KR20100108510A - 용액 처리된 전자 소자용 백플레인 구조물 - Google Patents
용액 처리된 전자 소자용 백플레인 구조물 Download PDFInfo
- Publication number
- KR20100108510A KR20100108510A KR1020107010641A KR20107010641A KR20100108510A KR 20100108510 A KR20100108510 A KR 20100108510A KR 1020107010641 A KR1020107010641 A KR 1020107010641A KR 20107010641 A KR20107010641 A KR 20107010641A KR 20100108510 A KR20100108510 A KR 20100108510A
- Authority
- KR
- South Korea
- Prior art keywords
- backplane
- layer
- electrode
- bank
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/16—Electron transporting layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US98001907P | 2007-10-15 | 2007-10-15 | |
| US60/980,019 | 2007-10-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20100108510A true KR20100108510A (ko) | 2010-10-07 |
Family
ID=40379051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020107010641A Ceased KR20100108510A (ko) | 2007-10-15 | 2008-10-14 | 용액 처리된 전자 소자용 백플레인 구조물 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20090098680A1 (enExample) |
| JP (1) | JP2011501361A (enExample) |
| KR (1) | KR20100108510A (enExample) |
| TW (1) | TW200929537A (enExample) |
| WO (1) | WO2009052089A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012028278A1 (en) | 2010-09-02 | 2012-03-08 | Merck Patent Gmbh | Interlayer for electronic devices |
| JPWO2012132292A1 (ja) * | 2011-03-25 | 2014-07-24 | 凸版印刷株式会社 | 有機el表示素子、有機el表示装置、及びこれらの製造方法 |
| WO2013159881A2 (en) | 2012-04-25 | 2013-10-31 | Merck Patent Gmbh | Bank structures for organic electronic devices |
| US8658444B2 (en) | 2012-05-16 | 2014-02-25 | International Business Machines Corporation | Semiconductor active matrix on buried insulator |
| WO2014044359A1 (en) | 2012-09-21 | 2014-03-27 | Merck Patent Gmbh | Organic semiconductor formulations |
| US10326076B2 (en) * | 2015-04-13 | 2019-06-18 | Boe Technology Group Co., Ltd. | Method of manufacturing display substrate, display substrate and display device |
| KR102704022B1 (ko) * | 2019-09-23 | 2024-09-05 | 엘지디스플레이 주식회사 | 표시장치 및 이의 제조방법 |
Family Cites Families (62)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2604071B2 (ja) * | 1991-05-14 | 1997-04-23 | 株式会社東芝 | 半導体装置の製造方法 |
| JP3240858B2 (ja) * | 1994-10-19 | 2001-12-25 | ソニー株式会社 | カラー表示装置 |
| US5550066A (en) * | 1994-12-14 | 1996-08-27 | Eastman Kodak Company | Method of fabricating a TFT-EL pixel |
| JP2694126B2 (ja) * | 1995-02-06 | 1997-12-24 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 液晶表示装置及びその製造方法 |
| US5994721A (en) * | 1995-06-06 | 1999-11-30 | Ois Optical Imaging Systems, Inc. | High aperture LCD with insulating color filters overlapping bus lines on active substrate |
| JPH09127524A (ja) * | 1995-11-06 | 1997-05-16 | Sharp Corp | 液晶表示素子 |
| US6616496B1 (en) * | 2000-06-14 | 2003-09-09 | Ritdisplay Corporation | Method of forming a polyimide-isolating wall of reverse-trapezoid cross-section with electric, thermal and mechanical stability |
| US6670645B2 (en) * | 2000-06-30 | 2003-12-30 | E. I. Du Pont De Nemours And Company | Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds |
| JP3793402B2 (ja) * | 2000-07-28 | 2006-07-05 | 株式会社日立製作所 | カラー液晶表示装置 |
| US6515428B1 (en) * | 2000-11-24 | 2003-02-04 | Industrial Technology Research Institute | Pixel structure an organic light-emitting diode display device and its manufacturing method |
| US7317205B2 (en) * | 2001-09-10 | 2008-01-08 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing a semiconductor device |
| JP4362250B2 (ja) * | 2001-10-16 | 2009-11-11 | Nec液晶テクノロジー株式会社 | 液晶表示装置及びその製造方法 |
| JP3705264B2 (ja) * | 2001-12-18 | 2005-10-12 | セイコーエプソン株式会社 | 表示装置及び電子機器 |
| US6815723B2 (en) * | 2001-12-28 | 2004-11-09 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device, method of manufacturing the same, and manufacturing apparatus therefor |
| JP4047586B2 (ja) * | 2002-01-10 | 2008-02-13 | Nec液晶テクノロジー株式会社 | 横電界方式のアクティブマトリクス型液晶表示装置 |
| SG126714A1 (en) * | 2002-01-24 | 2006-11-29 | Semiconductor Energy Lab | Light emitting device and method of manufacturing the same |
| US7098069B2 (en) * | 2002-01-24 | 2006-08-29 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device, method of preparing the same and device for fabricating the same |
| JP3818261B2 (ja) * | 2002-01-24 | 2006-09-06 | セイコーエプソン株式会社 | 発光装置及び電子機器 |
| JP3481232B2 (ja) * | 2002-03-05 | 2003-12-22 | 三洋電機株式会社 | 有機エレクトロルミネッセンスパネルの製造方法 |
| JP2003272871A (ja) * | 2002-03-14 | 2003-09-26 | Toshiba Corp | 自己発光表示装置およびその製造方法 |
| US7038239B2 (en) * | 2002-04-09 | 2006-05-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor element and display device using the same |
| JP3989763B2 (ja) * | 2002-04-15 | 2007-10-10 | 株式会社半導体エネルギー研究所 | 半導体表示装置 |
| JP4463493B2 (ja) * | 2002-04-15 | 2010-05-19 | 株式会社半導体エネルギー研究所 | 表示装置及びその作製方法 |
| JP2004055461A (ja) * | 2002-07-23 | 2004-02-19 | Seiko Epson Corp | 発光装置及びその製造方法、並びに電子機器 |
| US6821811B2 (en) * | 2002-08-02 | 2004-11-23 | Semiconductor Energy Laboratory Co., Ltd. | Organic thin film transistor and method of manufacturing the same, and semiconductor device having the organic thin film transistor |
| KR100504472B1 (ko) * | 2002-09-05 | 2005-08-04 | 엘지전자 주식회사 | 유기 el 소자 및 그 제조 방법 |
| CN100466285C (zh) * | 2002-09-11 | 2009-03-04 | 株式会社半导体能源研究所 | 发光装置及其制造方法 |
| WO2004029128A2 (en) * | 2002-09-24 | 2004-04-08 | E.I. Du Pont De Nemours And Company | Water dispersible polythiophenes made with polymeric acid colloids |
| CN1681869B (zh) * | 2002-09-24 | 2010-05-26 | E.I.内穆尔杜邦公司 | 用于电子器件用聚合物酸胶体制成的可水分散的聚苯胺 |
| JP2004140267A (ja) * | 2002-10-18 | 2004-05-13 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
| JP2004192935A (ja) * | 2002-12-11 | 2004-07-08 | Hitachi Displays Ltd | 有機el表示装置 |
| JP4176487B2 (ja) * | 2003-01-15 | 2008-11-05 | 株式会社 日立ディスプレイズ | 液晶表示装置 |
| JP2004361491A (ja) * | 2003-06-02 | 2004-12-24 | Seiko Epson Corp | カラーフィルタ基板の製造方法、エレクトロルミネッセンス基板の製造方法、電気光学装置及びその製造方法、並びに電子機器及びその製造方法 |
| KR20050029426A (ko) * | 2003-09-22 | 2005-03-28 | 삼성에스디아이 주식회사 | 칼라필터층 또는 색변환층을 갖는 풀칼라 유기전계발광소자 |
| KR100552972B1 (ko) * | 2003-10-09 | 2006-02-15 | 삼성에스디아이 주식회사 | 평판표시장치 및 그의 제조방법 |
| JP4165478B2 (ja) * | 2003-11-07 | 2008-10-15 | セイコーエプソン株式会社 | 発光装置及び電子機器 |
| JP2005268202A (ja) * | 2004-02-16 | 2005-09-29 | Seiko Epson Corp | 有機エレクトロルミネッセンス装置、有機エレクトロルミネッセンス装置の製造方法、及び電子機器 |
| JP3915810B2 (ja) * | 2004-02-26 | 2007-05-16 | セイコーエプソン株式会社 | 有機エレクトロルミネッセンス装置、その製造方法、及び電子機器 |
| US7351358B2 (en) * | 2004-03-17 | 2008-04-01 | E.I. Du Pont De Nemours And Company | Water dispersible polypyrroles made with polymeric acid colloids for electronics applications |
| KR101003829B1 (ko) * | 2004-04-30 | 2010-12-23 | 엘지디스플레이 주식회사 | 씨오티 구조 액정표시장치 및 그 제조 방법 |
| KR20050112456A (ko) * | 2004-05-25 | 2005-11-30 | 삼성에스디아이 주식회사 | 유기전계발광표시장치 및 그의 제조방법 |
| JP2006059668A (ja) * | 2004-08-20 | 2006-03-02 | Seiko Epson Corp | 有機エレクトロルミネッセンス装置及び有機エレクトロルミネッセンス装置の製造方法ならびに電子機器 |
| KR100699996B1 (ko) * | 2004-09-02 | 2007-03-26 | 삼성에스디아이 주식회사 | 회로 측정용 패드를 포함하는 유기전계발광표시장치와 그제조방법 |
| US20060057478A1 (en) * | 2004-09-15 | 2006-03-16 | Samsung Electronics Co., Ltd. | Panel for display device and manufacturing method thereof |
| JP2006286309A (ja) * | 2005-03-31 | 2006-10-19 | Toppan Printing Co Ltd | 有機el表示装置とその製造方法 |
| KR101145146B1 (ko) * | 2005-04-07 | 2012-05-14 | 엘지디스플레이 주식회사 | 박막트랜지스터와 그 제조방법 |
| KR20060125303A (ko) * | 2005-06-02 | 2006-12-06 | 삼성전자주식회사 | 디스플레이장치 및 그 제조방법 |
| US8563331B2 (en) * | 2005-06-03 | 2013-10-22 | E. I. Du Pont De Nemours And Company | Process for fabricating and repairing an electronic device |
| KR101240656B1 (ko) * | 2005-08-01 | 2013-03-08 | 삼성디스플레이 주식회사 | 평판표시장치와 평판표시장치의 제조방법 |
| KR100754875B1 (ko) * | 2005-11-07 | 2007-09-04 | 삼성전자주식회사 | 표시장치와 그 제조방법 |
| JP4251329B2 (ja) * | 2005-12-20 | 2009-04-08 | カシオ計算機株式会社 | 表示装置及びその製造方法 |
| KR101084166B1 (ko) * | 2006-01-13 | 2011-11-17 | 삼성모바일디스플레이주식회사 | 픽셀 구조 및 이를 구비한 유기 전계 발광소자 |
| US7482186B2 (en) * | 2006-04-07 | 2009-01-27 | Chunghwa Picture Tubes, Ltd. | Method for fabricating active matrix organic light emitting diode display device and structure of such device |
| US7923719B2 (en) * | 2006-04-28 | 2011-04-12 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor memory device wherein wiring contact is made through an opening in an organic compound layer |
| KR101240657B1 (ko) * | 2006-04-28 | 2013-03-08 | 삼성디스플레이 주식회사 | 표시장치와 그 제조방법 |
| KR101163791B1 (ko) * | 2006-05-16 | 2012-07-10 | 삼성전자주식회사 | 유기 전자소자의 전극형성 방법, 이에 의해 형성된 전극을포함하는 유기박막 트랜지스터 및 이를 포함하는 표시소자 |
| JP4211804B2 (ja) * | 2006-05-19 | 2009-01-21 | セイコーエプソン株式会社 | デバイス、膜形成方法及びデバイスの製造方法 |
| KR101288427B1 (ko) * | 2006-08-07 | 2013-08-07 | 삼성디스플레이 주식회사 | 표시 기판 및 그 제조방법 |
| JP2008065300A (ja) * | 2006-08-11 | 2008-03-21 | Nec Lcd Technologies Ltd | 液晶表示装置 |
| US20080128685A1 (en) * | 2006-09-26 | 2008-06-05 | Hiroyuki Honda | Organic semiconductor device, manufacturing method of same, organic transistor array, and display |
| KR101269002B1 (ko) * | 2006-10-25 | 2013-05-29 | 엘지디스플레이 주식회사 | 횡전계 방식 액정표시장치용 어레이기판과 그 제조방법 |
| US7635864B2 (en) * | 2007-11-27 | 2009-12-22 | Lg Electronics Inc. | Organic light emitting device |
-
2008
- 2008-10-14 US US12/250,788 patent/US20090098680A1/en not_active Abandoned
- 2008-10-14 WO PCT/US2008/079799 patent/WO2009052089A1/en not_active Ceased
- 2008-10-14 JP JP2010530061A patent/JP2011501361A/ja active Pending
- 2008-10-14 KR KR1020107010641A patent/KR20100108510A/ko not_active Ceased
- 2008-10-15 TW TW097139641A patent/TW200929537A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20090098680A1 (en) | 2009-04-16 |
| WO2009052089A1 (en) | 2009-04-23 |
| TW200929537A (en) | 2009-07-01 |
| JP2011501361A (ja) | 2011-01-06 |
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