JP2011501434A5 - - Google Patents
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- Publication number
- JP2011501434A5 JP2011501434A5 JP2010529950A JP2010529950A JP2011501434A5 JP 2011501434 A5 JP2011501434 A5 JP 2011501434A5 JP 2010529950 A JP2010529950 A JP 2010529950A JP 2010529950 A JP2010529950 A JP 2010529950A JP 2011501434 A5 JP2011501434 A5 JP 2011501434A5
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- wafer
- cleaning head
- channels
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims description 60
- 239000011538 cleaning material Substances 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 12
- 239000000356 contaminant Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- 238000005202 decontamination Methods 0.000 claims 3
- 230000003588 decontaminative effect Effects 0.000 claims 3
- 230000007723 transport mechanism Effects 0.000 claims 2
- 239000000839 emulsion Substances 0.000 claims 1
- 239000006260 foam Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 1
- 229920005591 polysilicon Polymers 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 10
- 238000011835 investigation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US98106007P | 2007-10-18 | 2007-10-18 | |
| US60/981,060 | 2007-10-18 | ||
| PCT/US2008/011830 WO2009051763A2 (en) | 2007-10-18 | 2008-10-15 | Apparatus and methods for optimizing cleaning of patterned substrates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011501434A JP2011501434A (ja) | 2011-01-06 |
| JP2011501434A5 true JP2011501434A5 (https=) | 2011-12-01 |
| JP5444233B2 JP5444233B2 (ja) | 2014-03-19 |
Family
ID=40562222
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010529950A Expired - Fee Related JP5444233B2 (ja) | 2007-10-18 | 2008-10-15 | パターン基板の洗浄を最適化する装置および方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20090101166A1 (https=) |
| JP (1) | JP5444233B2 (https=) |
| KR (1) | KR20100076032A (https=) |
| CN (1) | CN101828252B (https=) |
| TW (1) | TWI443721B (https=) |
| WO (1) | WO2009051763A2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8105997B2 (en) * | 2008-11-07 | 2012-01-31 | Lam Research Corporation | Composition and application of a two-phase contaminant removal medium |
| CN111370298A (zh) * | 2020-04-16 | 2020-07-03 | 上海华虹宏力半导体制造有限公司 | 半导体衬底清洗方法及调整方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2956494A (en) * | 1956-01-13 | 1960-10-18 | Kelvin & Hughes Ltd | Application of liquid to surfaces |
| JP3511442B2 (ja) * | 1996-12-18 | 2004-03-29 | 忠弘 大見 | 洗浄やエッチング、現像、剥離等を含むウエット処理に用いる省液型の液体供給ノズル、省液型の液体供給ノズル装置及びウエット処理装置 |
| JPH10294261A (ja) * | 1997-04-18 | 1998-11-04 | Sony Corp | レジスト塗布装置 |
| US5870793A (en) * | 1997-05-02 | 1999-02-16 | Integrated Process Equipment Corp. | Brush for scrubbing semiconductor wafers |
| US7389783B2 (en) * | 2002-09-30 | 2008-06-24 | Lam Research Corporation | Proximity meniscus manifold |
| US8236382B2 (en) * | 2002-09-30 | 2012-08-07 | Lam Research Corporation | Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same |
| US7392815B2 (en) * | 2003-03-31 | 2008-07-01 | Lam Research Corporation | Chamber for wafer cleaning and method for making the same |
| US7799141B2 (en) * | 2003-06-27 | 2010-09-21 | Lam Research Corporation | Method and system for using a two-phases substrate cleaning compound |
| US8522801B2 (en) * | 2003-06-27 | 2013-09-03 | Lam Research Corporation | Method and apparatus for cleaning a semiconductor substrate |
| US20050126605A1 (en) * | 2003-12-15 | 2005-06-16 | Coreflow Scientific Solutions Ltd. | Apparatus and method for cleaning surfaces |
| US8522799B2 (en) * | 2005-12-30 | 2013-09-03 | Lam Research Corporation | Apparatus and system for cleaning a substrate |
-
2008
- 2008-10-14 US US12/250,955 patent/US20090101166A1/en not_active Abandoned
- 2008-10-15 WO PCT/US2008/011830 patent/WO2009051763A2/en not_active Ceased
- 2008-10-15 CN CN200880113115.4A patent/CN101828252B/zh not_active Expired - Fee Related
- 2008-10-15 KR KR1020107010799A patent/KR20100076032A/ko not_active Abandoned
- 2008-10-15 JP JP2010529950A patent/JP5444233B2/ja not_active Expired - Fee Related
- 2008-10-17 TW TW097139858A patent/TWI443721B/zh not_active IP Right Cessation
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