JP2011508965A5 - - Google Patents
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- JP2011508965A5 JP2011508965A5 JP2010539428A JP2010539428A JP2011508965A5 JP 2011508965 A5 JP2011508965 A5 JP 2011508965A5 JP 2010539428 A JP2010539428 A JP 2010539428A JP 2010539428 A JP2010539428 A JP 2010539428A JP 2011508965 A5 JP2011508965 A5 JP 2011508965A5
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- Prior art keywords
- oscillator
- optical system
- amplifier
- light
- wavelength
- Prior art date
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- 230000003287 optical Effects 0.000 claims 14
- 230000005540 biological transmission Effects 0.000 claims 4
- 230000001808 coupling Effects 0.000 claims 3
- 238000010168 coupling process Methods 0.000 claims 3
- 238000005859 coupling reaction Methods 0.000 claims 3
- 230000003321 amplification Effects 0.000 claims 2
- 238000003199 nucleic acid amplification method Methods 0.000 claims 2
Claims (9)
- 発振器キャビティ長L0を有し、かつ発振器経路を定める発振器と、
Lcombined=(N+x)×L0(式中、Nは整数であり、xは0.4と0.6の間の数である。)の場合に、長さLcombinedを有して前記発振器経路を含む結合光キャビティを確立するために前記発振器に結合された多重通過光増幅器と、
を含むことを特徴とする装置。 - 前記発振器キャビティは、該発振器キャビティの端部を形成する光学系を含み、
前記光学系に結合され、かつ前記発振器キャビティ長を調節するように制御可能な電気起動可能要素、
を含むことを特徴とする請求項1に記載の装置。 - 前記増幅器は、前記発振器から第1のビーム経路に沿って進んで実質的に第1の直線偏光を有する光を該増幅器に入力し、かつ第2のビーム経路に沿って該増幅器から該第1の偏光と直交する実質的な直線偏光を有する光を出力する偏光識別光学系を含むことを特徴とする請求項1に記載の装置。
- 前記発振器は、発振器出力光学系を含み、前記増幅器は、増幅器入力光学系を含み、
前記発振器出力光学系と前記増幅器入力光学系の間のビーム経路長を調節する少なくとも1つの移動可能な光学系、
を更に含むことを特徴とする請求項1に記載の装置。 - 前記発振器は、キャビティダンプ式発振器を含むことを特徴とする請求項1に記載の装置。
- 波長λ1を有する第1の出力ビームを生成する第1のレーザ源と、
λ1≠λ2の場合に波長λ2を有する第2の出力ビームを生成する第2のレーザ源と、
λ1及びλ2を含む利得帯域を有する増幅器と、
第1の直線偏光を有する光を実質的に透過し、かつ該第1の偏光と直交する直線偏光を有する光の透過を実質的に阻止する偏光識別光学系を有する光アイソレータと、
波長λ1を有する光に対しては透過反射比TRR1、及び波長λ2を有する光に対してはTRR1>TRR2として透過反射比TRR2を有し、かつ前記第1の出力ビーム及び第2の出力ビームを前記増幅器を通る共通のビーム経路上に結合する結合光学系と、
を含むことを特徴とする装置。 - 前記第1のレーザ源は、9.3μmの波長λ1を有する第1の出力ビームを生成するCO2を含む利得媒体を有し、前記第2のレーザ源は、10.6μmの波長λ2を有する第2の出力ビームを生成するCO2を含む利得媒体を有することを特徴とする請求項6に記載の装置。
- 前記光アイソレータは、45度位相リターデーション光学系及び直線偏光フィルタを含むことを特徴とする請求項6に記載の装置。
- 前記増幅器は、共通ビーム経路に沿って位置決めされた複数の増幅チャンバを含み、前記結合光学系は、該共通ビーム経路上の2つの増幅チャンバの間に位置決めされることを特徴とする請求項6に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/004,905 US7916388B2 (en) | 2007-12-20 | 2007-12-20 | Drive laser for EUV light source |
US12/004,905 | 2007-12-20 | ||
PCT/US2008/013417 WO2009085095A1 (en) | 2007-12-20 | 2008-12-05 | Drive laser for euv light source |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011508965A JP2011508965A (ja) | 2011-03-17 |
JP2011508965A5 true JP2011508965A5 (ja) | 2012-01-26 |
JP5373814B2 JP5373814B2 (ja) | 2013-12-18 |
Family
ID=40788282
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010539428A Active JP5373814B2 (ja) | 2007-12-20 | 2008-12-05 | Euv光源用の駆動レーザ |
Country Status (6)
Country | Link |
---|---|
US (3) | US7916388B2 (ja) |
EP (1) | EP2232330B1 (ja) |
JP (1) | JP5373814B2 (ja) |
KR (1) | KR101551704B1 (ja) |
TW (2) | TWI382618B (ja) |
WO (1) | WO2009085095A1 (ja) |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8653437B2 (en) | 2010-10-04 | 2014-02-18 | Cymer, Llc | EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods |
US8654438B2 (en) * | 2010-06-24 | 2014-02-18 | Cymer, Llc | Master oscillator-power amplifier drive laser with pre-pulse for EUV light source |
EP2083328B1 (en) * | 2008-01-28 | 2013-06-19 | Media Lario s.r.l. | Grazing incidence collector for laser produced plasma sources |
JP5587578B2 (ja) * | 2008-09-26 | 2014-09-10 | ギガフォトン株式会社 | 極端紫外光源装置およびパルスレーザ装置 |
US8283643B2 (en) * | 2008-11-24 | 2012-10-09 | Cymer, Inc. | Systems and methods for drive laser beam delivery in an EUV light source |
NL2004837A (en) * | 2009-07-09 | 2011-01-10 | Asml Netherlands Bv | Radiation system and lithographic apparatus. |
TWI456853B (zh) | 2009-09-30 | 2014-10-11 | Mitsubishi Electric Corp | 雷射振盪器及雷射放大器 |
US8000212B2 (en) * | 2009-12-15 | 2011-08-16 | Cymer, Inc. | Metrology for extreme ultraviolet light source |
US8872142B2 (en) | 2010-03-18 | 2014-10-28 | Gigaphoton Inc. | Extreme ultraviolet light generation apparatus |
JP5705592B2 (ja) * | 2010-03-18 | 2015-04-22 | ギガフォトン株式会社 | 極端紫外光生成装置 |
JP5765759B2 (ja) | 2010-03-29 | 2015-08-19 | ギガフォトン株式会社 | 極端紫外光生成装置および方法 |
WO2012031841A1 (en) * | 2010-09-08 | 2012-03-15 | Asml Netherlands B.V. | Lithographic apparatus, euv radiation generation apparatus and device manufacturing method |
US8462425B2 (en) * | 2010-10-18 | 2013-06-11 | Cymer, Inc. | Oscillator-amplifier drive laser with seed protection for an EUV light source |
US8810902B2 (en) | 2010-12-29 | 2014-08-19 | Asml Netherlands B.V. | Multi-pass optical apparatus |
JP2012199512A (ja) * | 2011-03-10 | 2012-10-18 | Gigaphoton Inc | 極端紫外光生成装置及び極端紫外光生成方法 |
US8604452B2 (en) * | 2011-03-17 | 2013-12-10 | Cymer, Llc | Drive laser delivery systems for EUV light source |
EA201892619A1 (ru) | 2011-04-29 | 2019-04-30 | Роше Гликарт Аг | Иммуноконъюгаты, содержащие мутантные полипептиды интерлейкина-2 |
JP2014527273A (ja) * | 2011-09-02 | 2014-10-09 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源及びリソグラフィ装置 |
JP5881345B2 (ja) * | 2011-09-13 | 2016-03-09 | ギガフォトン株式会社 | 極端紫外光生成装置 |
JP2013207003A (ja) * | 2012-03-27 | 2013-10-07 | Gigaphoton Inc | レーザ装置 |
DE102012206153A1 (de) * | 2012-04-16 | 2013-10-17 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
JP6099241B2 (ja) * | 2012-06-28 | 2017-03-22 | ギガフォトン株式会社 | ターゲット供給装置 |
WO2014119199A1 (ja) | 2013-01-31 | 2014-08-07 | ギガフォトン株式会社 | レーザ装置及び極端紫外光生成装置 |
DE102013202590A1 (de) * | 2013-02-19 | 2014-09-04 | Carl Zeiss Smt Gmbh | EUV-Lichtquelle zur Erzeugung eines Nutz-Ausgabestrahls für eine Projektionsbelichtungsanlage |
US8872143B2 (en) | 2013-03-14 | 2014-10-28 | Asml Netherlands B.V. | Target for laser produced plasma extreme ultraviolet light source |
US8791440B1 (en) | 2013-03-14 | 2014-07-29 | Asml Netherlands B.V. | Target for extreme ultraviolet light source |
JP6151054B2 (ja) | 2013-03-22 | 2017-06-21 | ギガフォトン株式会社 | レーザ装置及び極端紫外光生成装置 |
JP6285450B2 (ja) | 2013-09-27 | 2018-02-28 | ギガフォトン株式会社 | レーザ装置、及び極端紫外光生成システム |
US9338870B2 (en) | 2013-12-30 | 2016-05-10 | Asml Netherlands B.V. | Extreme ultraviolet light source |
US9232623B2 (en) | 2014-01-22 | 2016-01-05 | Asml Netherlands B.V. | Extreme ultraviolet light source |
JP6252358B2 (ja) * | 2014-05-27 | 2017-12-27 | ウシオ電機株式会社 | 極端紫外光光源装置 |
US9357625B2 (en) | 2014-07-07 | 2016-05-31 | Asml Netherlands B.V. | Extreme ultraviolet light source |
US20160165709A1 (en) * | 2014-12-05 | 2016-06-09 | Asml Netherlands B.V. | System and Method for Isolating Gain Elements in a Laser System |
US9918375B2 (en) * | 2015-11-16 | 2018-03-13 | Kla-Tencor Corporation | Plasma based light source having a target material coated on a cylindrically-symmetric element |
JP6714397B2 (ja) * | 2016-03-08 | 2020-06-24 | 株式会社サタケ | 圧電式バルブ、該圧電式バルブの駆動方法、及び該圧電式バルブを利用した噴風手段を備える光学式粒状物選別機 |
US20170311429A1 (en) | 2016-04-25 | 2017-10-26 | Asml Netherlands B.V. | Reducing the effect of plasma on an object in an extreme ultraviolet light source |
CN109314365B (zh) * | 2016-07-26 | 2021-05-11 | 极光先进雷射株式会社 | 激光系统 |
US9832852B1 (en) * | 2016-11-04 | 2017-11-28 | Asml Netherlands B.V. | EUV LPP source with dose control and laser stabilization using variable width laser pulses |
US10048199B1 (en) * | 2017-03-20 | 2018-08-14 | Asml Netherlands B.V. | Metrology system for an extreme ultraviolet light source |
US10299361B2 (en) * | 2017-03-24 | 2019-05-21 | Asml Netherlands B.V. | Optical pulse generation for an extreme ultraviolet light source |
WO2018219578A1 (en) * | 2017-05-30 | 2018-12-06 | Asml Netherlands B.V. | Radiation source |
US10585215B2 (en) | 2017-06-29 | 2020-03-10 | Cymer, Llc | Reducing optical damage on an optical element |
TWI821231B (zh) * | 2018-01-12 | 2023-11-11 | 荷蘭商Asml荷蘭公司 | 用於控制在液滴串流中液滴聚結之裝置與方法 |
NL2023633A (en) * | 2018-09-25 | 2020-04-30 | Asml Netherlands Bv | Laser system for target metrology and alteration in an euv light source |
EP4133557A1 (en) * | 2020-04-09 | 2023-02-15 | ASML Netherlands B.V. | Seed laser system for radiation source |
CN111817116A (zh) * | 2020-07-20 | 2020-10-23 | 中国科学院长春光学精密机械与物理研究所 | 一种长波二氧化碳激光隔离装置 |
KR20220030382A (ko) | 2020-08-28 | 2022-03-11 | 삼성전자주식회사 | 극자외선 노광 방법 및 이를 이용한 반도체 제조 방법 |
CN111999989B (zh) * | 2020-09-01 | 2023-07-14 | 广东省智能机器人研究院 | 激光等离子体极紫外光源和极紫外光产生方法 |
CN114089580B (zh) * | 2021-11-12 | 2023-06-06 | 南京信息工程大学 | 一种新型少模环路波长转换装置 |
Family Cites Families (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2403731A (en) * | 1943-04-01 | 1946-07-09 | Eastman Kodak Co | Beam splitter |
US3671747A (en) * | 1970-03-30 | 1972-06-20 | Bell Telephone Labor Inc | Picosecond optical apparatus utilizing optically induced birefringence in solids |
US4222011A (en) * | 1978-10-03 | 1980-09-09 | The United States Of America As Represented By The United States Department Of Energy | Stokes injected Raman capillary waveguide amplifier |
US4293827A (en) * | 1979-09-14 | 1981-10-06 | Jersey Nuclear-Avco Isotopes, Inc. | Multiwavelength dye laser |
JPS5649517U (ja) * | 1979-09-25 | 1981-05-01 | ||
US4393503A (en) * | 1980-10-02 | 1983-07-12 | United Technologies Corporation | Cavity length control system for a multiline HEL |
US4982166A (en) * | 1989-03-01 | 1991-01-01 | Morrow Clifford E | Method and apparatus for combining two lower power laser beams to produce a combined higher power beam |
US4982405A (en) * | 1989-09-07 | 1991-01-01 | Massachusette Institute Of Technology | Coupled-cavity Q-switched laser |
US5325380A (en) * | 1992-07-17 | 1994-06-28 | Trw Inc. | Dual wavelength laser emitter |
JPH10509280A (ja) * | 1994-11-15 | 1998-09-08 | ジェイ・エム・エー・アール・テクノロジー・カンパニー | 低コスト、高平均出力、高輝度ソリツドステートレーザ |
US5657153A (en) * | 1995-03-21 | 1997-08-12 | Sdl, Inc. | Optical amplifier with complementary modulation signal inputs |
SE510133C2 (sv) * | 1996-04-25 | 1999-04-19 | Jettec Ab | Laser-plasma röntgenkälla utnyttjande vätskor som strålmål |
JPH10294518A (ja) * | 1997-04-21 | 1998-11-04 | Nec Corp | 光結合器 |
US5848080A (en) * | 1997-05-12 | 1998-12-08 | Dahm; Jonathan S. | Short pulsewidth high pulse repetition frequency laser |
US6061170A (en) * | 1998-03-16 | 2000-05-09 | Mcdonnell Douglas Corporation | Dual frequency laser amplifier array and operating method therefor |
US6567450B2 (en) | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US5974060A (en) | 1999-01-05 | 1999-10-26 | Raytheon Company | Multi-mode laser oscillator with large intermode spacing |
US6197133B1 (en) | 1999-02-16 | 2001-03-06 | General Electric Company | Short-pulse high-peak laser shock peening |
US6549551B2 (en) | 1999-09-27 | 2003-04-15 | Cymer, Inc. | Injection seeded laser with precise timing control |
US6625191B2 (en) | 1999-12-10 | 2003-09-23 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
US20040134894A1 (en) * | 1999-12-28 | 2004-07-15 | Bo Gu | Laser-based system for memory link processing with picosecond lasers |
US6532321B1 (en) * | 2000-02-16 | 2003-03-11 | Adc Telecommunications, Inc. | Fiber optic isolator for use with multiple-wavelength optical signals |
JP3460678B2 (ja) | 2000-06-02 | 2003-10-27 | 松下電器産業株式会社 | レーザ加工方法および加工装置 |
US7518787B2 (en) | 2006-06-14 | 2009-04-14 | Cymer, Inc. | Drive laser for EUV light source |
US7476886B2 (en) | 2006-08-25 | 2009-01-13 | Cymer, Inc. | Source material collection unit for a laser produced plasma EUV light source |
US7928416B2 (en) * | 2006-12-22 | 2011-04-19 | Cymer, Inc. | Laser produced plasma EUV light source |
US7372056B2 (en) | 2005-06-29 | 2008-05-13 | Cymer, Inc. | LPP EUV plasma source material target delivery system |
US7405416B2 (en) | 2005-02-25 | 2008-07-29 | Cymer, Inc. | Method and apparatus for EUV plasma source target delivery |
US7491954B2 (en) | 2006-10-13 | 2009-02-17 | Cymer, Inc. | Drive laser delivery systems for EUV light source |
US7843632B2 (en) | 2006-08-16 | 2010-11-30 | Cymer, Inc. | EUV optics |
US7439530B2 (en) | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
US7465946B2 (en) | 2004-03-10 | 2008-12-16 | Cymer, Inc. | Alternative fuels for EUV light source |
US7598509B2 (en) | 2004-11-01 | 2009-10-06 | Cymer, Inc. | Laser produced plasma EUV light source |
US20060255298A1 (en) | 2005-02-25 | 2006-11-16 | Cymer, Inc. | Laser produced plasma EUV light source with pre-pulse |
WO2002090037A1 (en) * | 2001-05-09 | 2002-11-14 | Electro Scientific Industries, Inc. | Micromachining with high-energy, intra-cavity q-switched co2 laser pulses |
US7061960B2 (en) * | 2001-10-23 | 2006-06-13 | Krupke William F | Diode-pumped alkali amplifier |
US6654390B2 (en) | 2002-01-23 | 2003-11-25 | Np Photonics, Inc. | Coupled-cavity tunable glass laser |
JP2003338980A (ja) | 2002-05-20 | 2003-11-28 | Konica Minolta Holdings Inc | 撮影装置 |
US6855943B2 (en) | 2002-05-28 | 2005-02-15 | Northrop Grumman Corporation | Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source |
US6898218B2 (en) * | 2002-06-24 | 2005-05-24 | Bae Systems Information And Electronic Systems Integration Inc. | Method and apparatus for increasing the intensity of an eye safe laser |
US6973164B2 (en) * | 2003-06-26 | 2005-12-06 | University Of Central Florida Research Foundation, Inc. | Laser-produced plasma EUV light source with pre-pulse enhancement |
US7720116B2 (en) * | 2004-01-22 | 2010-05-18 | Vescent Photonics, Inc. | Tunable laser having liquid crystal waveguide |
DE102004005241B4 (de) * | 2004-01-30 | 2006-03-02 | Xtreme Technologies Gmbh | Verfahren und Einrichtung zur plasmabasierten Erzeugung weicher Röntgenstrahlung |
US7087914B2 (en) | 2004-03-17 | 2006-08-08 | Cymer, Inc | High repetition rate laser produced plasma EUV light source |
US20070219350A1 (en) * | 2004-06-21 | 2007-09-20 | Genentech, Inc. | Compositions and methods for the diagnosis and treatment of tumor |
JP4707399B2 (ja) * | 2004-07-30 | 2011-06-22 | 富士通株式会社 | 光分岐挿入装置 |
JP4564369B2 (ja) * | 2005-02-04 | 2010-10-20 | 株式会社小松製作所 | 極端紫外光源装置 |
US8536549B2 (en) * | 2006-04-12 | 2013-09-17 | The Regents Of The University Of California | Light source employing laser-produced plasma |
JP4937643B2 (ja) * | 2006-05-29 | 2012-05-23 | 株式会社小松製作所 | 極端紫外光源装置 |
-
2007
- 2007-12-20 US US12/004,905 patent/US7916388B2/en not_active Expired - Fee Related
-
2008
- 2008-11-26 TW TW097145685A patent/TWI382618B/zh not_active IP Right Cessation
- 2008-11-26 TW TW101135877A patent/TWI532282B/zh not_active IP Right Cessation
- 2008-12-05 WO PCT/US2008/013417 patent/WO2009085095A1/en active Application Filing
- 2008-12-05 KR KR1020107014653A patent/KR101551704B1/ko active IP Right Grant
- 2008-12-05 EP EP08866153.3A patent/EP2232330B1/en not_active Not-in-force
- 2008-12-05 JP JP2010539428A patent/JP5373814B2/ja active Active
-
2010
- 2010-11-03 US US12/927,012 patent/US8514486B2/en not_active Expired - Fee Related
-
2013
- 2013-08-06 US US13/960,726 patent/US9735535B2/en active Active
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