JP2011501361A - 溶液処理された電子デバイス用のバックプレーン構造 - Google Patents

溶液処理された電子デバイス用のバックプレーン構造 Download PDF

Info

Publication number
JP2011501361A
JP2011501361A JP2010530061A JP2010530061A JP2011501361A JP 2011501361 A JP2011501361 A JP 2011501361A JP 2010530061 A JP2010530061 A JP 2010530061A JP 2010530061 A JP2010530061 A JP 2010530061A JP 2011501361 A JP2011501361 A JP 2011501361A
Authority
JP
Japan
Prior art keywords
backplane
electrode
layer
bank
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010530061A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011501361A5 (enExample
Inventor
エー.ツァイ ヨウ−ミン
シュタイナー マシュー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2011501361A publication Critical patent/JP2011501361A/ja
Publication of JP2011501361A5 publication Critical patent/JP2011501361A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/122Pixel-defining structures or layers, e.g. banks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14Carrier transporting layers
    • H10K50/16Electron transporting layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301Details of OLEDs
    • H10K2102/351Thickness
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2010530061A 2007-10-15 2008-10-14 溶液処理された電子デバイス用のバックプレーン構造 Pending JP2011501361A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US98001907P 2007-10-15 2007-10-15
PCT/US2008/079799 WO2009052089A1 (en) 2007-10-15 2008-10-14 Backplane structures for solution processed electronic devices

Publications (2)

Publication Number Publication Date
JP2011501361A true JP2011501361A (ja) 2011-01-06
JP2011501361A5 JP2011501361A5 (enExample) 2011-11-17

Family

ID=40379051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010530061A Pending JP2011501361A (ja) 2007-10-15 2008-10-14 溶液処理された電子デバイス用のバックプレーン構造

Country Status (5)

Country Link
US (1) US20090098680A1 (enExample)
JP (1) JP2011501361A (enExample)
KR (1) KR20100108510A (enExample)
TW (1) TW200929537A (enExample)
WO (1) WO2009052089A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012132292A1 (ja) * 2011-03-25 2012-10-04 凸版印刷株式会社 有機el表示素子、有機el表示装置、及びこれらの製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012028278A1 (en) 2010-09-02 2012-03-08 Merck Patent Gmbh Interlayer for electronic devices
WO2013159881A2 (en) 2012-04-25 2013-10-31 Merck Patent Gmbh Bank structures for organic electronic devices
US8658444B2 (en) 2012-05-16 2014-02-25 International Business Machines Corporation Semiconductor active matrix on buried insulator
WO2014044359A1 (en) 2012-09-21 2014-03-27 Merck Patent Gmbh Organic semiconductor formulations
US10326076B2 (en) * 2015-04-13 2019-06-18 Boe Technology Group Co., Ltd. Method of manufacturing display substrate, display substrate and display device
KR102704022B1 (ko) * 2019-09-23 2024-09-05 엘지디스플레이 주식회사 표시장치 및 이의 제조방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003272871A (ja) * 2002-03-14 2003-09-26 Toshiba Corp 自己発光表示装置およびその製造方法
JP2005268202A (ja) * 2004-02-16 2005-09-29 Seiko Epson Corp 有機エレクトロルミネッセンス装置、有機エレクトロルミネッセンス装置の製造方法、及び電子機器
JP2005340208A (ja) * 2004-05-25 2005-12-08 Samsung Sdi Co Ltd 有機エレクトロルミネッセンス表示装置及びその製造方法
JP2006286309A (ja) * 2005-03-31 2006-10-19 Toppan Printing Co Ltd 有機el表示装置とその製造方法
JP2007172896A (ja) * 2005-12-20 2007-07-05 Casio Comput Co Ltd 表示装置及びその製造方法

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2604071B2 (ja) * 1991-05-14 1997-04-23 株式会社東芝 半導体装置の製造方法
JP3240858B2 (ja) * 1994-10-19 2001-12-25 ソニー株式会社 カラー表示装置
US5550066A (en) * 1994-12-14 1996-08-27 Eastman Kodak Company Method of fabricating a TFT-EL pixel
JP2694126B2 (ja) * 1995-02-06 1997-12-24 インターナショナル・ビジネス・マシーンズ・コーポレイション 液晶表示装置及びその製造方法
US5994721A (en) * 1995-06-06 1999-11-30 Ois Optical Imaging Systems, Inc. High aperture LCD with insulating color filters overlapping bus lines on active substrate
JPH09127524A (ja) * 1995-11-06 1997-05-16 Sharp Corp 液晶表示素子
US6616496B1 (en) * 2000-06-14 2003-09-09 Ritdisplay Corporation Method of forming a polyimide-isolating wall of reverse-trapezoid cross-section with electric, thermal and mechanical stability
US6670645B2 (en) * 2000-06-30 2003-12-30 E. I. Du Pont De Nemours And Company Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds
JP3793402B2 (ja) * 2000-07-28 2006-07-05 株式会社日立製作所 カラー液晶表示装置
US6515428B1 (en) * 2000-11-24 2003-02-04 Industrial Technology Research Institute Pixel structure an organic light-emitting diode display device and its manufacturing method
US7317205B2 (en) * 2001-09-10 2008-01-08 Semiconductor Energy Laboratory Co., Ltd. Light emitting device and method of manufacturing a semiconductor device
JP4362250B2 (ja) * 2001-10-16 2009-11-11 Nec液晶テクノロジー株式会社 液晶表示装置及びその製造方法
JP3705264B2 (ja) * 2001-12-18 2005-10-12 セイコーエプソン株式会社 表示装置及び電子機器
US6815723B2 (en) * 2001-12-28 2004-11-09 Semiconductor Energy Laboratory Co., Ltd. Light emitting device, method of manufacturing the same, and manufacturing apparatus therefor
JP4047586B2 (ja) * 2002-01-10 2008-02-13 Nec液晶テクノロジー株式会社 横電界方式のアクティブマトリクス型液晶表示装置
SG126714A1 (en) * 2002-01-24 2006-11-29 Semiconductor Energy Lab Light emitting device and method of manufacturing the same
US7098069B2 (en) * 2002-01-24 2006-08-29 Semiconductor Energy Laboratory Co., Ltd. Light emitting device, method of preparing the same and device for fabricating the same
JP3818261B2 (ja) * 2002-01-24 2006-09-06 セイコーエプソン株式会社 発光装置及び電子機器
JP3481232B2 (ja) * 2002-03-05 2003-12-22 三洋電機株式会社 有機エレクトロルミネッセンスパネルの製造方法
US7038239B2 (en) * 2002-04-09 2006-05-02 Semiconductor Energy Laboratory Co., Ltd. Semiconductor element and display device using the same
JP3989763B2 (ja) * 2002-04-15 2007-10-10 株式会社半導体エネルギー研究所 半導体表示装置
JP4463493B2 (ja) * 2002-04-15 2010-05-19 株式会社半導体エネルギー研究所 表示装置及びその作製方法
JP2004055461A (ja) * 2002-07-23 2004-02-19 Seiko Epson Corp 発光装置及びその製造方法、並びに電子機器
US6821811B2 (en) * 2002-08-02 2004-11-23 Semiconductor Energy Laboratory Co., Ltd. Organic thin film transistor and method of manufacturing the same, and semiconductor device having the organic thin film transistor
KR100504472B1 (ko) * 2002-09-05 2005-08-04 엘지전자 주식회사 유기 el 소자 및 그 제조 방법
CN100466285C (zh) * 2002-09-11 2009-03-04 株式会社半导体能源研究所 发光装置及其制造方法
WO2004029128A2 (en) * 2002-09-24 2004-04-08 E.I. Du Pont De Nemours And Company Water dispersible polythiophenes made with polymeric acid colloids
CN1681869B (zh) * 2002-09-24 2010-05-26 E.I.内穆尔杜邦公司 用于电子器件用聚合物酸胶体制成的可水分散的聚苯胺
JP2004140267A (ja) * 2002-10-18 2004-05-13 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP2004192935A (ja) * 2002-12-11 2004-07-08 Hitachi Displays Ltd 有機el表示装置
JP4176487B2 (ja) * 2003-01-15 2008-11-05 株式会社 日立ディスプレイズ 液晶表示装置
JP2004361491A (ja) * 2003-06-02 2004-12-24 Seiko Epson Corp カラーフィルタ基板の製造方法、エレクトロルミネッセンス基板の製造方法、電気光学装置及びその製造方法、並びに電子機器及びその製造方法
KR20050029426A (ko) * 2003-09-22 2005-03-28 삼성에스디아이 주식회사 칼라필터층 또는 색변환층을 갖는 풀칼라 유기전계발광소자
KR100552972B1 (ko) * 2003-10-09 2006-02-15 삼성에스디아이 주식회사 평판표시장치 및 그의 제조방법
JP4165478B2 (ja) * 2003-11-07 2008-10-15 セイコーエプソン株式会社 発光装置及び電子機器
JP3915810B2 (ja) * 2004-02-26 2007-05-16 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置、その製造方法、及び電子機器
US7351358B2 (en) * 2004-03-17 2008-04-01 E.I. Du Pont De Nemours And Company Water dispersible polypyrroles made with polymeric acid colloids for electronics applications
KR101003829B1 (ko) * 2004-04-30 2010-12-23 엘지디스플레이 주식회사 씨오티 구조 액정표시장치 및 그 제조 방법
JP2006059668A (ja) * 2004-08-20 2006-03-02 Seiko Epson Corp 有機エレクトロルミネッセンス装置及び有機エレクトロルミネッセンス装置の製造方法ならびに電子機器
KR100699996B1 (ko) * 2004-09-02 2007-03-26 삼성에스디아이 주식회사 회로 측정용 패드를 포함하는 유기전계발광표시장치와 그제조방법
US20060057478A1 (en) * 2004-09-15 2006-03-16 Samsung Electronics Co., Ltd. Panel for display device and manufacturing method thereof
KR101145146B1 (ko) * 2005-04-07 2012-05-14 엘지디스플레이 주식회사 박막트랜지스터와 그 제조방법
KR20060125303A (ko) * 2005-06-02 2006-12-06 삼성전자주식회사 디스플레이장치 및 그 제조방법
US8563331B2 (en) * 2005-06-03 2013-10-22 E. I. Du Pont De Nemours And Company Process for fabricating and repairing an electronic device
KR101240656B1 (ko) * 2005-08-01 2013-03-08 삼성디스플레이 주식회사 평판표시장치와 평판표시장치의 제조방법
KR100754875B1 (ko) * 2005-11-07 2007-09-04 삼성전자주식회사 표시장치와 그 제조방법
KR101084166B1 (ko) * 2006-01-13 2011-11-17 삼성모바일디스플레이주식회사 픽셀 구조 및 이를 구비한 유기 전계 발광소자
US7482186B2 (en) * 2006-04-07 2009-01-27 Chunghwa Picture Tubes, Ltd. Method for fabricating active matrix organic light emitting diode display device and structure of such device
US7923719B2 (en) * 2006-04-28 2011-04-12 Semiconductor Energy Laboratory Co., Ltd. Semiconductor memory device wherein wiring contact is made through an opening in an organic compound layer
KR101240657B1 (ko) * 2006-04-28 2013-03-08 삼성디스플레이 주식회사 표시장치와 그 제조방법
KR101163791B1 (ko) * 2006-05-16 2012-07-10 삼성전자주식회사 유기 전자소자의 전극형성 방법, 이에 의해 형성된 전극을포함하는 유기박막 트랜지스터 및 이를 포함하는 표시소자
JP4211804B2 (ja) * 2006-05-19 2009-01-21 セイコーエプソン株式会社 デバイス、膜形成方法及びデバイスの製造方法
KR101288427B1 (ko) * 2006-08-07 2013-08-07 삼성디스플레이 주식회사 표시 기판 및 그 제조방법
JP2008065300A (ja) * 2006-08-11 2008-03-21 Nec Lcd Technologies Ltd 液晶表示装置
US20080128685A1 (en) * 2006-09-26 2008-06-05 Hiroyuki Honda Organic semiconductor device, manufacturing method of same, organic transistor array, and display
KR101269002B1 (ko) * 2006-10-25 2013-05-29 엘지디스플레이 주식회사 횡전계 방식 액정표시장치용 어레이기판과 그 제조방법
US7635864B2 (en) * 2007-11-27 2009-12-22 Lg Electronics Inc. Organic light emitting device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003272871A (ja) * 2002-03-14 2003-09-26 Toshiba Corp 自己発光表示装置およびその製造方法
JP2005268202A (ja) * 2004-02-16 2005-09-29 Seiko Epson Corp 有機エレクトロルミネッセンス装置、有機エレクトロルミネッセンス装置の製造方法、及び電子機器
JP2005340208A (ja) * 2004-05-25 2005-12-08 Samsung Sdi Co Ltd 有機エレクトロルミネッセンス表示装置及びその製造方法
JP2006286309A (ja) * 2005-03-31 2006-10-19 Toppan Printing Co Ltd 有機el表示装置とその製造方法
JP2007172896A (ja) * 2005-12-20 2007-07-05 Casio Comput Co Ltd 表示装置及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012132292A1 (ja) * 2011-03-25 2012-10-04 凸版印刷株式会社 有機el表示素子、有機el表示装置、及びこれらの製造方法
JPWO2012132292A1 (ja) * 2011-03-25 2014-07-24 凸版印刷株式会社 有機el表示素子、有機el表示装置、及びこれらの製造方法

Also Published As

Publication number Publication date
US20090098680A1 (en) 2009-04-16
WO2009052089A1 (en) 2009-04-23
TW200929537A (en) 2009-07-01
KR20100108510A (ko) 2010-10-07

Similar Documents

Publication Publication Date Title
US8772774B2 (en) Backplane structures for organic light emitting electronic devices using a TFT substrate
US9306185B2 (en) Process and materials for making contained layers and devices made with same
US20110201207A1 (en) Backplane structures for solution processed electronic devices
JP2012510706A (ja) 有機電子デバイス用のアノード
US20110227075A1 (en) Backplane structures for solution processed electronic devices
JP2012510705A (ja) 有機電子デバイス用のアノード
JP2011511422A (ja) 溶液処理された電子デバイスを作製するための構造
JP2011501361A (ja) 溶液処理された電子デバイス用のバックプレーン構造
JP2011501360A (ja) 溶液処理された電子デバイス
US8846441B2 (en) Anode for an organic electronic device
JP2010541168A (ja) 溶液処理された電子デバイス用のバックプレーン構造体
JP2011501864A (ja) 溶液処理された電子デバイス用のバックプレーン構造
JP2012511237A (ja) 溶液処理された電子デバイス用のバックプレーン構造

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110930

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110930

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120712

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120727

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20121029

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20121105

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20121127

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20121204

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130726

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131017

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20140204

RD13 Notification of appointment of power of sub attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7433

Effective date: 20140509

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20140509

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150907