JP2010539349A - 連続セラミックナノファイバ、製造方法およびこれを用いる装置 - Google Patents
連続セラミックナノファイバ、製造方法およびこれを用いる装置 Download PDFInfo
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- 239000002121 nanofiber Substances 0.000 title claims abstract description 83
- 239000000919 ceramic Substances 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 52
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 52
- 229920000642 polymer Polymers 0.000 claims abstract description 37
- 239000012700 ceramic precursor Substances 0.000 claims abstract description 29
- 239000000835 fiber Substances 0.000 claims abstract description 16
- 239000002131 composite material Substances 0.000 claims abstract description 12
- 238000001523 electrospinning Methods 0.000 claims abstract description 8
- 239000002245 particle Substances 0.000 claims abstract description 4
- 230000008878 coupling Effects 0.000 claims description 21
- 238000010168 coupling process Methods 0.000 claims description 21
- 238000005859 coupling reaction Methods 0.000 claims description 21
- 239000002243 precursor Substances 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 11
- 239000002019 doping agent Substances 0.000 claims description 8
- 230000000737 periodic effect Effects 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 6
- 239000004642 Polyimide Substances 0.000 claims description 4
- 229920005575 poly(amic acid) Polymers 0.000 claims description 4
- 229920000548 poly(silane) polymer Polymers 0.000 claims description 4
- 229920001721 polyimide Polymers 0.000 claims description 4
- 229920001709 polysilazane Polymers 0.000 claims description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 claims description 4
- 150000004703 alkoxides Chemical class 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229920003257 polycarbosilane Polymers 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
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- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
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- 239000001301 oxygen Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000005046 Chlorosilane Substances 0.000 description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 3
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- 229910052757 nitrogen Inorganic materials 0.000 description 3
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- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 2
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- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
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- 150000001412 amines Chemical class 0.000 description 2
- 238000005915 ammonolysis reaction Methods 0.000 description 2
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- 230000001965 increasing effect Effects 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
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- 238000007747 plating Methods 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
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- 239000010845 automotive waste Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- UOALEFQKAOQICC-UHFFFAOYSA-N chloroborane Chemical compound ClB UOALEFQKAOQICC-UHFFFAOYSA-N 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- AJVBXLXLODZUME-UHFFFAOYSA-N ethenyl(diphenyl)phosphane Chemical group C=1C=CC=CC=1P(C=C)C1=CC=CC=C1 AJVBXLXLODZUME-UHFFFAOYSA-N 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical group [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 239000000178 monomer Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- INFDPOAKFNIJBF-UHFFFAOYSA-N paraquat Chemical compound C1=C[N+](C)=CC=C1C1=CC=[N+](C)C=C1 INFDPOAKFNIJBF-UHFFFAOYSA-N 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 229920013745 polyesteretherketone Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000006578 reductive coupling reaction Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002918 waste heat Substances 0.000 description 1
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- C01B32/00—Carbon; Compounds thereof
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- C01B32/956—Silicon carbide
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- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/914—Carbides of single elements
- C01B32/956—Silicon carbide
- C01B32/963—Preparation from compounds containing silicon
- C01B32/977—Preparation from organic compounds containing silicon
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- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
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Abstract
【選択図】図3
Description
Claims (24)
- 連続セラミックナノファイバの製造方法において、
ポリマセラミック前駆体を得るステップと;
ポリマセラミック前駆体の溶液を得るために溶媒に前記ポリマセラミック前駆体を溶かすステップと;
連続ポリマセラミック前駆体の細い繊維を生成するために前記ポリマセラミック前駆体の溶液をエレクトロスピニングするステップと;
前記ポリマセラミック前駆体の細い繊維を熱分解するステップと、を具えることを特徴とする製造方法。 - 請求項1に記載の製造方法であって、前記ポリマセラミック前駆体を得るステップは、ポリシラザン、ポリボラジン、およびポリボランから成る群から選択されたポリマ前駆体を得るステップを含むことを特徴とする製造方法。
- 請求項1に記載の製造方法であって、前記ポリマセラミック前駆体を得るステップは、加水分解されたアルコキシドを得るステップを含むことを特徴とする製造方法。
- 請求項3に記載の製造方法であって、前記加水分解されたアルコキシドを得るステップは、チタンイソプロポキシドを得るステップを含み;
熱分解するステップは、酸素の存在下で熱分解するステップを含むことを特徴とする製造方法。 - 請求項1に記載の製造方法であって、前記ポリマセラミック前駆体を得るステップは、ポリマ炭化ケイ素前駆体を得るステップを含むことを特徴とする製造方法。
- 請求項5に記載の製造方法であって、前記ポリマ炭化ケイ素前駆体を得るステップは、ポリシランを得るステップを含むことを特徴とする製造方法。
- 請求項5に記載の製造方法であって、前記ポリマ炭化ケイ素前駆体を得るステップは、ポリカルボシランを得るステップを含むことを特徴とする製造方法。
- 請求項5に記載の製造方法であって、ドーパント含有化合物を得るステップと;エレクトロスピニングに先立って前記溶液と前記ドーパント含有化合物を混合するステップとをさらに具えることを特徴とする製造方法。
- 連続セラミックナノファイバの製造装置において、
セラミック前駆体溶液のリザーバと;
エレクトロスピニングスピナレットと;
前記セラミック前駆体溶液のリザーバおよび前記エレクトロスピニングスピナレットに連結されたポンプと;
前記エレクトロスピニングスピナレットを接続した高電圧電源と、を具えることを特徴とする製造装置。 - 基体と;
前記基体中に分散したセラミックナノファイバと、を具えることを特徴とする複合材料。 - 請求項10に記載の複合材料であって、前記セラミックナノファイバが連続的であることを特徴とする複合材料。
- 請求項10に記載の複合材料であって、前記セラミックナノファイバが炭化ケイ素ナノファイバを含むことを特徴とする複合材料。
- 請求項10に記載の複合材料であって、前記基体が金属を含むことを特徴とする複合材料。
- 請求項13に記載の複合材料であって、前記金属が銅、タングステン、アルミニウム、インジウム、ガリウムから成る群から選択されることを特徴とする複合材料。
- 請求項10に記載の複合材料であって、前記基体がポリマであることを特徴とする複合材料。
- 請求項15に記載の複合材料であって、前記基体がポリアミド酸であることを特徴とする複合材料。
- 請求項16に記載の複合材料であって、前記ポリアミド酸がポリイミドにイミド化されることを特徴とする複合材料。
- 熱源接点と;
ヒートシンクと;
前記熱源接点と前記ヒートシンクに熱的に連結された連続p型ドープナノファイバのマットと;
前記熱源接点と前記ヒートシンクに熱的に連結された連続n型ドープナノファイバのマットと;
前記連続p型ドープナノファイバのマットと前記連続n型ドープナノファイバのマットを連結する結合電極と、を具えることを特徴とする熱源発電機。 - 請求項18に記載の熱源発電機であって、前記連続p型ドープナノファイバのマットは第1のストリップとして形成され、前記連続n型ドープナノファイバのマットは第2のストリップとして形成されることを特徴とする熱源発電機。
- 請求項19に記載の熱源発電機であって、前記連続p型ドープナノファイバの第1のストリップは周期形状を有しており、第1の方向に延在して配置され、前記連続n型ドープナノファイバの第2のストリップは前記周期形状を有しており、前記第1の方向と異なる第2の方向に延在して配置され、前記連続p型ドープナノファイバの第1のストリップと触れずに交差することを特徴とする熱源発電機。
- 請求項20に記載の熱源発電機であって、前記周期形状を有しており、前記第1の方向に延在して配置され、前記第1のストリップに対して前記周期形状の2分の1波長だけ位相をずらした連続p型ドープナノファイバの第3のストリップをさらに具えることを特徴とする熱源発電機。
- 請求項21に記載の熱源発電機であって、前記周期形状を有しており、前記第2の方向に延在して配置され、前記第2のストリップに対して前記周期形状の2分の1波長だけ位相をずらした連続n型ドープナノファイバの第4のストリップをさらに具えることを特徴とする熱源発電機。
- 請求項18に記載の熱源発電機であって、前記p型ドープナノファイバおよび前記n型ドープナノファイバが炭化ケイ素を含むことを特徴とする熱源発電機。
- ハウジングと;
ハウジング内に配置された連続ナノファイバと、を具えることを特徴とする高温粒子フィルタ。
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