JP2011506240A5 - - Google Patents
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- JP2011506240A5 JP2011506240A5 JP2010537095A JP2010537095A JP2011506240A5 JP 2011506240 A5 JP2011506240 A5 JP 2011506240A5 JP 2010537095 A JP2010537095 A JP 2010537095A JP 2010537095 A JP2010537095 A JP 2010537095A JP 2011506240 A5 JP2011506240 A5 JP 2011506240A5
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- JP
- Japan
- Prior art keywords
- group
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- perfluoroalkyl
- site
- Prior art date
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- 239000002245 particle Substances 0.000 claims description 27
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 18
- 229910052799 carbon Inorganic materials 0.000 claims description 16
- 125000000743 hydrocarbylene group Chemical group 0.000 claims description 16
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical group [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 125000000962 organic group Chemical group 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 5
- 239000005977 Ethylene Substances 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 125000001153 fluoro group Chemical group F* 0.000 claims description 5
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 229910052809 inorganic oxide Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 230000001143 conditioned effect Effects 0.000 description 3
- QWCOSMBXZZJARK-UHFFFAOYSA-N fluorosilane thiourea Chemical group F[SiH3].NC(N)=S QWCOSMBXZZJARK-UHFFFAOYSA-N 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- RNLWPKPXXVJKNI-UHFFFAOYSA-N F[SiH3].C(N)(O)=O Chemical group F[SiH3].C(N)(O)=O RNLWPKPXXVJKNI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- JBONTXQZKUTFRB-UHFFFAOYSA-N F[SiH3].C(CCC(=O)N)(=O)O Chemical group F[SiH3].C(CCC(=O)N)(=O)O JBONTXQZKUTFRB-UHFFFAOYSA-N 0.000 description 1
- BFIQGHWJERJARE-UHFFFAOYSA-N F[SiH3].NC(N)=O Chemical group F[SiH3].NC(N)=O BFIQGHWJERJARE-UHFFFAOYSA-N 0.000 description 1
- IANKFTPPKZJKNC-UHFFFAOYSA-N N-carbamoylformamide fluorosilane Chemical group [SiH3]F.NC(=O)NC=O IANKFTPPKZJKNC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 150000003568 thioethers Chemical group 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US566707P | 2007-12-05 | 2007-12-05 | |
| US12/328,122 US8153834B2 (en) | 2007-12-05 | 2008-12-04 | Surface modified inorganic particles |
| PCT/US2008/085612 WO2009076179A2 (en) | 2007-12-05 | 2008-12-05 | Inorganic particles hydrophobized with fluoroalkyl silanes |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015001906A Division JP5956617B2 (ja) | 2007-12-05 | 2015-01-07 | フルオロアルキルシランでの無機粒子疎水化 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011506240A JP2011506240A (ja) | 2011-03-03 |
| JP2011506240A5 true JP2011506240A5 (enExample) | 2012-01-26 |
Family
ID=40631578
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010537095A Withdrawn JP2011506240A (ja) | 2007-12-05 | 2008-12-05 | フルオロアルキルシランでの無機粒子疎水化 |
| JP2015001906A Expired - Fee Related JP5956617B2 (ja) | 2007-12-05 | 2015-01-07 | フルオロアルキルシランでの無機粒子疎水化 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015001906A Expired - Fee Related JP5956617B2 (ja) | 2007-12-05 | 2015-01-07 | フルオロアルキルシランでの無機粒子疎水化 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8153834B2 (enExample) |
| EP (1) | EP2231786B1 (enExample) |
| JP (2) | JP2011506240A (enExample) |
| KR (1) | KR101544235B1 (enExample) |
| CN (1) | CN101932661B (enExample) |
| CA (1) | CA2706702C (enExample) |
| NZ (1) | NZ585501A (enExample) |
| WO (1) | WO2009076179A2 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102216361B (zh) * | 2008-11-14 | 2014-01-29 | 纳幕尔杜邦公司 | 含氟聚合物组合物和处理的基底 |
| US8324314B2 (en) | 2009-10-12 | 2012-12-04 | E.I. Du Pont De Nemours And Company | Fluoropolymer compositions and treated substrates |
| US8258341B2 (en) * | 2009-07-10 | 2012-09-04 | E.I. Du Pont De Nemours And Company | Polyfluorosulfonamido amine and intermediate |
| US9777161B1 (en) | 2010-08-16 | 2017-10-03 | The United States Of America As Represented By The Secretary Of The Air Force | Fluoroalkylsilanated mesoporous metal oxide particles and methods of preparation thereof |
| US8741432B1 (en) * | 2010-08-16 | 2014-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Fluoroalkylsilanated mesoporous metal oxide particles and methods of preparation thereof |
| US8981140B1 (en) | 2010-08-18 | 2015-03-17 | The United States Of America As Represented By The Secretary Of The Air Force | Peripherally aromatic silsesquioxanes featuring reactive functionality: synthesis and applications thereof |
| WO2012032868A1 (ja) * | 2010-09-09 | 2012-03-15 | Hoya株式会社 | 表面修飾チタニア粒子の製造方法、チタニア粒子分散液およびチタニア粒子分散樹脂 |
| CN102432742B (zh) * | 2011-09-09 | 2013-08-07 | 中科院广州化学有限公司 | 一种超双疏性聚合物及由其构筑的超双疏性表面 |
| US9249313B2 (en) | 2011-09-21 | 2016-02-02 | The United States Of America As Represented By The Secretary Of The Air Force | Synthesis of functional fluorinated polyhedral oligomeric silsesquioxane (F-POSS) |
| KR101369381B1 (ko) * | 2011-11-04 | 2014-03-06 | 에스케이이노베이션 주식회사 | 함불소 화합물을 포함하는 저굴절 코팅 조성물, 이를 이용한 반사방지 필름, 이를 포함하는 편광판 및 표시장치 |
| CN102604467B (zh) * | 2012-01-13 | 2013-12-25 | 中科院广州化学有限公司 | 一种高分散型含氟纳米微球和环氧树脂超双疏性表面 |
| US9217064B2 (en) | 2013-01-24 | 2015-12-22 | The United States Of America, As Represented By The Secretary Of The Air Force | Thermosetting resins with enhanced cure characteristics containing organofunctional silane moieties |
| US9394408B2 (en) | 2013-08-29 | 2016-07-19 | The United States Of America As Represented By The Secretary Of The Air Force | Controlled polymerization of functional fluorinated polyhedral oligomeric silsesquioxane monomers |
| WO2016176388A1 (en) * | 2015-04-30 | 2016-11-03 | The Chemours Company Tt, Llc | Crosslinkable fluorinated inorganic oxide particle for architectural coatings |
| CN106390764B (zh) * | 2015-07-28 | 2018-10-12 | 北京工业大学 | 一种多孔膜的超疏水疏油改性方法 |
| EP3589695A4 (en) | 2017-03-03 | 2021-01-20 | The Government of the United States of America, as represented by the Secretary of the Navy | MOISTURE-CURING OMNIPHOBIC COATINGS |
| CN109868652A (zh) * | 2019-03-07 | 2019-06-11 | 扬州金泉旅游用品有限公司 | 一种制备疏水和防污的织物和布料的方法 |
| KR102531723B1 (ko) * | 2020-11-06 | 2023-05-11 | 도레이첨단소재 주식회사 | 이형필름 및 이의 제조방법 |
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| US3719698A (en) * | 1967-11-27 | 1973-03-06 | Stevens & Co Inc J P | Polyfluorinated esters of acids containing silicon and amino groups |
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| JPH0393605A (ja) * | 1989-09-01 | 1991-04-18 | Asahi Glass Co Ltd | 金属酸化物微粉末の流動性の改善の方法 |
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| JPH08127733A (ja) * | 1994-11-01 | 1996-05-21 | Shiseido Co Ltd | 撥水性撥油性固体およびその製造方法 |
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| JP3196621B2 (ja) * | 1995-04-20 | 2001-08-06 | 信越化学工業株式会社 | 水溶性表面処理剤 |
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| JPH09309745A (ja) | 1996-05-24 | 1997-12-02 | Central Glass Co Ltd | 撥水撥油性物品及びその製法 |
| JPH10139930A (ja) | 1996-11-07 | 1998-05-26 | Kansai Shin Gijutsu Kenkyusho:Kk | 反応性粒子 |
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| DE19938551A1 (de) | 1999-08-18 | 2001-02-22 | Penth Bernd | Hydrophobe Beschichtung |
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| DE10051182A1 (de) | 2000-10-16 | 2002-05-02 | Nano X Gmbh | Nanopartikel mit hydrophoben und oleophoben Eigenschaften, deren Verarbeitung und Verwendung |
| DE10106213A1 (de) | 2001-02-10 | 2002-08-22 | Dmc2 Degussa Metals Catalysts Cerdec Ag | Selbstreinigende Lackbeschichtungen und Verfahren und Mittel zur Herstellung derselben |
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| DE10139574A1 (de) * | 2001-08-10 | 2003-02-20 | Creavis Tech & Innovation Gmbh | Erhalt des Lotus-Effektes durch Verhinderung des Mikrobenwachstums auf selbstreinigenden Oberflächen |
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| DE10209297A1 (de) | 2002-03-01 | 2003-09-18 | Koenig & Bauer Ag | Oberfläche für Maschinenteile einer Druckmaschine |
| CN1454921A (zh) | 2002-03-01 | 2003-11-12 | 刘铁林 | 纳米氟碳双疏膜的制备及生成方法 |
| DE10210673A1 (de) * | 2002-03-12 | 2003-09-25 | Creavis Tech & Innovation Gmbh | Spritzgusskörper mit selbstreinigenden Eigenschaften und Verfahren zur Herstellung solcher Spritzgusskörper |
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| DE10210666A1 (de) * | 2002-03-12 | 2003-10-02 | Creavis Tech & Innovation Gmbh | Formgebungsverfahren zur Herstellung von Formkörpern mit zumindest einer Oberfläche, die selbstreinigende Eigenschaften aufweist sowie mit diesem Verfahren hergestellte Formkörper |
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| US6790904B2 (en) * | 2002-06-03 | 2004-09-14 | Ppg Industries Ohio, Inc. | Liquid coating of film-forming resin and particles chemically modified to lower surface tension |
| DE10231757A1 (de) * | 2002-07-13 | 2004-01-22 | Creavis Gesellschaft Für Technologie Und Innovation Mbh | Verfahren zur Herstellung einer tensidfreien Suspension auf wässriger basis von nanostrukturierten, hydrophoben Partikeln und deren Verwendung |
| DE10242560A1 (de) * | 2002-09-13 | 2004-03-25 | Creavis Gesellschaft Für Technologie Und Innovation Mbh | Herstellung von selbstreinigenden Oberflächen auf textilen Beschichtungen |
| CN100477319C (zh) * | 2002-09-19 | 2009-04-08 | 大金工业株式会社 | 以图案表面为模板的材料及其制造方法 |
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| CN1614128A (zh) | 2003-11-05 | 2005-05-11 | 北京中科安康医疗用品有限公司 | 超双疏阻隔性杀菌防病毒织物及其制法和用于医务工作服 |
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| KR100607716B1 (ko) | 2004-04-22 | 2006-08-01 | 한국화학연구원 | 불소계 지문방지제와 이의 제조방법 |
| TW200615424A (en) | 2004-07-20 | 2006-05-16 | Schoeller Textil Ag | Finishings for textile fibres and babrics to give hydrophobic oleophobic and self-cleaning surfaces |
| CN1727566A (zh) | 2004-07-29 | 2006-02-01 | 只金芳 | 纳米拒水拒油剂及其在防寒服面料、领带中的应用 |
| DE102004037752A1 (de) | 2004-08-04 | 2006-03-16 | Cognis Deutschland Gmbh & Co. Kg | Ausgerüstete Fasern und textile Flächengebilde |
| DE102004046568A1 (de) | 2004-09-24 | 2006-04-06 | Construction Research & Technology Gmbh | Fluormodifizierte Reaktivharzsysteme, Verfahren zu ihrer Herstellung und deren Verwendung |
| US20080090004A1 (en) | 2004-10-05 | 2008-04-17 | Hua Zhang | Hydrophobic and Lyophobic Coating |
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| DE102004062740A1 (de) * | 2004-12-27 | 2006-07-13 | Degussa Ag | Verfahren zur Erhöhung der Wasserdichtigkeit von textilen Flächengebilden, so ausgerüstete textile Flächengebilde sowie deren Verwendung |
| DE102004062739A1 (de) * | 2004-12-27 | 2006-07-06 | Degussa Ag | Selbstreinigende Oberflächen mit durch hydrophobe Partikel gebildeten Erhebungen, mit verbesserter mechanischer Festigkeit |
| DE102004062742A1 (de) * | 2004-12-27 | 2006-07-06 | Degussa Ag | Textile Substrate mit selbstreinigenden Eigenschaften (Lotuseffekt) |
| US8058463B2 (en) * | 2007-12-04 | 2011-11-15 | E. I. Du Pont De Nemours And Compnay | Fluorosilanes |
-
2008
- 2008-12-04 US US12/328,122 patent/US8153834B2/en not_active Expired - Fee Related
- 2008-12-05 CN CN200880126116.2A patent/CN101932661B/zh not_active Expired - Fee Related
- 2008-12-05 KR KR1020107014618A patent/KR101544235B1/ko not_active Expired - Fee Related
- 2008-12-05 EP EP08859173.0A patent/EP2231786B1/en not_active Not-in-force
- 2008-12-05 NZ NZ585501A patent/NZ585501A/en not_active IP Right Cessation
- 2008-12-05 WO PCT/US2008/085612 patent/WO2009076179A2/en not_active Ceased
- 2008-12-05 CA CA2706702A patent/CA2706702C/en not_active Expired - Fee Related
- 2008-12-05 JP JP2010537095A patent/JP2011506240A/ja not_active Withdrawn
-
2015
- 2015-01-07 JP JP2015001906A patent/JP5956617B2/ja not_active Expired - Fee Related
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