JP2011511996A5 - - Google Patents

Download PDF

Info

Publication number
JP2011511996A5
JP2011511996A5 JP2010539696A JP2010539696A JP2011511996A5 JP 2011511996 A5 JP2011511996 A5 JP 2011511996A5 JP 2010539696 A JP2010539696 A JP 2010539696A JP 2010539696 A JP2010539696 A JP 2010539696A JP 2011511996 A5 JP2011511996 A5 JP 2011511996A5
Authority
JP
Japan
Prior art keywords
dielectric material
gas
charge
source
ultraviolet rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010539696A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011511996A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2008/086958 external-priority patent/WO2009085742A1/en
Publication of JP2011511996A publication Critical patent/JP2011511996A/ja
Publication of JP2011511996A5 publication Critical patent/JP2011511996A5/ja
Pending legal-status Critical Current

Links

JP2010539696A 2007-12-21 2008-12-16 紫外線を用いる電荷変更 Pending JP2011511996A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1595007P 2007-12-21 2007-12-21
PCT/US2008/086958 WO2009085742A1 (en) 2007-12-21 2008-12-16 Charge alteration using ultraviolet radiation

Publications (2)

Publication Number Publication Date
JP2011511996A JP2011511996A (ja) 2011-04-14
JP2011511996A5 true JP2011511996A5 (enExample) 2012-01-05

Family

ID=40428492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010539696A Pending JP2011511996A (ja) 2007-12-21 2008-12-16 紫外線を用いる電荷変更

Country Status (7)

Country Link
US (1) US20110168924A1 (enExample)
EP (1) EP2232957A1 (enExample)
JP (1) JP2011511996A (enExample)
KR (1) KR20100092046A (enExample)
CN (1) CN101904226A (enExample)
BR (1) BRPI0819522A2 (enExample)
WO (1) WO2009085742A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6770428B2 (ja) * 2016-12-28 2020-10-14 株式会社Ｓｃｒｅｅｎホールディングス 除電装置および除電方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB191201554A (en) * 1912-01-19 1912-12-05 Siemens Brothers & Co Ltd Improved Methods of Neutralising Electric Charges Formed on Textiles, Fibres, Paper and like Materials during the Working Processes.
US3057997A (en) * 1956-05-21 1962-10-09 Edward K Kaprelian Exposure charged electrophotography
NL221062A (enExample) * 1956-09-25
US3719481A (en) * 1970-03-07 1973-03-06 Xerox Corp Electrostatographic imaging process
JPS57155550U (enExample) * 1981-03-26 1982-09-30
US4752806A (en) * 1986-06-23 1988-06-21 Xerox Corporation Multi-mode imaging system
JPS6310173A (ja) * 1986-07-02 1988-01-16 Minolta Camera Co Ltd 電子写真複写機
JP2816037B2 (ja) * 1991-07-25 1998-10-27 忠弘 大見 帯電物体の中和装置
US6734443B2 (en) * 2001-05-08 2004-05-11 Intel Corporation Apparatus and method for removing photomask contamination and controlling electrostatic discharge
JP4658458B2 (ja) * 2002-07-22 2011-03-23 大日本スクリーン製造株式会社 膜厚測定方法、比誘電率測定方法、膜厚測定装置、および比誘電率測定装置
JP2004071525A (ja) * 2002-08-07 2004-03-04 Smc Corp 紫外線発光ダイオードを用いた除電装置
US7460146B2 (en) * 2004-07-28 2008-12-02 Towner David K Dynamic correction of field curvature from a scanner
JP4829550B2 (ja) * 2005-06-30 2011-12-07 浜松ホトニクス株式会社 除電装置及びこれを備えたチャンバ
US7569415B2 (en) * 2005-09-30 2009-08-04 Alcatel-Lucent Usa Inc. Liquid phase fabrication of active devices including organic semiconductors
KR20080066480A (ko) * 2007-01-12 2008-07-16 삼성전자주식회사 토너 제조방법 및 이를 이용하여 제조된 토너

Similar Documents

Publication Publication Date Title
TW200644023A (en) Lighting apparatus, display apparatus, and fluorescent substance film
JP2009535858A5 (enExample)
EP2096658A4 (en) DISCHARGE LAMP, LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING THE EXPOSURE APPARATUS
JP2011223036A5 (ja) 露光装置及びデバイス製造方法
NL2003157A1 (nl) Radiation source, lithographic apparatus, and device manufacturing method.
NL2003310A1 (nl) Radiation source, lithographic apparatus and device manufacturing method.
JP2013171925A5 (enExample)
NL1036272A1 (nl) Radiation source, lithographic apparatus and device manufacturing method.
ES2499391T3 (es) Método para la producción de anticuerpos
TWI339772B (en) Projector using discharge lamp, method for controlling discharge lamp light source, and program storing medium
NL1032863A1 (nl) Inrichting voor het opwekken van kortgolvige straling op basis van een door gasontlading opgewekt heet plasma, alsmede werkwijze voor de vervaardiging van een met koelmiddel doorstroomd elektrodehuis.
JP2011523189A5 (enExample)
TWI799788B (zh) 高諧波產生源、度量衡設備、微影製造單元及用於在照明源中輸送氣體之方法
NL2003306A1 (nl) Radiation source, lithographic apparatus, and device manufacturing method.
JP2018500462A5 (enExample)
DE602006015768D1 (de) Teilchenstrahlgerät mit Ozon-Quelle
NL2003202A1 (nl) Radiation source, lithographic apparatus and device manufacturing method.
JP2011511996A5 (enExample)
JP2011237839A5 (enExample)
MX2011009425A (es) Sistema de curado con luz ultravioleta que incluye una fuente de energia suplementaria.
JP2007287643A5 (enExample)
JP2006263664A5 (enExample)
JP2018526608A5 (enExample)
TW200705096A (en) Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition
JP2009090524A5 (enExample)