JP2011066376A - プラスチック基板及びその製造方法 - Google Patents
プラスチック基板及びその製造方法 Download PDFInfo
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Abstract
【解決手段】プラスチック基板の製造方法は、有機基板上120に反応性モノマーを含む保護膜用組成物132を塗布するステップと、反応性モノマーを高分子化して保護膜130を形成するステップとを含む。保護膜用組成物132は、アクリレート系の低温硬化型反応性モノマーを高分子化することを含むことができる。
【選択図】図1
Description
110,130 保護膜
112,132 保護膜用組成物
114,134 無機ナノ粒子
Claims (18)
- 前記組成物は、前記組成物内に分散された無機ナノ粒子をさらに含む請求項1〜3の何れかに記載のプラスチック基板の製造方法。
- 前記無機ナノ粒子は、前記組成物内で分散系を構成する請求項4に記載のプラスチック基板の製造方法。
- 前記無機ナノ粒子は、100nm以下の直径を有する請求項4又は5に記載のプラスチック基板の製造方法。
- 前記組成物内の前記無機ナノ粒子の含有量は、5〜40wt%である請求項4〜6の何れかに記載のプラスチック基板の製造方法。
- 前記無機ナノ粒子は、シリコンオキサイド、チタンオキサイド、シリコンナイトライド、シリコン、スメクタイト(smectite)、カオリナイト(kaolinite)、ディッカイト(dickite)、ナクライト(nacrite)、ハロイサイト(halloysite)、アンチゴライト(antigorite)、クリソタイル(chrysotile)、パイロフィライト(pyrophyllite)、モンモリロナイト(montmorillonite)、ヘクトライト(hectorite)、テトラシリリックマイカ、ナトリウムテニオライト、白雲母、真珠雲母、滑石、バーミキュライト(vermiculite)、金雲母、ザンソフィライト及び緑泥石の中から選択される少なくとも一つを含む請求項4〜7の何れかに記載のプラスチック基板の製造方法。
- 前記組成物は、ウェット工程により塗布される請求項1〜8の何れかに記載のプラスチック基板の製造方法。
- 前記ウェット工程は、スピンコート、ディップコート及びバーコート方式の中から選択される少なくとも一つを含む請求項9に記載のプラスチック基板の製造方法。
- 前記組成物は、重合開始剤をさらに含み、
前記重合開始剤は、光開始剤、熱開始剤、レドックス開始剤及び酸開始剤の中から選択される少なくとも一つを含む請求項1〜10の何れかに記載のプラスチック基板の製造方法。 - 前記基板上に塗布される組成物は、前記反応性モノマーが溶解される有機溶媒をさらに含み、
前記有機溶媒は、前記高分子化するステップ及び/又は前記高分子化以後に除去される請求項1〜11の何れかに記載のプラスチック基板の製造方法。 - 前記保護膜は、前記保護膜内に分散された無機ナノ粒子をさらに含む請求項13に記載のプラスチック基板。
- 前記保護膜の厚さは、0.1μm〜3μmである請求項13〜16の何れかに記載のプラスチック基板。
- 前記保護膜は、前記有機基板の上部面及び下部面の上に配置される請求項13〜17の何れかに記載のプラスチック基板。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090087734A KR20110029881A (ko) | 2009-09-16 | 2009-09-16 | 플라스틱 기판 및 이의 제조방법 |
Publications (1)
Publication Number | Publication Date |
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JP2011066376A true JP2011066376A (ja) | 2011-03-31 |
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ID=43730871
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Application Number | Title | Priority Date | Filing Date |
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JP2010003819A Pending JP2011066376A (ja) | 2009-09-16 | 2010-01-12 | プラスチック基板及びその製造方法 |
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Country | Link |
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US (1) | US20110064945A1 (ja) |
JP (1) | JP2011066376A (ja) |
KR (1) | KR20110029881A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104745026B (zh) * | 2015-02-11 | 2016-09-14 | 长兴艾飞特科技股份有限公司 | 一种复合型抗菌水性光油的制备方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5989316A (ja) * | 1982-11-12 | 1984-05-23 | Mitsui Toatsu Chem Inc | 紫外線硬化ソルダ−レジストインク組成物 |
JPH0895242A (ja) * | 1994-09-28 | 1996-04-12 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント及びプリント配線板の製造法 |
JP2002169285A (ja) * | 2000-11-30 | 2002-06-14 | Nippon Steel Chem Co Ltd | 光又は熱硬化性樹脂組成物及びプリント配線基板 |
WO2004095093A1 (ja) * | 2003-04-23 | 2004-11-04 | Taiyo Ink Mfg. Co., Ltd. | 光導波路、光電気混載基板および該光電気混載基板の製造方法 |
JP2007162027A (ja) * | 2002-03-29 | 2007-06-28 | Taiyo Ink Mfg Ltd | 不飽和基含有多分岐化合物、それを含有する硬化性組成物及びその硬化物 |
JP2008226947A (ja) * | 2007-03-09 | 2008-09-25 | Seiko Epson Corp | 配線基板の製造方法及び製造装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6025017A (en) * | 1997-05-21 | 2000-02-15 | Ncr Corporation | Photopolymerizable coating formulation for thermal transfer media |
US6358601B1 (en) * | 1997-07-11 | 2002-03-19 | 3M Innovative Properties Company | Antistatic ceramer hardcoat composition with improved antistatic characteristics |
US6268695B1 (en) * | 1998-12-16 | 2001-07-31 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
US8187726B2 (en) * | 2005-08-09 | 2012-05-29 | Sony Corporation | Nanoparticle-resin composite material, light emitting device assembly, and filling material for the light-emitting device assembly |
DE102006016642A1 (de) * | 2006-04-08 | 2007-10-18 | Bayer Materialscience Ag | UV-härtende Schutzschicht für thermoplastische Substrate |
US20070238804A1 (en) * | 2006-04-11 | 2007-10-11 | Encai Ho | UV-curable hard coating compositions |
-
2009
- 2009-09-16 KR KR1020090087734A patent/KR20110029881A/ko not_active Application Discontinuation
-
2010
- 2010-01-12 JP JP2010003819A patent/JP2011066376A/ja active Pending
- 2010-04-27 US US12/768,247 patent/US20110064945A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5989316A (ja) * | 1982-11-12 | 1984-05-23 | Mitsui Toatsu Chem Inc | 紫外線硬化ソルダ−レジストインク組成物 |
JPH0895242A (ja) * | 1994-09-28 | 1996-04-12 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント及びプリント配線板の製造法 |
JP2002169285A (ja) * | 2000-11-30 | 2002-06-14 | Nippon Steel Chem Co Ltd | 光又は熱硬化性樹脂組成物及びプリント配線基板 |
JP2007162027A (ja) * | 2002-03-29 | 2007-06-28 | Taiyo Ink Mfg Ltd | 不飽和基含有多分岐化合物、それを含有する硬化性組成物及びその硬化物 |
WO2004095093A1 (ja) * | 2003-04-23 | 2004-11-04 | Taiyo Ink Mfg. Co., Ltd. | 光導波路、光電気混載基板および該光電気混載基板の製造方法 |
JP2008226947A (ja) * | 2007-03-09 | 2008-09-25 | Seiko Epson Corp | 配線基板の製造方法及び製造装置 |
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Publication number | Publication date |
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US20110064945A1 (en) | 2011-03-17 |
KR20110029881A (ko) | 2011-03-23 |
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