JP2010537947A5 - - Google Patents
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- Publication number
- JP2010537947A5 JP2010537947A5 JP2010524115A JP2010524115A JP2010537947A5 JP 2010537947 A5 JP2010537947 A5 JP 2010537947A5 JP 2010524115 A JP2010524115 A JP 2010524115A JP 2010524115 A JP2010524115 A JP 2010524115A JP 2010537947 A5 JP2010537947 A5 JP 2010537947A5
- Authority
- JP
- Japan
- Prior art keywords
- gas stream
- hydrogen chloride
- metal
- pressure
- ppm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims 38
- 239000007789 gas Substances 0.000 claims 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 19
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims 19
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims 19
- 229910052751 metal Inorganic materials 0.000 claims 17
- 239000002184 metal Substances 0.000 claims 17
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims 5
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 4
- 239000011777 magnesium Substances 0.000 claims 4
- 229910052749 magnesium Inorganic materials 0.000 claims 4
- 229910052725 zinc Inorganic materials 0.000 claims 4
- 239000011701 zinc Substances 0.000 claims 4
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 claims 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims 2
- 238000010582 gas stream method Methods 0.000 claims 1
- 229910001629 magnesium chloride Inorganic materials 0.000 claims 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 claims 1
- 239000000347 magnesium hydroxide Substances 0.000 claims 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 claims 1
- 239000000395 magnesium oxide Substances 0.000 claims 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims 1
- 229910000000 metal hydroxide Inorganic materials 0.000 claims 1
- 150000004692 metal hydroxides Chemical class 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 239000013618 particulate matter Substances 0.000 claims 1
- 239000011592 zinc chloride Substances 0.000 claims 1
- 235000005074 zinc chloride Nutrition 0.000 claims 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 claims 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 claims 1
- 229940007718 zinc hydroxide Drugs 0.000 claims 1
- 239000011787 zinc oxide Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US96983607P | 2007-09-04 | 2007-09-04 | |
| PCT/US2008/075048 WO2009032819A1 (en) | 2007-09-04 | 2008-09-02 | Method for treatment of a gas stream containing silicon tetrafluoride and hydrogen chloride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010537947A JP2010537947A (ja) | 2010-12-09 |
| JP2010537947A5 true JP2010537947A5 (https=) | 2011-09-22 |
Family
ID=40076566
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010524115A Pending JP2010537947A (ja) | 2007-09-04 | 2008-09-02 | 四フッ化ケイ素及び塩化水素を含有するガス流の処理方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US7691351B2 (https=) |
| EP (1) | EP2188039A1 (https=) |
| JP (1) | JP2010537947A (https=) |
| KR (1) | KR101447310B1 (https=) |
| CN (1) | CN101827642A (https=) |
| MY (1) | MY150562A (https=) |
| TW (1) | TW200927271A (https=) |
| WO (1) | WO2009032819A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101827642A (zh) * | 2007-09-04 | 2010-09-08 | Memc电子材料有限公司 | 用于处理包含四氟化硅和氯化氢的气流的方法 |
| WO2011158675A1 (ja) * | 2010-06-15 | 2011-12-22 | 協和化学工業株式会社 | 複合水酸化マグネシウム、その製造方法および吸着剤 |
| US9440218B2 (en) | 2013-06-13 | 2016-09-13 | Clariant Corporation | Methods and active materials for reducing halide concentration in gas streams |
| CN108455616A (zh) * | 2017-12-20 | 2018-08-28 | 湖北瓮福蓝天化工有限公司 | 一种氟硅酸除氯方法及装置 |
| CN114345106B (zh) * | 2021-12-30 | 2023-12-12 | 湖北瓮福蓝天化工有限公司 | 一种无水氟化氢生产过程中去除氯元素的方法及系统 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59162122A (ja) * | 1983-03-08 | 1984-09-13 | Mitsui Toatsu Chem Inc | 四弗化ケイ素の精製法 |
| US4557921A (en) * | 1984-06-27 | 1985-12-10 | Ethyl Corporation | Purification of halide |
| AT388882B (de) * | 1987-07-29 | 1989-09-11 | Andritz Ag Maschf | Verfahren zur reinigung von salzsaeure und schwefeldioxid enthaltenden abgasen von verbrennungsanlagen, insbesondere muellverbrennungsanlagen |
| DE69120682T2 (de) | 1990-11-21 | 1997-02-27 | Lhoist Recherche Et Developpement S.A., Ottignies-Louvain-La-Neuve | Kalzium- und/oder magnesiumhydroxid, verfahren zu dessen herstellung und dessen anwendung |
| US5378444A (en) | 1991-12-11 | 1995-01-03 | Japan Pionics Co., Ltd. | Process for cleaning harmful gas |
| JPH06239610A (ja) * | 1992-12-22 | 1994-08-30 | Mitsui Toatsu Chem Inc | フルオロシラン |
| JP3123698B2 (ja) * | 1994-07-13 | 2001-01-15 | セントラル硝子株式会社 | フッ化シランの製造法 |
| US5988165A (en) * | 1997-10-01 | 1999-11-23 | Invacare Corporation | Apparatus and method for forming oxygen-enriched gas and compression thereof for high-pressure mobile storage utilization |
| JP3730767B2 (ja) * | 1997-10-08 | 2006-01-05 | セントラル硝子株式会社 | フッ化シランの精製法 |
| JPH11128675A (ja) * | 1997-11-05 | 1999-05-18 | Mitsui Chem Inc | 塩素または塩素化合物の除害方法および装置 |
| US8062521B2 (en) * | 1998-05-29 | 2011-11-22 | Crystaphase Products, Inc. | Filtering medium and method for contacting solids-containing feeds for chemical reactors |
| US6649082B2 (en) * | 2000-05-26 | 2003-11-18 | Showa Denko K.K. | Harm-removing agent and method for rendering halogen-containing gas harmless and uses thereof |
| JP3909385B2 (ja) * | 2001-07-12 | 2007-04-25 | 昭和電工株式会社 | テトラフルオロシランの製造方法およびその用途 |
| US7666379B2 (en) * | 2001-07-16 | 2010-02-23 | Voltaix, Inc. | Process and apparatus for removing Bronsted acid impurities in binary halides |
| EP1440724B1 (en) * | 2001-10-12 | 2009-05-13 | Asahi Glass Company Ltd. | Method for removing halogen containing gas |
| US6805728B2 (en) * | 2002-12-09 | 2004-10-19 | Advanced Technology Materials, Inc. | Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream |
| US20050126338A1 (en) * | 2003-02-24 | 2005-06-16 | Nanoproducts Corporation | Zinc comprising nanoparticles and related nanotechnology |
| US20070116620A1 (en) * | 2005-11-21 | 2007-05-24 | Kanazirev Vladislav I | Halide scavengers for high temperature applications |
| CN101827642A (zh) * | 2007-09-04 | 2010-09-08 | Memc电子材料有限公司 | 用于处理包含四氟化硅和氯化氢的气流的方法 |
-
2008
- 2008-09-02 CN CN200880109341A patent/CN101827642A/zh active Pending
- 2008-09-02 EP EP08829262A patent/EP2188039A1/en not_active Withdrawn
- 2008-09-02 MY MYPI20100901 patent/MY150562A/en unknown
- 2008-09-02 JP JP2010524115A patent/JP2010537947A/ja active Pending
- 2008-09-02 WO PCT/US2008/075048 patent/WO2009032819A1/en not_active Ceased
- 2008-09-02 US US12/202,807 patent/US7691351B2/en not_active Expired - Fee Related
- 2008-09-02 KR KR1020107007329A patent/KR101447310B1/ko not_active Expired - Fee Related
- 2008-09-04 TW TW097133985A patent/TW200927271A/zh unknown
-
2010
- 2010-03-25 US US12/731,847 patent/US20100178225A1/en not_active Abandoned
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