JP2011174167A5 - - Google Patents
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- Publication number
- JP2011174167A5 JP2011174167A5 JP2010170331A JP2010170331A JP2011174167A5 JP 2011174167 A5 JP2011174167 A5 JP 2011174167A5 JP 2010170331 A JP2010170331 A JP 2010170331A JP 2010170331 A JP2010170331 A JP 2010170331A JP 2011174167 A5 JP2011174167 A5 JP 2011174167A5
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- copper
- niobium
- atoms
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010949 copper Substances 0.000 claims 34
- 239000010955 niobium Substances 0.000 claims 32
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 17
- 229910052802 copper Inorganic materials 0.000 claims 17
- 229910052758 niobium Inorganic materials 0.000 claims 16
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 16
- 238000004519 manufacturing process Methods 0.000 claims 8
- 239000012535 impurity Substances 0.000 claims 6
- 239000013081 microcrystal Substances 0.000 claims 6
- 238000010438 heat treatment Methods 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 239000000470 constituent Substances 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 238000005245 sintering Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 238000000748 compression moulding Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 238000002834 transmittance Methods 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010170331A JP5641402B2 (ja) | 2010-02-01 | 2010-07-29 | 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法 |
| US13/576,567 US20120301673A1 (en) | 2010-02-01 | 2010-12-28 | Oxide film, process for producing same, target, and process for producing sintered oxide |
| PCT/JP2010/073700 WO2011092993A1 (ja) | 2010-02-01 | 2010-12-28 | 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法 |
| CN201080062959.8A CN102741448B (zh) | 2010-02-01 | 2010-12-28 | 氧化物膜及其制造方法、与靶及氧化物烧结体的制造方法 |
| KR1020127020398A KR20120112716A (ko) | 2010-02-01 | 2010-12-28 | 산화물 막 및 그 제조 방법, 및 타겟 및 산화물 소결체의 제조 방법 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010020343 | 2010-02-01 | ||
| JP2010020343 | 2010-02-01 | ||
| JP2010170331A JP5641402B2 (ja) | 2010-02-01 | 2010-07-29 | 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011174167A JP2011174167A (ja) | 2011-09-08 |
| JP2011174167A5 true JP2011174167A5 (cg-RX-API-DMAC7.html) | 2013-08-15 |
| JP5641402B2 JP5641402B2 (ja) | 2014-12-17 |
Family
ID=44318992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010170331A Expired - Fee Related JP5641402B2 (ja) | 2010-02-01 | 2010-07-29 | 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20120301673A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5641402B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20120112716A (cg-RX-API-DMAC7.html) |
| CN (1) | CN102741448B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2011092993A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5996227B2 (ja) * | 2012-03-26 | 2016-09-21 | 学校法人 龍谷大学 | 酸化物膜及びその製造方法 |
| WO2015170534A1 (ja) * | 2014-05-08 | 2015-11-12 | 三井金属鉱業株式会社 | スパッタリングターゲット材 |
| JP6503928B2 (ja) * | 2015-06-29 | 2019-04-24 | コニカミノルタ株式会社 | 電子写真感光体、画像形成装置および画像形成方法 |
| WO2018092598A1 (ja) * | 2016-11-17 | 2018-05-24 | 日本化学工業株式会社 | 亜酸化銅粒子、その製造方法、光焼結型組成物、それを用いた導電膜の形成方法及び亜酸化銅粒子ペースト |
| JP7172902B2 (ja) * | 2019-07-29 | 2022-11-16 | トヨタ自動車株式会社 | 酸素吸蔵材 |
| CN111678927A (zh) * | 2020-06-08 | 2020-09-18 | 首钢集团有限公司 | 一种钢铁表面氧化物的分析方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU4964397A (en) * | 1996-11-15 | 1998-06-10 | Citizen Watch Co. Ltd. | Method of manufacturing thermionic element |
| JP4446064B2 (ja) * | 2004-07-07 | 2010-04-07 | 独立行政法人産業技術総合研究所 | 熱電変換素子及び熱電変換モジュール |
| US7657377B2 (en) * | 2007-05-31 | 2010-02-02 | Cbg Corporation | Azimuthal measurement-while-drilling (MWD) tool |
| JP2009047969A (ja) * | 2007-08-21 | 2009-03-05 | Seiko Epson Corp | プロジェクタおよび表示装置 |
| JP2009246085A (ja) * | 2008-03-31 | 2009-10-22 | Hitachi Ltd | 半導体装置およびその製造方法 |
| JP2010031346A (ja) * | 2008-07-02 | 2010-02-12 | Central Glass Co Ltd | 酸化亜鉛薄膜及び薄膜積層体 |
-
2010
- 2010-07-29 JP JP2010170331A patent/JP5641402B2/ja not_active Expired - Fee Related
- 2010-12-28 WO PCT/JP2010/073700 patent/WO2011092993A1/ja not_active Ceased
- 2010-12-28 KR KR1020127020398A patent/KR20120112716A/ko not_active Ceased
- 2010-12-28 US US13/576,567 patent/US20120301673A1/en not_active Abandoned
- 2010-12-28 CN CN201080062959.8A patent/CN102741448B/zh not_active Expired - Fee Related
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