JP2011062975A - 成形用金型及びその金型表面の加工方法 - Google Patents
成形用金型及びその金型表面の加工方法 Download PDFInfo
- Publication number
- JP2011062975A JP2011062975A JP2009217128A JP2009217128A JP2011062975A JP 2011062975 A JP2011062975 A JP 2011062975A JP 2009217128 A JP2009217128 A JP 2009217128A JP 2009217128 A JP2009217128 A JP 2009217128A JP 2011062975 A JP2011062975 A JP 2011062975A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- mold surface
- ion beam
- cluster ion
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000465 moulding Methods 0.000 title claims abstract description 20
- 238000003672 processing method Methods 0.000 title description 4
- 239000012778 molding material Substances 0.000 claims abstract description 9
- 238000010884 ion-beam technique Methods 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 20
- 238000005259 measurement Methods 0.000 claims description 15
- 230000007423 decrease Effects 0.000 claims description 14
- 238000012545 processing Methods 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000005499 meniscus Effects 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 8
- 230000004520 agglutination Effects 0.000 abstract 1
- 235000019592 roughness Nutrition 0.000 description 27
- 230000003746 surface roughness Effects 0.000 description 23
- 239000011347 resin Substances 0.000 description 22
- 229920005989 resin Polymers 0.000 description 22
- 238000002474 experimental method Methods 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 238000000089 atomic force micrograph Methods 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 229910001315 Tool steel Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 208000032544 Cicatrix Diseases 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 238000009412 basement excavation Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 230000037387 scars Effects 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
【解決手段】成形材料と接触する金型表面の、測定領域10μm角以下で測定される算術平均粗さRaを5nm以下とし、かつ金型表面に直径10〜80nm、高さが10〜40nmの範囲にある粒状の微細凸構造物を密度400個/μm2以上で形成する。アンカー効果や掘り起こしによる摩擦力を低減しながら、メニスカスによる凝着力も同時に低減する。
【選択図】なし
Description
射出成形用金型の樹脂接触面の表面構造と樹脂の離型性との関係を調べた。
金型1:#400番の砥石による研削面
金型2:#600番の砥石による研削面
金型3:#600番の砥石による研削面にガスクラスターイオンビームの照射を行っ
たもの
とした。ガスクラスターイオンビームの照射条件は、Arクラスターイオンビームを用い、加速エネルギー20keV、照射量5.0×1017ions/cm2とした。
実験1と同型の射出成形用金型(材料はSKD11)の樹脂接触面に対し、種々の照射条件でガスクラスターイオンビームを照射した場合の表面構造と離型性との関係を調べた。
SKD11(工具鋼)とV20(タングステンカーバイドとバインダーであるCoからなる超硬材料)で実験1と同型の金型を製作し、ガスクラスターイオンビームの照射量と表面形状変化との関係を調べた。
実験1〜3の結果に基づき、金型の表面構造と離型抵抗との関係について考察する。
Claims (3)
- 成形材料と接触する金型表面の、測定領域10μm角以下で測定される算術平均粗さRaが5nm以下とされ、かつ前記金型表面に直径が10〜80nm、高さが10〜40nmの範囲にある粒状の微細凸構造物が密度400個/μm2以上で形成されていることを特徴とする成形用金型。
- 成形用金型における成形材料と接触する金型表面の加工方法であって、
金型表面の測定領域10μm角以下で測定される算術平均粗さRaと、金型表面に対するガスクラスターイオンビームの照射量との関係において、算術平均粗さRaが照射量の増加と共に減少した後、照射量の増加と共に増大して一定値に到達した時の照射量以上でガスクラスターイオンビームを金型表面に照射することを特徴とする金型表面の加工方法。 - 成形用金型における成形材料と接触する金型表面の加工方法であって、
金型表面の測定領域10μm角以下で測定される算術平均粗さRaと、金型表面に対するガスクラスターイオンビームの照射量との関係において、算術平均粗さRaが照射量の増加と共に減少した後、照射量の増加と共に増大して一定値に到達した時の照射量以上でガスクラスターイオンビームを金型表面に照射することにより、金型表面の、測定領域10μm角以下で測定される算術平均粗さRaを5nm以下とし、かつ前記金型表面に直径10〜80nm、高さが10〜40nmの範囲にある粒状の微細凸構造物を密度400個/μm2以上で形成することを特徴とする金型表面の加工方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009217128A JP5561978B2 (ja) | 2009-09-18 | 2009-09-18 | 成形用金型及びその金型表面の加工方法 |
CN201010277812.2A CN102019673B (zh) | 2009-09-18 | 2010-09-08 | 成型用模具及模具表面的加工方法 |
US12/877,985 US20110068503A1 (en) | 2009-09-18 | 2010-09-08 | Mold Tool and Treatment Method for Mold Tool Surface |
TW99131243A TWI413583B (zh) | 2009-09-18 | 2010-09-15 | 成形用模具及該模具表面的加工方法 |
US13/913,335 US9056405B2 (en) | 2009-09-18 | 2013-06-07 | Treatment method for mold tool surface |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009217128A JP5561978B2 (ja) | 2009-09-18 | 2009-09-18 | 成形用金型及びその金型表面の加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011062975A true JP2011062975A (ja) | 2011-03-31 |
JP5561978B2 JP5561978B2 (ja) | 2014-07-30 |
Family
ID=43755940
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009217128A Active JP5561978B2 (ja) | 2009-09-18 | 2009-09-18 | 成形用金型及びその金型表面の加工方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US20110068503A1 (ja) |
JP (1) | JP5561978B2 (ja) |
CN (1) | CN102019673B (ja) |
TW (1) | TWI413583B (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015078124A (ja) * | 2015-01-27 | 2015-04-23 | 日本航空電子工業株式会社 | 無機固体材料および刃物工具 |
JP2016030379A (ja) * | 2014-07-29 | 2016-03-07 | 株式会社M&T | 樹脂成型用金型 |
WO2017026057A1 (ja) * | 2015-08-11 | 2017-02-16 | 株式会社不二製作所 | 透明樹脂成型用金型の表面処理方法及び透明樹脂成型用金型,並びに透明樹脂成型品 |
US9999983B2 (en) | 2012-08-31 | 2018-06-19 | Japan Aviation Electronics Industry, Limited | Chipping-proof inorganic solid-state material and chipping-proof edge tool |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2381015B1 (en) | 2005-08-12 | 2019-01-16 | Modumetal, Inc. | Compositionally modulated composite materials |
BR122013014461B1 (pt) | 2009-06-08 | 2020-10-20 | Modumetal, Inc | revestimento de multicamadas resistente à corrosão em um substrato e método de eletrodeposição para produção de um revestimento de multicamada |
WO2014146114A1 (en) | 2013-03-15 | 2014-09-18 | Modumetal, Inc. | Nanolaminate coatings |
CN105143521B (zh) | 2013-03-15 | 2020-07-10 | 莫杜美拓有限公司 | 用于连续施加纳米叠层金属涂层的方法和装置 |
CN105189826B (zh) | 2013-03-15 | 2019-07-16 | 莫杜美拓有限公司 | 通过添加制造工艺制备的制品的电沉积的组合物和纳米层压合金 |
CN108486622B (zh) | 2013-03-15 | 2020-10-30 | 莫杜美拓有限公司 | 具有高硬度的镍铬纳米层压涂层 |
JP5683640B2 (ja) * | 2013-05-20 | 2015-03-11 | 日本航空電子工業株式会社 | 刃物工具 |
KR102267680B1 (ko) * | 2013-11-29 | 2021-06-22 | 에베 그룹 에. 탈너 게엠베하 | 다이 구조물을 가지는 다이, 뿐만 아니라 이의 제조 방법 |
EP3194642A4 (en) | 2014-09-18 | 2018-07-04 | Modumetal, Inc. | A method and apparatus for continuously applying nanolaminate metal coatings |
AR102068A1 (es) | 2014-09-18 | 2017-02-01 | Modumetal Inc | Métodos de preparación de artículos por electrodeposición y procesos de fabricación aditiva |
US11365488B2 (en) | 2016-09-08 | 2022-06-21 | Modumetal, Inc. | Processes for providing laminated coatings on workpieces, and articles made therefrom |
US20180071980A1 (en) * | 2016-09-09 | 2018-03-15 | Modumetal, Inc. | The application of laminate and nanolaminate materials to tooling and molding processes |
US20190360116A1 (en) | 2016-09-14 | 2019-11-28 | Modumetal, Inc. | System for reliable, high throughput, complex electric field generation, and method for producing coatings therefrom |
US12076965B2 (en) | 2016-11-02 | 2024-09-03 | Modumetal, Inc. | Topology optimized high interface packing structures |
CA3060619A1 (en) | 2017-04-21 | 2018-10-25 | Modumetal, Inc. | Tubular articles with electrodeposited coatings, and systems and methods for producing the same |
US11519093B2 (en) | 2018-04-27 | 2022-12-06 | Modumetal, Inc. | Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation |
US20220176727A1 (en) * | 2020-12-04 | 2022-06-09 | Lexmark International, Inc. | Tag System to Mitigate Maliciously Tainted and Counterfeit Products |
CN114193239B (zh) * | 2021-12-15 | 2023-04-18 | 深圳市南和建毅模具有限公司 | 一种模芯加工工艺 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1160254A (ja) * | 1997-08-07 | 1999-03-02 | Matsushita Electric Ind Co Ltd | プレス成形用金型及び磁気ディスク用ガラス基板 |
JP2005014567A (ja) * | 2003-06-30 | 2005-01-20 | Mino Kanagata:Kk | 樹脂成形金型と該樹脂成形金型の製造方法 |
JP2008276907A (ja) * | 2007-03-30 | 2008-11-13 | Fujifilm Corp | モールド構造体、及びそれを用いたインプリント方法、並びに磁気記録媒体及びその製造方法 |
JP2008307735A (ja) * | 2007-06-13 | 2008-12-25 | Towa Corp | 樹脂成形用金型 |
JP2009045925A (ja) * | 2007-07-23 | 2009-03-05 | Asahi Glass Co Ltd | ナノインプリント用モールドおよびその製造方法 |
JP2009096191A (ja) * | 2007-09-28 | 2009-05-07 | Tokyo Metropolitan Industrial Technology Research Institute | 微細成形型および微細成形型用基材並びに微細成形型の製造方法 |
JP2011042063A (ja) * | 2009-08-19 | 2011-03-03 | Olympus Corp | 金型の製造方法及び光学素子 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3451140B2 (ja) * | 1994-10-26 | 2003-09-29 | 科学技術振興事業団 | ガスクラスターイオンビームによる超精密研磨加工方法 |
US6814897B2 (en) * | 1998-03-27 | 2004-11-09 | Discovision Associates | Method for manufacturing a molding tool used for substrate molding |
TWI230002B (en) * | 2000-10-17 | 2005-03-21 | Nissha Printing | Antireflective molded product and its manufacture method, mold for antireflective molded product |
JP2002226221A (ja) * | 2000-11-30 | 2002-08-14 | Ngk Insulators Ltd | ガラスプレス用金型及びその製造方法 |
JP4665443B2 (ja) * | 2004-06-22 | 2011-04-06 | 旭硝子株式会社 | ガラス基板の研磨方法 |
TWI331081B (en) * | 2005-12-16 | 2010-10-01 | Hon Hai Prec Ind Co Ltd | Ion source and mold polishing apparatus using the same |
CN1792548B (zh) * | 2006-01-11 | 2011-06-22 | 重庆理工大学 | 可控变形电子束精整加工方法 |
US7690910B2 (en) * | 2006-02-01 | 2010-04-06 | Canon Kabushiki Kaisha | Mold for imprint, process for producing minute structure using the mold, and process for producing the mold |
US7420189B2 (en) * | 2006-04-04 | 2008-09-02 | Olympus Corporation | Ultra precise polishing method and ultra precise polishing apparatus |
US8328371B2 (en) * | 2006-08-09 | 2012-12-11 | Tokyo University Of Science Educational Foundation Administrative Organization | Anti-reflection structure body, method of producing the same and method of producing optical member |
US20090029189A1 (en) * | 2007-07-25 | 2009-01-29 | Fujifilm Corporation | Imprint mold structure, and imprinting method using the same, as well as magnetic recording medium, and method for manufacturing magnetic recording medium |
TWM363990U (en) * | 2008-06-06 | 2009-09-01 | Exploit Technology Co Ltd | Ultra precised micro mold structure having complex function film of light enhancement and diffraction |
-
2009
- 2009-09-18 JP JP2009217128A patent/JP5561978B2/ja active Active
-
2010
- 2010-09-08 CN CN201010277812.2A patent/CN102019673B/zh active Active
- 2010-09-08 US US12/877,985 patent/US20110068503A1/en not_active Abandoned
- 2010-09-15 TW TW99131243A patent/TWI413583B/zh active
-
2013
- 2013-06-07 US US13/913,335 patent/US9056405B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1160254A (ja) * | 1997-08-07 | 1999-03-02 | Matsushita Electric Ind Co Ltd | プレス成形用金型及び磁気ディスク用ガラス基板 |
JP2005014567A (ja) * | 2003-06-30 | 2005-01-20 | Mino Kanagata:Kk | 樹脂成形金型と該樹脂成形金型の製造方法 |
JP2008276907A (ja) * | 2007-03-30 | 2008-11-13 | Fujifilm Corp | モールド構造体、及びそれを用いたインプリント方法、並びに磁気記録媒体及びその製造方法 |
JP2008307735A (ja) * | 2007-06-13 | 2008-12-25 | Towa Corp | 樹脂成形用金型 |
JP2009045925A (ja) * | 2007-07-23 | 2009-03-05 | Asahi Glass Co Ltd | ナノインプリント用モールドおよびその製造方法 |
JP2009096191A (ja) * | 2007-09-28 | 2009-05-07 | Tokyo Metropolitan Industrial Technology Research Institute | 微細成形型および微細成形型用基材並びに微細成形型の製造方法 |
JP2011042063A (ja) * | 2009-08-19 | 2011-03-03 | Olympus Corp | 金型の製造方法及び光学素子 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9999983B2 (en) | 2012-08-31 | 2018-06-19 | Japan Aviation Electronics Industry, Limited | Chipping-proof inorganic solid-state material and chipping-proof edge tool |
JP2016030379A (ja) * | 2014-07-29 | 2016-03-07 | 株式会社M&T | 樹脂成型用金型 |
JP2015078124A (ja) * | 2015-01-27 | 2015-04-23 | 日本航空電子工業株式会社 | 無機固体材料および刃物工具 |
WO2017026057A1 (ja) * | 2015-08-11 | 2017-02-16 | 株式会社不二製作所 | 透明樹脂成型用金型の表面処理方法及び透明樹脂成型用金型,並びに透明樹脂成型品 |
Also Published As
Publication number | Publication date |
---|---|
US9056405B2 (en) | 2015-06-16 |
TWI413583B (zh) | 2013-11-01 |
CN102019673A (zh) | 2011-04-20 |
CN102019673B (zh) | 2014-04-02 |
US20110068503A1 (en) | 2011-03-24 |
JP5561978B2 (ja) | 2014-07-30 |
TW201116398A (en) | 2011-05-16 |
US20130270734A1 (en) | 2013-10-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5561978B2 (ja) | 成形用金型及びその金型表面の加工方法 | |
Yadav et al. | Fractal characterization and wettability of ion treated silicon surfaces | |
Yan et al. | Soft supracrystals of Au nanocrystals with tunable mechanical properties | |
Broer et al. | Roughness correction to the Casimir force beyond perturbation theory | |
CN110261938B (zh) | 抗眩结构及其制造方法 | |
Li et al. | Micro cutting of V-shaped cylindrical grating template for roller nano-imprint | |
Lee et al. | Optimizing the fabrication process of a high-efficiency blazed grating through diamond scribing and molding | |
Song et al. | Maskless and low-destructive nanofabrication on quartz by friction-induced selective etching | |
Afshar‐Mohajer et al. | Multi‐Scale In Situ Tribological Studies of Surfaces with 3D Textures Fabricated via Two‐Photon Lithography and Replica Molding | |
Park et al. | Effective fabrication of three-dimensional nano/microstructures in a single step using multilayered stamp | |
da Fonseca Filho et al. | Investigation of the morphological and fractal behavior at nanoscale of patterning lines by scratching in an atomic force microscope | |
US8163657B2 (en) | Process for adjusting the size and shape of nanostructures | |
US8163656B2 (en) | Process for adjusting the size and shape of nanostructures | |
JP2010082832A (ja) | 切削加工によるナノインプリント用金型 | |
Lin et al. | A study of estimating cutting depth for multi-pass nanoscale cutting by using atomic force microscopy | |
Holzer et al. | Replication of Micro‐and Nanostructures on Polymer Surfaces | |
EP2624281A1 (en) | Nanoimprinting mold, method of manufacturing thereof, and nanoimprinting method | |
KR101512158B1 (ko) | 임프린트용 마스터 및 이의 제조 방법 | |
Yuan et al. | Crystallographic orientation-dependent pattern replication in direct imprint of aluminum nanostructures | |
Hsieh et al. | Atomic-scale friction in direct imprinting process: molecular dynamics simulation | |
Ando et al. | Fabrication and lubrication properties of contoured nanostripe surfaces | |
JP7445242B2 (ja) | 成形用モールド | |
KR100769846B1 (ko) | 광디스크 제작용 금형을 위한 마스터 디스크의 집속이온빔 가공시 발생되는 버어의 크기 감소방법 | |
KR101163638B1 (ko) | 나노 금속 구조물의 도트 크기 조절 방법을 이용한 나노 금속 구조물의 제조 방법 | |
JP6206632B2 (ja) | ナノインプリント用ブランクスおよびナノインプリント用テンプレートの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20120515 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130805 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130813 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131004 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140513 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140610 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5561978 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |