JP2011511864A5 - - Google Patents

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Publication number
JP2011511864A5
JP2011511864A5 JP2010545601A JP2010545601A JP2011511864A5 JP 2011511864 A5 JP2011511864 A5 JP 2011511864A5 JP 2010545601 A JP2010545601 A JP 2010545601A JP 2010545601 A JP2010545601 A JP 2010545601A JP 2011511864 A5 JP2011511864 A5 JP 2011511864A5
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JP
Japan
Prior art keywords
manganese
composition
source
iii
mass
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JP2010545601A
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English (en)
Japanese (ja)
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JP2011511864A (ja
JP5893831B2 (ja
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Priority claimed from PCT/IB2009/050566 external-priority patent/WO2009101588A2/en
Publication of JP2011511864A publication Critical patent/JP2011511864A/ja
Publication of JP2011511864A5 publication Critical patent/JP2011511864A5/ja
Application granted granted Critical
Publication of JP5893831B2 publication Critical patent/JP5893831B2/ja
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JP2010545601A 2008-02-11 2009-02-11 アルカリ過酸化物洗浄装置において低温洗浄を向上させるための活性化複合体の使用 Active JP5893831B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US2760508P 2008-02-11 2008-02-11
US61/027,605 2008-02-11
PCT/IB2009/050566 WO2009101588A2 (en) 2008-02-11 2009-02-11 Use of activator complexes to enhance lower temperature cleaning in alkaline peroxide cleaning systems

Publications (3)

Publication Number Publication Date
JP2011511864A JP2011511864A (ja) 2011-04-14
JP2011511864A5 true JP2011511864A5 (enExample) 2012-03-22
JP5893831B2 JP5893831B2 (ja) 2016-03-23

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ID=40937995

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010545601A Active JP5893831B2 (ja) 2008-02-11 2009-02-11 アルカリ過酸化物洗浄装置において低温洗浄を向上させるための活性化複合体の使用

Country Status (11)

Country Link
US (2) US20090200234A1 (enExample)
EP (1) EP2252683B1 (enExample)
JP (1) JP5893831B2 (enExample)
CN (1) CN101925673A (enExample)
AU (1) AU2009213715B2 (enExample)
BR (1) BRPI0906349B1 (enExample)
CA (1) CA2711118C (enExample)
ES (1) ES2546730T3 (enExample)
MX (1) MX2010008091A (enExample)
NZ (1) NZ586396A (enExample)
WO (1) WO2009101588A2 (enExample)

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CN106975365A (zh) * 2017-03-27 2017-07-25 嘉兴可珑清洁科技有限公司 一种无机膜再生预处理剂及其制备方法
CN107338116B (zh) * 2017-07-25 2019-08-09 上海新阳半导体材料股份有限公司 一种清洗剂、其制备方法和应用
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