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter ITMI20080282A1 (it)

Priority Applications (12)

Application Number Priority Date Filing Date Title
IT000282A ITMI20080282A1 (it) 2008-02-22 2008-02-22 Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter
KR1020107020658A KR101429440B1 (ko) 2008-02-22 2009-02-10 극자외선을 사용하고 게터 물질을 포함하는 휘발성 유기 화합물 흡수 부재를 갖는 리소그래피 장치
CA2711616A CA2711616A1 (en) 2008-02-22 2009-02-10 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material
PCT/EP2009/051516 WO2009103631A1 (en) 2008-02-22 2009-02-10 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material
US12/812,948 US8399861B2 (en) 2008-02-22 2009-02-10 Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material
JP2010547146A JP5411167B2 (ja) 2008-02-22 2009-02-10 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置
AT09711636T ATE514973T1 (de) 2008-02-22 2009-02-10 Lithographievorrichtung für den extrem uv strahlungsbereich mit einem sorptionselement für flüchtige organische verbindungen und umfassend ein gettermaterial
CN201310276167.6A CN103345127B (zh) 2008-02-22 2009-02-10 使用极uv射线且具有包括吸气材料的挥发性有机化合物吸收构件的光刻设备
EP09711636A EP2255252B1 (en) 2008-02-22 2009-02-10 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material
CN200980103842.7A CN101971098B (zh) 2008-02-22 2009-02-10 使用极uv射线且具有包括吸气材料的挥发性有机化合物吸收构件的光刻设备
TW098104833A TW200951628A (en) 2008-02-22 2009-02-16 Lithography apparatus using extreme UV radiation and having a volatile organic compounds sorbing member comprising a getter material
JP2013100962A JP5357356B2 (ja) 2008-02-22 2013-05-13 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT000282A ITMI20080282A1 (it) 2008-02-22 2008-02-22 Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter

Publications (1)

Publication Number Publication Date
ITMI20080282A1 true ITMI20080282A1 (it) 2009-08-23

Family

ID=40291682

Family Applications (1)

Application Number Title Priority Date Filing Date
IT000282A ITMI20080282A1 (it) 2008-02-22 2008-02-22 Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter

Country Status (10)

Country Link
US (1) US8399861B2 (https=)
EP (1) EP2255252B1 (https=)
JP (2) JP5411167B2 (https=)
KR (1) KR101429440B1 (https=)
CN (2) CN101971098B (https=)
AT (1) ATE514973T1 (https=)
CA (1) CA2711616A1 (https=)
IT (1) ITMI20080282A1 (https=)
TW (1) TW200951628A (https=)
WO (1) WO2009103631A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0696395B2 (ja) 1991-04-30 1994-11-30 工業技術院長 形状可変型多輪全方向移動ビークル
JP5315100B2 (ja) * 2009-03-18 2013-10-16 株式会社ニューフレアテクノロジー 描画装置
ITMI20121732A1 (it) 2012-10-15 2014-04-16 Getters Spa Pompa getter
TWI660125B (zh) * 2014-04-03 2019-05-21 義大利商沙斯格特斯公司 吸氣泵
DE102016213830B3 (de) * 2016-07-27 2017-12-07 Carl Zeiss Smt Gmbh Quell-Hohlkörper sowie EUV-Plasma-Lichtquelle mit einem derartigen Quell-Hohlkörper
KR20220076913A (ko) 2020-12-01 2022-06-08 포항공과대학교 산학협력단 나노 리소그래피 장치
CN113042160A (zh) * 2021-03-10 2021-06-29 南京华东电子真空材料有限公司 一种应用于极紫外设备的吸气剂及制备装置
DE102021205985A1 (de) * 2021-06-11 2022-12-15 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Regenerieren eines gasbindenden Bauteils
DE102022102478A1 (de) * 2022-02-02 2023-08-03 Asml Netherlands B.V. EUV-Lithographiesystem mit einem gasbindenden Bauteil
DE102023200375A1 (de) * 2023-01-18 2024-07-18 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Kontaminationsreduzierung in einem optischen System für die Mikrolithographie

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969556A (en) * 1988-05-10 1990-11-13 Hajime Ishimaru Vacuum container
US5911560A (en) * 1994-10-31 1999-06-15 Saes Pure Gas, Inc. Getter pump module and system
US5972183A (en) * 1994-10-31 1999-10-26 Saes Getter S.P.A Getter pump module and system
IT237018Y1 (it) * 1995-07-10 2000-08-31 Getters Spa Pompa getter perfezionata in particolare per uno strumento dianalisi chimiche portatile
IT1295340B1 (it) * 1997-10-15 1999-05-12 Getters Spa Pompa getter ad elevata velocita' di assorbimento di gas
US6391090B1 (en) * 2001-04-02 2002-05-21 Aeronex, Inc. Method for purification of lens gases used in photolithography
JP2004053264A (ja) 2002-07-16 2004-02-19 Konica Minolta Holdings Inc 放射線像変換パネルおよび製造方法
JP2004214480A (ja) 2003-01-07 2004-07-29 Nikon Corp 露光装置
JP4613167B2 (ja) 2003-05-22 2011-01-12 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 少なくとも一つの光学要素を洗浄する方法および装置
SG112047A1 (en) 2003-11-11 2005-06-29 Asml Netherlands Bv Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby
JP2005244016A (ja) * 2004-02-27 2005-09-08 Nikon Corp 露光装置、露光方法、及び微細パターンを有するデバイスの製造方法
US7732789B2 (en) 2004-07-22 2010-06-08 Koninklijke Philips Electronics N.V. Optical system having a cleaning arrangement
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2006245254A (ja) * 2005-03-03 2006-09-14 Nikon Corp 露光装置、露光方法、および微細パターンを有するデバイスの製造方法
JP2007018931A (ja) 2005-07-08 2007-01-25 Canon Inc 光源装置、露光装置及びデバイス製造方法
US7473908B2 (en) * 2006-07-14 2009-01-06 Asml Netherlands B.V. Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
DE102006036488A1 (de) 2006-08-04 2008-02-07 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv in der Mikrolithographie
US20080050680A1 (en) * 2006-08-24 2008-02-28 Stefan Brandl Lithography systems and methods
US7959310B2 (en) * 2006-09-13 2011-06-14 Carl Zeiss Smt Gmbh Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
DE102006044591A1 (de) * 2006-09-19 2008-04-03 Carl Zeiss Smt Ag Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination
US7671348B2 (en) 2007-06-26 2010-03-02 Advanced Micro Devices, Inc. Hydrocarbon getter for lithographic exposure tools

Also Published As

Publication number Publication date
JP2011512684A (ja) 2011-04-21
JP5357356B2 (ja) 2013-12-04
JP5411167B2 (ja) 2014-02-12
CA2711616A1 (en) 2009-08-27
CN103345127A (zh) 2013-10-09
CN101971098A (zh) 2011-02-09
EP2255252B1 (en) 2011-06-29
CN101971098B (zh) 2013-07-10
TW200951628A (en) 2009-12-16
WO2009103631A1 (en) 2009-08-27
CN103345127B (zh) 2016-01-20
US8399861B2 (en) 2013-03-19
EP2255252A1 (en) 2010-12-01
ATE514973T1 (de) 2011-07-15
KR101429440B1 (ko) 2014-08-12
US20100309446A1 (en) 2010-12-09
KR20100119568A (ko) 2010-11-09
JP2013165293A (ja) 2013-08-22

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