JP2008540994A5 - - Google Patents

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Publication number
JP2008540994A5
JP2008540994A5 JP2008510527A JP2008510527A JP2008540994A5 JP 2008540994 A5 JP2008540994 A5 JP 2008540994A5 JP 2008510527 A JP2008510527 A JP 2008510527A JP 2008510527 A JP2008510527 A JP 2008510527A JP 2008540994 A5 JP2008540994 A5 JP 2008540994A5
Authority
JP
Japan
Prior art keywords
cleaning solution
surface active
substantially free
cleaned
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008510527A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008540994A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2006/061522 external-priority patent/WO2007054377A1/en
Publication of JP2008540994A publication Critical patent/JP2008540994A/ja
Publication of JP2008540994A5 publication Critical patent/JP2008540994A5/ja
Pending legal-status Critical Current

Links

JP2008510527A 2005-05-13 2006-04-11 表面の乾燥方法 Pending JP2008540994A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT8312005 2005-05-13
PCT/EP2006/061522 WO2007054377A1 (en) 2005-05-13 2006-04-11 Method for drying a surface

Publications (2)

Publication Number Publication Date
JP2008540994A JP2008540994A (ja) 2008-11-20
JP2008540994A5 true JP2008540994A5 (enExample) 2011-12-01

Family

ID=37890725

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008510527A Pending JP2008540994A (ja) 2005-05-13 2006-04-11 表面の乾燥方法

Country Status (7)

Country Link
US (1) US8038804B2 (enExample)
EP (1) EP1888263A1 (enExample)
JP (1) JP2008540994A (enExample)
KR (1) KR101223198B1 (enExample)
CN (1) CN101175579B (enExample)
TW (1) TWI364524B (enExample)
WO (1) WO2007054377A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5096849B2 (ja) * 2007-09-13 2012-12-12 株式会社Ｓｏｋｕｄｏ 基板処理装置および基板処理方法
JP5390873B2 (ja) * 2009-01-28 2014-01-15 大日本スクリーン製造株式会社 基板処理方法および基板処理装置
JP5538102B2 (ja) * 2010-07-07 2014-07-02 株式会社Ｓｏｋｕｄｏ 基板洗浄方法および基板洗浄装置
JP5615650B2 (ja) 2010-09-28 2014-10-29 大日本スクリーン製造株式会社 基板処理方法および基板処理装置
CN108176640A (zh) * 2017-11-17 2018-06-19 天津津航技术物理研究所 一种提高激光陀螺腔体清洗洁净度的干燥方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8900480A (nl) * 1989-02-27 1990-09-17 Philips Nv Werkwijze en inrichting voor het drogen van substraten na behandeling in een vloeistof.
US5271774A (en) * 1990-03-01 1993-12-21 U.S. Philips Corporation Method for removing in a centrifuge a liquid from a surface of a substrate
JPH05326392A (ja) * 1992-05-14 1993-12-10 Fujitsu Ltd 半導体装置の製造方法
JP3402932B2 (ja) * 1995-05-23 2003-05-06 東京エレクトロン株式会社 洗浄方法及びその装置
TW386235B (en) * 1995-05-23 2000-04-01 Tokyo Electron Ltd Method for spin rinsing
JPH1041267A (ja) * 1996-07-19 1998-02-13 Kaijo Corp 基板の洗浄・乾燥装置
US5997653A (en) * 1996-10-07 1999-12-07 Tokyo Electron Limited Method for washing and drying substrates
US6729040B2 (en) * 1999-05-27 2004-05-04 Oliver Design, Inc. Apparatus and method for drying a substrate using hydrophobic and polar organic compounds
US7021319B2 (en) * 2000-06-26 2006-04-04 Applied Materials Inc. Assisted rinsing in a single wafer cleaning process
US20020121286A1 (en) 2001-01-04 2002-09-05 Applied Materials, Inc. Rinsing solution and rinsing and drying methods for the prevention of watermark formation on a surface
CN2460229Y (zh) * 2001-01-16 2001-11-21 集贤实业有限公司 干燥气化装置
TW200303581A (en) * 2002-02-28 2003-09-01 Tech Ltd A Method and apparatus for cleaning and drying semiconductor wafer
TW556255B (en) 2002-06-04 2003-10-01 Semiconductor Mfg Int Shanghai Drying method of post-cleaned semiconductor wafer
JP4030832B2 (ja) * 2002-08-20 2008-01-09 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
US7578886B2 (en) 2003-08-07 2009-08-25 Ebara Corporation Substrate processing apparatus, substrate processing method, and substrate holding apparatus
TWI236061B (en) 2003-08-21 2005-07-11 Grand Plastic Technology Corp Method for wafer drying
JP4324527B2 (ja) * 2004-09-09 2009-09-02 東京エレクトロン株式会社 基板洗浄方法及び現像装置

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