JP2010533312A5 - - Google Patents
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- Publication number
- JP2010533312A5 JP2010533312A5 JP2010516023A JP2010516023A JP2010533312A5 JP 2010533312 A5 JP2010533312 A5 JP 2010533312A5 JP 2010516023 A JP2010516023 A JP 2010516023A JP 2010516023 A JP2010516023 A JP 2010516023A JP 2010533312 A5 JP2010533312 A5 JP 2010533312A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer binder
- imageable
- group
- alkaline developer
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005596 polymer binder Polymers 0.000 claims 9
- 239000002491 polymer binding agent Substances 0.000 claims 9
- 230000005855 radiation Effects 0.000 claims 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 4
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 239000001257 hydrogen Substances 0.000 claims 4
- -1 oxy, thio Chemical group 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 238000003384 imaging method Methods 0.000 claims 2
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 229960005323 phenoxyethanol Drugs 0.000 claims 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/774,626 US7582407B2 (en) | 2007-07-09 | 2007-07-09 | Imageable elements with low pH developer solubility |
| PCT/US2008/007957 WO2009008961A1 (en) | 2007-07-09 | 2008-06-26 | Imageable elements with low ph developer solubility |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010533312A JP2010533312A (ja) | 2010-10-21 |
| JP2010533312A5 true JP2010533312A5 (enExample) | 2011-05-12 |
Family
ID=39831886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010516023A Pending JP2010533312A (ja) | 2007-07-09 | 2008-06-26 | 低ｐＨ現像液溶解性を有する画像形成性要素 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7582407B2 (enExample) |
| EP (1) | EP2168009B1 (enExample) |
| JP (1) | JP2010533312A (enExample) |
| CN (1) | CN101689021B (enExample) |
| WO (1) | WO2009008961A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4575220B2 (ja) * | 2005-04-14 | 2010-11-04 | 信越化学工業株式会社 | レジスト下層膜材料およびパターン形成方法 |
| JP5260095B2 (ja) * | 2008-03-14 | 2013-08-14 | イーストマン コダック カンパニー | 平版印刷原版の製版方法 |
| US20110097666A1 (en) | 2009-10-27 | 2011-04-28 | Celin Savariar-Hauck | Lithographic printing plate precursors |
| US20110236832A1 (en) * | 2010-03-26 | 2011-09-29 | Celin Savariar-Hauck | Lithographic processing solutions and methods of use |
| US8846299B2 (en) | 2010-03-26 | 2014-09-30 | Eastman Kodak Company | Methods for preparing lithograhic printing plates |
| US20130255515A1 (en) | 2012-03-27 | 2013-10-03 | Celin Savariar-Hauck | Positive-working lithographic printing plate precursors |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1286898B (de) * | 1965-11-10 | 1969-01-09 | Kalle Ag | Lichtempfindliche Schicht |
| JPS58134631A (ja) | 1982-01-08 | 1983-08-10 | Konishiroku Photo Ind Co Ltd | 感光性組成物 |
| JP3678257B2 (ja) * | 1995-04-26 | 2005-08-03 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
| BR9702181A (pt) * | 1996-04-23 | 1999-12-28 | Horsell Graphic Ind Ltd | Composição termossensìvel e método para fabricar um modelo de impressão litográfica com a mesma. |
| JP3814961B2 (ja) * | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
| JP3779444B2 (ja) * | 1997-07-28 | 2006-05-31 | 富士写真フイルム株式会社 | 赤外線レーザ用ポジ型感光性組成物 |
| GB9722862D0 (en) * | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Pattern formation |
| JP3836617B2 (ja) * | 1998-02-04 | 2006-10-25 | コダックポリクロームグラフィックス株式会社 | ポジ型感光性組成物、ポジ型感光性平版印刷版及びポジ画像形成方法 |
| US6352812B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6358669B1 (en) * | 1998-06-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6352811B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| DE19850181C2 (de) * | 1998-10-30 | 2003-12-04 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzung und deren Verwendung für thermisch bebilderbare Druckplatten |
| US6706466B1 (en) * | 1999-08-03 | 2004-03-16 | Kodak Polychrome Graphics Llc | Articles having imagable coatings |
| JP2001114853A (ja) | 1999-10-21 | 2001-04-24 | Nippon Shokubai Co Ltd | カルボキシル基を有するノボラック型フェノール樹脂および該フェノール樹脂を用いたポジ型感光性樹脂組成物 |
| US6391524B2 (en) * | 1999-11-19 | 2002-05-21 | Kodak Polychrome Graphics Llc | Article having imagable coatings |
| US6528228B2 (en) * | 1999-12-22 | 2003-03-04 | Kodak Polychrome Graphics, Llc | Chemical resistant underlayer for positive-working printing plates |
| US6294311B1 (en) * | 1999-12-22 | 2001-09-25 | Kodak Polychrome Graphics Llc | Lithographic printing plate having high chemical resistance |
| KR100709520B1 (ko) * | 2000-02-29 | 2007-04-20 | 도오꾜오까고오교 가부시끼가이샤 | 페놀 노볼락 수지, 그것의 합성 방법, 및 이것을 사용한포지티브형 포토레지스트 조성물 |
| US6555291B1 (en) * | 2000-08-14 | 2003-04-29 | Kodak Polychrome Graphics, Llc | Thermal digital lithographic printing plate |
| US6649324B1 (en) * | 2000-08-14 | 2003-11-18 | Kodak Polychrome Graphics Llc | Aqueous developer for lithographic printing plates |
| EP1297950B1 (en) | 2001-09-27 | 2007-04-25 | Agfa Graphics N.V. | Heat-sensitive lithographic printing plate precursor |
| TW200306324A (en) * | 2002-04-22 | 2003-11-16 | Tokyo Ind Co Ltd | Novolak resin solution, positive photoresist composition, and method of producing same |
| JP4317682B2 (ja) * | 2002-07-10 | 2009-08-19 | 富士フイルム株式会社 | 画像記録材料 |
| DE10239505B4 (de) * | 2002-08-28 | 2005-05-04 | Kodak Polychrome Graphics Gmbh | Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit |
| US6939663B2 (en) * | 2003-07-08 | 2005-09-06 | Kodak Polychrome Graphics Llc | Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins |
| US6992688B2 (en) * | 2004-01-28 | 2006-01-31 | Eastman Kodak Company | Method for developing multilayer imageable elements |
| JP2005062875A (ja) * | 2003-08-13 | 2005-03-10 | Agfa Gevaert Nv | 感熱性平版印刷版前駆体 |
| JP4167160B2 (ja) * | 2003-09-29 | 2008-10-15 | 富士フイルム株式会社 | 平版印刷版原版 |
| DE10347682B4 (de) * | 2003-10-14 | 2007-11-29 | Kodak Polychrome Graphics Gmbh | Verfahren zur Herstellung zweischichtiger wärmeempfindlicher bebilderbarer Elemente |
| JP4340586B2 (ja) * | 2004-06-03 | 2009-10-07 | 富士フイルム株式会社 | 感光性組成物 |
| JP2006106059A (ja) * | 2004-09-30 | 2006-04-20 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US6969579B1 (en) * | 2004-12-21 | 2005-11-29 | Eastman Kodak Company | Solvent resistant imageable element |
-
2007
- 2007-07-09 US US11/774,626 patent/US7582407B2/en not_active Expired - Fee Related
-
2008
- 2008-06-26 EP EP08794384.1A patent/EP2168009B1/en not_active Not-in-force
- 2008-06-26 WO PCT/US2008/007957 patent/WO2009008961A1/en not_active Ceased
- 2008-06-26 JP JP2010516023A patent/JP2010533312A/ja active Pending
- 2008-06-26 CN CN200880023817.3A patent/CN101689021B/zh active Active
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