JP5314051B2 - ポジ型画像形成性要素の画像形成および現像方法 - Google Patents

ポジ型画像形成性要素の画像形成および現像方法 Download PDF

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Publication number
JP5314051B2
JP5314051B2 JP2010545000A JP2010545000A JP5314051B2 JP 5314051 B2 JP5314051 B2 JP 5314051B2 JP 2010545000 A JP2010545000 A JP 2010545000A JP 2010545000 A JP2010545000 A JP 2010545000A JP 5314051 B2 JP5314051 B2 JP 5314051B2
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JP
Japan
Prior art keywords
substituted
mol
group
imageable
imaged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2010545000A
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English (en)
Japanese (ja)
Other versions
JP2011511317A (ja
JP2011511317A5 (enExample
Inventor
レバノン,モシェ
ナカシュ,モシェ
クルトサー,タンヤ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of JP2011511317A publication Critical patent/JP2011511317A/ja
Publication of JP2011511317A5 publication Critical patent/JP2011511317A5/ja
Application granted granted Critical
Publication of JP5314051B2 publication Critical patent/JP5314051B2/ja
Expired - Fee Related legal-status Critical Current
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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02Positive working, i.e. the exposed (imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262Phenolic condensation polymers, e.g. novolacs, resols
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP2010545000A 2008-02-04 2009-01-21 ポジ型画像形成性要素の画像形成および現像方法 Expired - Fee Related JP5314051B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/025,089 2008-02-04
US12/025,089 US8198011B2 (en) 2008-02-04 2008-02-04 Method of imaging and developing positive-working imageable elements
PCT/US2009/000362 WO2009099518A1 (en) 2008-02-04 2009-01-21 Method of imaging and developing positive-working imageable elements

Publications (3)

Publication Number Publication Date
JP2011511317A JP2011511317A (ja) 2011-04-07
JP2011511317A5 JP2011511317A5 (enExample) 2012-02-02
JP5314051B2 true JP5314051B2 (ja) 2013-10-16

Family

ID=40527415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010545000A Expired - Fee Related JP5314051B2 (ja) 2008-02-04 2009-01-21 ポジ型画像形成性要素の画像形成および現像方法

Country Status (5)

Country Link
US (1) US8198011B2 (enExample)
EP (1) EP2240322A1 (enExample)
JP (1) JP5314051B2 (enExample)
CN (1) CN101939166B (enExample)
WO (1) WO2009099518A1 (enExample)

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US8084189B2 (en) * 2008-05-22 2011-12-27 Eastman Kodak Company Method of imaging and developing positive-working imageable elements
US8298750B2 (en) * 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US8828648B2 (en) * 2010-02-17 2014-09-09 Fujifilm Corporation Method for producing a planographic printing plate
EP2366545B1 (en) 2010-03-19 2012-12-05 Agfa Graphics N.V. A lithographic printing plate precursor
US8846299B2 (en) 2010-03-26 2014-09-30 Eastman Kodak Company Methods for preparing lithograhic printing plates
US20110236832A1 (en) 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
US8530143B2 (en) * 2010-11-18 2013-09-10 Eastman Kodak Company Silicate-free developer compositions
US8939080B2 (en) * 2010-11-18 2015-01-27 Eastman Kodak Company Methods of processing using silicate-free developer compositions
US8647811B2 (en) 2012-01-12 2014-02-11 Eastman Kodak Company Positive-working lithographic printing plate precursors
US20130255515A1 (en) 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors
CN104870193B (zh) 2013-01-01 2017-12-22 爱克发印艺公司 (乙烯、乙烯醇缩醛)共聚物和它们在平版印刷版前体中的用途
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2955198B8 (en) 2014-06-13 2018-01-03 Agfa Nv Ethylene/vinyl acetal-copolymers and their use in lithographic printing plate precursors
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
EP3130465B1 (en) 2015-08-12 2020-05-13 Agfa Nv Heat-sensitive lithographic printing plate precursor
WO2017157577A1 (en) 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
JP2020064082A (ja) 2017-02-17 2020-04-23 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法
CN106909024B (zh) * 2017-03-28 2020-03-13 辽宁靖帆新材料有限公司 一种感光性树脂组合物及其应用
EP3778253A1 (en) 2019-08-13 2021-02-17 Agfa Nv Method for processing a lithographic printing plate

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61281236A (ja) * 1985-06-07 1986-12-11 Fuji Photo Film Co Ltd 感光性組成物
JP3784931B2 (ja) * 1997-08-13 2006-06-14 コダックポリクロームグラフィックス株式会社 感光性平版印刷版の現像方法およびそれに用いる現像液
JP3917318B2 (ja) * 1999-02-24 2007-05-23 富士フイルム株式会社 ポジ型平版印刷用材料
US6255033B1 (en) * 1999-07-30 2001-07-03 Creo, Ltd. Positive acting photoresist compositions and imageable element
US6716569B2 (en) * 2000-07-07 2004-04-06 Fuji Photo Film Co., Ltd. Preparation method for lithographic printing plate
US6506536B2 (en) * 2000-12-29 2003-01-14 Kodak Polychrome Graphics, Llc Imageable element and composition comprising thermally reversible polymers
US20050003296A1 (en) * 2002-03-15 2005-01-06 Memetea Livia T. Development enhancement of radiation-sensitive elements
EP1603749A2 (en) 2003-03-14 2005-12-14 Creo Inc. Development enhancement of radiation-sensitive elements
US7078162B2 (en) * 2003-10-08 2006-07-18 Eastman Kodak Company Developer regenerators
US7279263B2 (en) * 2004-06-24 2007-10-09 Kodak Graphic Communications Canada Company Dual-wavelength positive-working radiation-sensitive elements
JP2006018203A (ja) 2004-07-05 2006-01-19 Fuji Photo Film Co Ltd 平版印刷版原版
US20080008956A1 (en) * 2006-06-23 2008-01-10 Eastman Kodak Company Positive-working imageable members with branched hydroxystyrene polymers
WO2008081679A1 (ja) * 2006-12-28 2008-07-10 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版用現像液及びそれを用いた平版印刷版の作製方法
US7399576B1 (en) * 2007-02-28 2008-07-15 Eastman Kodak Company Positive-working radiation-sensitive composition and elements
US7723012B2 (en) * 2007-06-28 2010-05-25 Eastman Kodak Company Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s

Also Published As

Publication number Publication date
US8198011B2 (en) 2012-06-12
US20090197052A1 (en) 2009-08-06
CN101939166A (zh) 2011-01-05
CN101939166B (zh) 2013-01-09
JP2011511317A (ja) 2011-04-07
EP2240322A1 (en) 2010-10-20
WO2009099518A1 (en) 2009-08-13

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