JP2010534946A5 - - Google Patents

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Publication number
JP2010534946A5
JP2010534946A5 JP2010518550A JP2010518550A JP2010534946A5 JP 2010534946 A5 JP2010534946 A5 JP 2010534946A5 JP 2010518550 A JP2010518550 A JP 2010518550A JP 2010518550 A JP2010518550 A JP 2010518550A JP 2010534946 A5 JP2010534946 A5 JP 2010534946A5
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JP
Japan
Prior art keywords
housing
support surface
hydrogen
substrate holder
radicals
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JP2010518550A
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English (en)
Japanese (ja)
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JP5188576B2 (ja
JP2010534946A (ja
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Priority claimed from US11/882,081 external-priority patent/US7894037B2/en
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Publication of JP2010534946A5 publication Critical patent/JP2010534946A5/ja
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JP2010518550A 2007-07-30 2008-07-25 リソグラフィ装置およびデバイス製造方法 Active JP5188576B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/882,081 2007-07-30
US11/882,081 US7894037B2 (en) 2007-07-30 2007-07-30 Lithographic apparatus and device manufacturing method
PCT/EP2008/006145 WO2009015838A1 (en) 2007-07-30 2008-07-25 Lithographic apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2010534946A JP2010534946A (ja) 2010-11-11
JP2010534946A5 true JP2010534946A5 (OSRAM) 2011-09-08
JP5188576B2 JP5188576B2 (ja) 2013-04-24

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ID=39885050

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JP2010518550A Active JP5188576B2 (ja) 2007-07-30 2008-07-25 リソグラフィ装置およびデバイス製造方法

Country Status (7)

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US (1) US7894037B2 (OSRAM)
JP (1) JP5188576B2 (OSRAM)
KR (1) KR20100053591A (OSRAM)
CN (2) CN101765811B (OSRAM)
NL (1) NL1035732A1 (OSRAM)
TW (1) TW200916976A (OSRAM)
WO (1) WO2009015838A1 (OSRAM)

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US10053793B2 (en) 2015-07-09 2018-08-21 Lam Research Corporation Integrated elastomeric lipseal and cup bottom for reducing wafer sticking
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JP6695750B2 (ja) * 2016-07-04 2020-05-20 株式会社荏原製作所 基板ホルダの検査装置、これを備えためっき装置、及び外観検査装置
JP7001715B2 (ja) * 2017-06-01 2022-01-20 エーエスエムエル ネザーランズ ビー．ブイ． パーティクル除去装置および関連システム
JP7145893B2 (ja) * 2017-06-29 2022-10-03 ラム リサーチ コーポレーション ウエハ保持装置上におけるめっきの遠隔検知
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JP7098722B2 (ja) * 2017-10-27 2022-07-11 エーエスエムエル ホールディング エヌ．ブイ． リソグラフィアプリケーション内でオブジェクトを保持するための改変された表面トポグラフィを伴うバール
US11448955B2 (en) 2018-09-27 2022-09-20 Taiwan Semiconductor Manufacturing Co., Ltd. Mask for lithography process and method for manufacturing the same
US11360384B2 (en) * 2018-09-28 2022-06-14 Taiwan Semiconductor Manufacturing Co., Ltd. Method of fabricating and servicing a photomask
CN112955822B (zh) * 2018-11-09 2024-10-11 Asml控股股份有限公司 利用具有可控几何形状和组成的清洁衬底进行刻蚀支撑件清洁
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TWI843829B (zh) * 2019-03-25 2024-06-01 日商亞多納富有限公司 氣體分析裝置、其控制方法及其控制程序
CN110161808B (zh) * 2019-05-09 2022-02-22 上海华力微电子有限公司 光栅尺清洁装置和方法、光刻机
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JP7401396B2 (ja) * 2020-06-04 2023-12-19 キヤノン株式会社 インプリント装置、物品の製造方法、及びインプリント装置のための測定方法
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