JP2011229920A - 流体の流れが改善された灌注式アブレーションカテーテル - Google Patents
流体の流れが改善された灌注式アブレーションカテーテル Download PDFInfo
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Abstract
【解決手段】灌注式アブレーションカテーテル10は、薄いシェル及びプレナムチャンバを与えるためのプラグを有する先端電極17を含む。先端電極は、所定のサイズ及び非円形の形状を有する流入口と、薄いシェル壁に形成された流体ポートの形態の複数の流出口を有する。複数の流体ポート及びその直径は所定のものである。すなわち、先端電極は流体入力面積に対する全流体出力面積の拡散比と、流体ポート比を考慮したものとなっている。先端電極はまた、流体流入口のアスペクト比も考慮しており、流体流入口は、非円形の径方向の断面を有している。プレナムチャンバは、より広い遠位側部分に開く狭い近位側部分を有することにより、流体の圧力が低下する一方で流体の速度が大きくなって乱流が増大する所望の効果が得られ、これにより運動量が減少して先端電極内に流体がより均一に分配される。
【選択図】図1
Description
本願は2010年4月28日出願の米国特許出願第12/769,592号の継続出願であり、当該出願の全容を本願に援用するものである。
本発明は、心組織のアブレーション及び電気的活動の検知に特に有用な電気生理学的カテーテルに関する。
比流入口=L/W 式(1)
式中、
Lは、大きい方(長さ方向)の寸法であり、
Wは、小さい方(幅方向)の寸法である。
比流入口≧1 式(2)
比ポート=T/D 式(3)
式中、
T=シェル壁の厚さであり、
D=流体ポートの直径である。
比ポート<3.25 式(4)
比ポート≦1.5 式(5)
比ポート≦1.0 式(6)
P外部=先端電極の外部の放出周囲圧、
P内部=先端電極の内部の灌注管の遠位端の上流圧、
ΔP外部−内部=流体ポートにおける圧力損失、
V外部=先端電極の外部の速度、
V内部=先端電極の内部の速度、
ρ=密度。
Q=体積流量、
D内部=隣り合う流体ポート間の間隔により推定される流体ポートに向かう理論上の直径、
D外部=流体ポートの直径]
流体中の圧力低下は、下記式(10)によって表すことができる。
ΔP=ρ(8Q2)/(π2D外部 4) 式(11)
比拡散=A出力/A入力 式(12)
式中、
A出力は、シェルのすべての流体ポートの全体の面積であり、
A入力は、灌注管の遠位端の流入口の面積である。
2.0>比拡散 式(13a)
1.8>比拡散 式(13b)
1.3>比拡散 式(13c)
Q=単位時間当たりに流れる流体の体積、
ΔP=管路の端部間の圧力差、
r=管路の半径、
L=管路の長さ、
η=与えられた流体の特性の1つである動粘度。
(1) 細長いカテーテル本体と、
前記カテーテル本体の遠位側の偏向可能な部分と、
前記偏向可能な部分の遠位側の先端電極であって、
空洞を形成する外側シェルであって、それぞれが前記先端電極の全流体出力面積に寄与する複数の所定の流体ポートを有する、外側シェルと、
流体入力面積を有する、前記先端電極への流体流入口を含む内部部材と、を備える、先端電極と、を備え、
前記先端電極が2.0よりも小さい拡散比を有する、灌注式アブレーションカテーテル。
(2) 前記拡散比が、流体入力面積に対する全流体出力面積の比を含む、実施態様1に記載のカテーテル。
(3) 前記先端電極が、3.25よりも小さい流体ポート比を有する、実施態様1に記載のカテーテル。
(4) 前記拡散比が約1.8よりも小さい、実施態様1に記載のカテーテル。
(5) 前記先端電極が、約1.5よりも小さい流体ポート比を有する、実施態様1に記載のカテーテル。
(6) 前記空洞がプレナム特性を示す、実施態様1に記載のカテーテル。
(7) 前記シェルが、内側の断面が変化するチャンバを有する、実施態様1に記載のカテーテル。
(8) 前記シェルが遠位側部分と近位側部分とを有するチャンバを有し、前記遠位側部分がより大きな径方向の断面を有し、前記近位側部分がより小さい径方向の断面を有する、実施態様1に記載のカテーテル。
(9) 前記シェルが、前記遠位側部分と前記近位側部分とを連結するテーパ部分を有する、実施態様8に記載のカテーテル。
(10) 前記流体流入口が、1.0よりも大きい流入口アスペクト比を有する、実施態様1に記載のカテーテル。
(12) 前記シェルが、約0.076mm(約0.003インチ)〜0.25mm(0.010インチ)のシェル壁の厚さを有する、実施態様1に記載のカテーテル。
(13) 各流体ポートが、約0.10mm(約0.004インチ)〜0.076mm(0.003インチ)の直径を有する、実施態様1に記載のカテーテル。
(14) 前記複数の所定のポートが約96個〜40個の範囲である、実施態様1に記載のカテーテル。
(15) 細長いカテーテル本体と、
前記カテーテル本体の遠位側の偏向可能な部分と、
前記偏向可能な部分の遠位側の先端電極であって、それぞれが前記先端電極の全流体出力面積に寄与する複数の所定の流体ポートを有するとともに、流体入力面積を有する流体流入口を有する、先端電極と、を備え、
前記先端電極が約1.8よりも小さい拡散比を有する、灌注式アブレーションカテーテル。
(16) 細長いカテーテル本体と、
前記カテーテル本体の遠位側の偏向可能な部分と、
前記偏向可能な部分の遠位側の先端電極であって、
空洞を形成する外側シェルであって、それぞれが前記先端電極の全流体出力面積に寄与する複数の所定の流体ポートを有する、外側シェルと、
流体入力面積を有する、前記先端電極への流体流入口を含む内部部材と、を備える、先端電極と、を備え、
前記先端電極が、所定の拡散比、所定の流体ポート比及び所定の流入口アスペクト比、並びに内側の断面が変化するチャンバを有し、
前記空洞が前記先端電極の長さに沿って変化する内側の断面を有する、灌注式アブレーションカテーテル。
(17) 前記内側の断面が、前記先端電極の遠位端に向かって大きくなる、実施態様16に記載のカテーテル。
(18) 前記所定の拡散比が約1.8よりも小さい、実施態様16に記載のカテーテル。
(19) 前記所定の流体ポート比が約1.5よりも小さい、実施態様16に記載のカテーテル。
(20) 前記所定の流入口アスペクト比が1.0よりも大きい、実施態様16に記載のカテーテル。
Claims (21)
- 細長いカテーテル本体と、
前記カテーテル本体の遠位側の偏向可能な部分と、
前記偏向可能な部分の遠位側の先端電極であって、
空洞を形成する外側シェルであって、それぞれが前記先端電極の全流体出力面積に寄与する複数の所定の流体ポートを有する、外側シェルと、
流体入力面積を有する、前記先端電極への流体流入口を含む内部部材と、を備える、先端電極と、を備え、
前記先端電極が2.0よりも小さい拡散比を有する、灌注式アブレーションカテーテル。 - 前記拡散比が、流体入力面積に対する全流体出力面積の比を含む、請求項1に記載のカテーテル。
- 前記先端電極が、3.25よりも小さい流体ポート比を有する、請求項1に記載のカテーテル。
- 前記拡散比が約1.8よりも小さい、請求項1に記載のカテーテル。
- 前記先端電極が、約1.5よりも小さい流体ポート比を有する、請求項1に記載のカテーテル。
- 前記空洞がプレナム特性を示す、請求項1に記載のカテーテル。
- 前記シェルが、内側の断面が変化するチャンバを有する、請求項1に記載のカテーテル。
- 前記シェルが遠位側部分と近位側部分とを有するチャンバを有し、前記遠位側部分がより大きな径方向の断面を有し、前記近位側部分がより小さい径方向の断面を有する、請求項1に記載のカテーテル。
- 前記シェルが、前記遠位側部分と前記近位側部分とを連結するテーパ部分を有する、請求項8に記載のカテーテル。
- 前記流体流入口が、1.0よりも大きい流入口アスペクト比を有する、請求項1に記載のカテーテル。
- 前記内部部材が、バッフル部材とプラグ部材とを含む、請求項1に記載のカテーテル。
- 前記シェルが、約0.076mm(約0.003インチ)〜0.25mm(0.010インチ)のシェル壁の厚さを有する、請求項1に記載のカテーテル。
- 各流体ポートが、約0.10mm(約0.004インチ)〜0.076mm(0.003インチ)の直径を有する、請求項1に記載のカテーテル。
- 前記複数の所定のポートが約96個〜40個の範囲である、請求項1に記載のカテーテル。
- 細長いカテーテル本体と、
前記カテーテル本体の遠位側の偏向可能な部分と、
前記偏向可能な部分の遠位側の先端電極であって、それぞれが前記先端電極の全流体出力面積に寄与する複数の所定の流体ポートを有するとともに、流体入力面積を有する流体流入口を有する、先端電極と、を備え、
前記先端電極が約1.8よりも小さい拡散比を有する、灌注式アブレーションカテーテル。 - 細長いカテーテル本体と、
前記カテーテル本体の遠位側の偏向可能な部分と、
前記偏向可能な部分の遠位側の先端電極であって、
空洞を形成する外側シェルであって、それぞれが前記先端電極の全流体出力面積に寄与する複数の所定の流体ポートを有する、外側シェルと、
流体入力面積を有する、前記先端電極への流体流入口を含む内部部材と、を備える、先端電極と、を備え、
前記先端電極が、所定の拡散比、所定の流体ポート比及び所定の流入口アスペクト比、並びに内側の断面が変化するチャンバを有し、
前記空洞が前記先端電極の長さに沿って変化する内側の断面を有する、灌注式アブレーションカテーテル。 - 前記内側の断面が、前記先端電極の遠位端に向かって大きくなる、請求項16に記載のカテーテル。
- 前記所定の拡散比が約1.8よりも小さい、請求項16に記載のカテーテル。
- 前記所定の流体ポート比が約1.5よりも小さい、請求項16に記載のカテーテル。
- 前記所定の流入口アスペクト比が1.0よりも大きい、請求項16に記載のカテーテル。
- 前記流体流入口が非円形の断面を有する、請求項16に記載のカテーテル。
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2010
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- 2011-04-27 JP JP2011099075A patent/JP6081048B2/ja active Active
- 2011-04-27 EP EP11163898.7A patent/EP2382935B1/en active Active
- 2011-04-27 IL IL212510A patent/IL212510B/en active IP Right Grant
- 2011-04-27 ES ES12151275T patent/ES2703102T3/es active Active
- 2011-04-27 AU AU2011201883A patent/AU2011201883A1/en not_active Abandoned
- 2011-04-27 EP EP12151275.0A patent/EP2444019B8/en active Active
- 2011-04-28 CN CN201110118159.XA patent/CN102232870B/zh active Active
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Also Published As
Publication number | Publication date |
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US20110270246A1 (en) | 2011-11-03 |
US20180228541A1 (en) | 2018-08-16 |
RU2011116765A (ru) | 2012-11-10 |
CA2738000A1 (en) | 2011-10-28 |
CA2738000C (en) | 2019-06-04 |
AU2016201304A1 (en) | 2016-03-17 |
EP2382935B1 (en) | 2018-03-14 |
ES2703102T3 (es) | 2019-03-07 |
US9943363B2 (en) | 2018-04-17 |
IL212510A0 (en) | 2011-07-31 |
EP2382935A1 (en) | 2011-11-02 |
AU2016201304B2 (en) | 2017-08-31 |
CN102232870B (zh) | 2015-09-30 |
JP6081048B2 (ja) | 2017-02-15 |
AU2011201883A1 (en) | 2011-11-17 |
EP2444019A1 (en) | 2012-04-25 |
EP2444019B1 (en) | 2018-11-14 |
CN102232870A (zh) | 2011-11-09 |
EP2444019B8 (en) | 2019-01-02 |
IL212510B (en) | 2019-06-30 |
US10925667B2 (en) | 2021-02-23 |
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