JP2011511317A5 - - Google Patents
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- Publication number
- JP2011511317A5 JP2011511317A5 JP2010545000A JP2010545000A JP2011511317A5 JP 2011511317 A5 JP2011511317 A5 JP 2011511317A5 JP 2010545000 A JP2010545000 A JP 2010545000A JP 2010545000 A JP2010545000 A JP 2010545000A JP 2011511317 A5 JP2011511317 A5 JP 2011511317A5
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- JP
- Japan
- Prior art keywords
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- following structure
- unit represented
- repeating unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 poly (vinyl acetal Chemical class 0.000 claims 11
- 238000000034 method Methods 0.000 claims 9
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims 5
- 229920002554 vinyl polymer Polymers 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000012670 alkaline solution Substances 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/025,089 US8198011B2 (en) | 2008-02-04 | 2008-02-04 | Method of imaging and developing positive-working imageable elements |
| US12/025,089 | 2008-02-04 | ||
| PCT/US2009/000362 WO2009099518A1 (en) | 2008-02-04 | 2009-01-21 | Method of imaging and developing positive-working imageable elements |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011511317A JP2011511317A (ja) | 2011-04-07 |
| JP2011511317A5 true JP2011511317A5 (enExample) | 2012-02-02 |
| JP5314051B2 JP5314051B2 (ja) | 2013-10-16 |
Family
ID=40527415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010545000A Expired - Fee Related JP5314051B2 (ja) | 2008-02-04 | 2009-01-21 | ポジ型画像形成性要素の画像形成および現像方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8198011B2 (enExample) |
| EP (1) | EP2240322A1 (enExample) |
| JP (1) | JP5314051B2 (enExample) |
| CN (1) | CN101939166B (enExample) |
| WO (1) | WO2009099518A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8084189B2 (en) * | 2008-05-22 | 2011-12-27 | Eastman Kodak Company | Method of imaging and developing positive-working imageable elements |
| US8298750B2 (en) * | 2009-09-08 | 2012-10-30 | Eastman Kodak Company | Positive-working radiation-sensitive imageable elements |
| US8828648B2 (en) * | 2010-02-17 | 2014-09-09 | Fujifilm Corporation | Method for producing a planographic printing plate |
| EP2366545B1 (en) | 2010-03-19 | 2012-12-05 | Agfa Graphics N.V. | A lithographic printing plate precursor |
| US20110236832A1 (en) * | 2010-03-26 | 2011-09-29 | Celin Savariar-Hauck | Lithographic processing solutions and methods of use |
| US8846299B2 (en) | 2010-03-26 | 2014-09-30 | Eastman Kodak Company | Methods for preparing lithograhic printing plates |
| US8530143B2 (en) * | 2010-11-18 | 2013-09-10 | Eastman Kodak Company | Silicate-free developer compositions |
| US8939080B2 (en) * | 2010-11-18 | 2015-01-27 | Eastman Kodak Company | Methods of processing using silicate-free developer compositions |
| US8647811B2 (en) | 2012-01-12 | 2014-02-11 | Eastman Kodak Company | Positive-working lithographic printing plate precursors |
| US20130255515A1 (en) | 2012-03-27 | 2013-10-03 | Celin Savariar-Hauck | Positive-working lithographic printing plate precursors |
| ES2642967T3 (es) | 2013-01-01 | 2017-11-20 | Agfa Graphics Nv | Copolímeros (de etileno, vinilacetal) y precursores de plancha de impresión litográfica que incluyen tales copolímeros |
| EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| ES2617557T3 (es) | 2014-05-15 | 2017-06-19 | Agfa Graphics Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
| EP2955198B8 (en) | 2014-06-13 | 2018-01-03 | Agfa Nv | Ethylene/vinyl acetal-copolymers and their use in lithographic printing plate precursors |
| EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
| EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
| EP3429848B1 (en) | 2016-03-16 | 2021-08-18 | Agfa Nv | Method for processing a lithographic printing plate |
| JP2020064082A (ja) | 2017-02-17 | 2020-04-23 | 富士フイルム株式会社 | ポジ型平版印刷版原版、及び、平版印刷版の作製方法 |
| CN106909024B (zh) * | 2017-03-28 | 2020-03-13 | 辽宁靖帆新材料有限公司 | 一种感光性树脂组合物及其应用 |
| EP3778253A1 (en) | 2019-08-13 | 2021-02-17 | Agfa Nv | Method for processing a lithographic printing plate |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61281236A (ja) * | 1985-06-07 | 1986-12-11 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JP3784931B2 (ja) * | 1997-08-13 | 2006-06-14 | コダックポリクロームグラフィックス株式会社 | 感光性平版印刷版の現像方法およびそれに用いる現像液 |
| JP3917318B2 (ja) * | 1999-02-24 | 2007-05-23 | 富士フイルム株式会社 | ポジ型平版印刷用材料 |
| US6255033B1 (en) | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
| US6716569B2 (en) * | 2000-07-07 | 2004-04-06 | Fuji Photo Film Co., Ltd. | Preparation method for lithographic printing plate |
| US6506536B2 (en) * | 2000-12-29 | 2003-01-14 | Kodak Polychrome Graphics, Llc | Imageable element and composition comprising thermally reversible polymers |
| US20050003296A1 (en) * | 2002-03-15 | 2005-01-06 | Memetea Livia T. | Development enhancement of radiation-sensitive elements |
| WO2004081662A2 (en) | 2003-03-14 | 2004-09-23 | Creo Inc. | Development enhancement of radiation-sensitive elements |
| US7078162B2 (en) * | 2003-10-08 | 2006-07-18 | Eastman Kodak Company | Developer regenerators |
| US7279263B2 (en) * | 2004-06-24 | 2007-10-09 | Kodak Graphic Communications Canada Company | Dual-wavelength positive-working radiation-sensitive elements |
| JP2006018203A (ja) | 2004-07-05 | 2006-01-19 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US20080008956A1 (en) * | 2006-06-23 | 2008-01-10 | Eastman Kodak Company | Positive-working imageable members with branched hydroxystyrene polymers |
| WO2008081679A1 (ja) * | 2006-12-28 | 2008-07-10 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版用現像液及びそれを用いた平版印刷版の作製方法 |
| US7399576B1 (en) * | 2007-02-28 | 2008-07-15 | Eastman Kodak Company | Positive-working radiation-sensitive composition and elements |
| US7723012B2 (en) * | 2007-06-28 | 2010-05-25 | Eastman Kodak Company | Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
-
2008
- 2008-02-04 US US12/025,089 patent/US8198011B2/en not_active Expired - Fee Related
-
2009
- 2009-01-21 WO PCT/US2009/000362 patent/WO2009099518A1/en not_active Ceased
- 2009-01-21 EP EP09708811A patent/EP2240322A1/en not_active Withdrawn
- 2009-01-21 JP JP2010545000A patent/JP5314051B2/ja not_active Expired - Fee Related
- 2009-01-21 CN CN200980104053.5A patent/CN101939166B/zh not_active Expired - Fee Related
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