CN101939166B - 正性工作可成像元件的成像和显影方法 - Google Patents

正性工作可成像元件的成像和显影方法 Download PDF

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Publication number
CN101939166B
CN101939166B CN200980104053.5A CN200980104053A CN101939166B CN 101939166 B CN101939166 B CN 101939166B CN 200980104053 A CN200980104053 A CN 200980104053A CN 101939166 B CN101939166 B CN 101939166B
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CN
China
Prior art keywords
imageable
imaging
substituted
poly
dyes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200980104053.5A
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English (en)
Chinese (zh)
Other versions
CN101939166A (zh
Inventor
M·列娃农
M·纳卡什
T·柯特塞尔
J·E·小亚当斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of CN101939166A publication Critical patent/CN101939166A/zh
Application granted granted Critical
Publication of CN101939166B publication Critical patent/CN101939166B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Printing Plates And Materials Therefor (AREA)
CN200980104053.5A 2008-02-04 2009-01-21 正性工作可成像元件的成像和显影方法 Expired - Fee Related CN101939166B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US12/025089 2008-02-04
US12/025,089 US8198011B2 (en) 2008-02-04 2008-02-04 Method of imaging and developing positive-working imageable elements
US12/025,089 2008-02-04
PCT/US2009/000362 WO2009099518A1 (en) 2008-02-04 2009-01-21 Method of imaging and developing positive-working imageable elements

Publications (2)

Publication Number Publication Date
CN101939166A CN101939166A (zh) 2011-01-05
CN101939166B true CN101939166B (zh) 2013-01-09

Family

ID=40527415

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980104053.5A Expired - Fee Related CN101939166B (zh) 2008-02-04 2009-01-21 正性工作可成像元件的成像和显影方法

Country Status (5)

Country Link
US (1) US8198011B2 (enExample)
EP (1) EP2240322A1 (enExample)
JP (1) JP5314051B2 (enExample)
CN (1) CN101939166B (enExample)
WO (1) WO2009099518A1 (enExample)

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US8084189B2 (en) * 2008-05-22 2011-12-27 Eastman Kodak Company Method of imaging and developing positive-working imageable elements
US8298750B2 (en) * 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US8828648B2 (en) * 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
ES2395993T3 (es) 2010-03-19 2013-02-18 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
US8846299B2 (en) 2010-03-26 2014-09-30 Eastman Kodak Company Methods for preparing lithograhic printing plates
US20110236832A1 (en) 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
US8530143B2 (en) * 2010-11-18 2013-09-10 Eastman Kodak Company Silicate-free developer compositions
US8939080B2 (en) * 2010-11-18 2015-01-27 Eastman Kodak Company Methods of processing using silicate-free developer compositions
US8647811B2 (en) 2012-01-12 2014-02-11 Eastman Kodak Company Positive-working lithographic printing plate precursors
US20130255515A1 (en) 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors
ES2642967T3 (es) 2013-01-01 2017-11-20 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y precursores de plancha de impresión litográfica que incluyen tales copolímeros
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2944657B1 (en) 2014-05-15 2017-01-11 Agfa Graphics Nv (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors
EP2955198B8 (en) 2014-06-13 2018-01-03 Agfa Nv Ethylene/vinyl acetal-copolymers and their use in lithographic printing plate precursors
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
EP3130465B1 (en) 2015-08-12 2020-05-13 Agfa Nv Heat-sensitive lithographic printing plate precursor
CN108778747A (zh) 2016-03-16 2018-11-09 爱克发有限公司 加工平版印刷版的方法
JP2020064082A (ja) 2017-02-17 2020-04-23 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法
CN106909024B (zh) * 2017-03-28 2020-03-13 辽宁靖帆新材料有限公司 一种感光性树脂组合物及其应用
EP3778253A1 (en) 2019-08-13 2021-02-17 Agfa Nv Method for processing a lithographic printing plate

Citations (3)

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Publication number Priority date Publication date Assignee Title
US6255033B1 (en) * 1999-07-30 2001-07-03 Creo, Ltd. Positive acting photoresist compositions and imageable element
CN1334492A (zh) * 2000-07-07 2002-02-06 富士胶片株式会社 平版印刷的印刷板的制备方法
US7078162B2 (en) * 2003-10-08 2006-07-18 Eastman Kodak Company Developer regenerators

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JPS61281236A (ja) * 1985-06-07 1986-12-11 Fuji Photo Film Co Ltd 感光性組成物
JP3784931B2 (ja) * 1997-08-13 2006-06-14 コダックポリクロームグラフィックス株式会社 感光性平版印刷版の現像方法およびそれに用いる現像液
JP3917318B2 (ja) 1999-02-24 2007-05-23 富士フイルム株式会社 ポジ型平版印刷用材料
US6506536B2 (en) * 2000-12-29 2003-01-14 Kodak Polychrome Graphics, Llc Imageable element and composition comprising thermally reversible polymers
US20050003296A1 (en) * 2002-03-15 2005-01-06 Memetea Livia T. Development enhancement of radiation-sensitive elements
WO2004081662A2 (en) 2003-03-14 2004-09-23 Creo Inc. Development enhancement of radiation-sensitive elements
US7279263B2 (en) * 2004-06-24 2007-10-09 Kodak Graphic Communications Canada Company Dual-wavelength positive-working radiation-sensitive elements
JP2006018203A (ja) 2004-07-05 2006-01-19 Fuji Photo Film Co Ltd 平版印刷版原版
US20080008956A1 (en) * 2006-06-23 2008-01-10 Eastman Kodak Company Positive-working imageable members with branched hydroxystyrene polymers
WO2008081679A1 (ja) * 2006-12-28 2008-07-10 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版用現像液及びそれを用いた平版印刷版の作製方法
US7399576B1 (en) * 2007-02-28 2008-07-15 Eastman Kodak Company Positive-working radiation-sensitive composition and elements
US7723012B2 (en) * 2007-06-28 2010-05-25 Eastman Kodak Company Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s

Patent Citations (3)

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US6255033B1 (en) * 1999-07-30 2001-07-03 Creo, Ltd. Positive acting photoresist compositions and imageable element
CN1334492A (zh) * 2000-07-07 2002-02-06 富士胶片株式会社 平版印刷的印刷板的制备方法
US7078162B2 (en) * 2003-10-08 2006-07-18 Eastman Kodak Company Developer regenerators

Non-Patent Citations (1)

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Also Published As

Publication number Publication date
JP2011511317A (ja) 2011-04-07
US20090197052A1 (en) 2009-08-06
WO2009099518A1 (en) 2009-08-13
EP2240322A1 (en) 2010-10-20
US8198011B2 (en) 2012-06-12
JP5314051B2 (ja) 2013-10-16
CN101939166A (zh) 2011-01-05

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Granted publication date: 20130109

Termination date: 20160121

EXPY Termination of patent right or utility model