CN101689021B - 具有低pH显影剂溶解性的可成像元件 - Google Patents

具有低pH显影剂溶解性的可成像元件 Download PDF

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Publication number
CN101689021B
CN101689021B CN200880023817.3A CN200880023817A CN101689021B CN 101689021 B CN101689021 B CN 101689021B CN 200880023817 A CN200880023817 A CN 200880023817A CN 101689021 B CN101689021 B CN 101689021B
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China
Prior art keywords
imageable
polymer base
layer
base material
groups
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CN200880023817.3A
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English (en)
Chinese (zh)
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CN101689021A (zh
Inventor
C·萨瓦里亚豪克
A·S·V·蒙克
G·豪克
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Eastman Kodak Co
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Eastman Kodak Co
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/14—Multiple imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
CN200880023817.3A 2007-07-09 2008-06-26 具有低pH显影剂溶解性的可成像元件 Active CN101689021B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/774,626 2007-07-09
US11/774,626 US7582407B2 (en) 2007-07-09 2007-07-09 Imageable elements with low pH developer solubility
PCT/US2008/007957 WO2009008961A1 (en) 2007-07-09 2008-06-26 Imageable elements with low ph developer solubility

Publications (2)

Publication Number Publication Date
CN101689021A CN101689021A (zh) 2010-03-31
CN101689021B true CN101689021B (zh) 2012-09-05

Family

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Application Number Title Priority Date Filing Date
CN200880023817.3A Active CN101689021B (zh) 2007-07-09 2008-06-26 具有低pH显影剂溶解性的可成像元件

Country Status (5)

Country Link
US (1) US7582407B2 (enExample)
EP (1) EP2168009B1 (enExample)
JP (1) JP2010533312A (enExample)
CN (1) CN101689021B (enExample)
WO (1) WO2009008961A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4575220B2 (ja) * 2005-04-14 2010-11-04 信越化学工業株式会社 レジスト下層膜材料およびパターン形成方法
JP5260095B2 (ja) * 2008-03-14 2013-08-14 イーストマン コダック カンパニー 平版印刷原版の製版方法
US20110097666A1 (en) 2009-10-27 2011-04-28 Celin Savariar-Hauck Lithographic printing plate precursors
US20110236832A1 (en) * 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
US8846299B2 (en) 2010-03-26 2014-09-30 Eastman Kodak Company Methods for preparing lithograhic printing plates
US20130255515A1 (en) * 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3563749A (en) * 1965-11-10 1971-02-16 Kalle Ag Light-sensitive reproduction material
EP0083971A2 (en) * 1982-01-08 1983-07-20 Konica Corporation Photosensitive composition
EP0823327A2 (en) * 1996-08-06 1998-02-11 Mitsubishi Chemical Corporation Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate
EP1297950A2 (en) * 2001-09-27 2003-04-02 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
US6649324B1 (en) * 2000-08-14 2003-11-18 Kodak Polychrome Graphics Llc Aqueous developer for lithographic printing plates

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3678257B2 (ja) * 1995-04-26 2005-08-03 日本ゼオン株式会社 ポジ型レジスト組成物
RU2153986C2 (ru) * 1996-04-23 2000-08-10 Хорселл Грэфик Индастриз Лимитед Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы
JP3779444B2 (ja) * 1997-07-28 2006-05-31 富士写真フイルム株式会社 赤外線レーザ用ポジ型感光性組成物
GB9722862D0 (en) * 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Pattern formation
JP3836617B2 (ja) * 1998-02-04 2006-10-25 コダックポリクロームグラフィックス株式会社 ポジ型感光性組成物、ポジ型感光性平版印刷版及びポジ画像形成方法
US6352812B1 (en) * 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6358669B1 (en) * 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6352811B1 (en) * 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
DE19850181C2 (de) * 1998-10-30 2003-12-04 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzung und deren Verwendung für thermisch bebilderbare Druckplatten
US6706466B1 (en) * 1999-08-03 2004-03-16 Kodak Polychrome Graphics Llc Articles having imagable coatings
JP2001114853A (ja) 1999-10-21 2001-04-24 Nippon Shokubai Co Ltd カルボキシル基を有するノボラック型フェノール樹脂および該フェノール樹脂を用いたポジ型感光性樹脂組成物
US6391524B2 (en) * 1999-11-19 2002-05-21 Kodak Polychrome Graphics Llc Article having imagable coatings
US6528228B2 (en) * 1999-12-22 2003-03-04 Kodak Polychrome Graphics, Llc Chemical resistant underlayer for positive-working printing plates
US6294311B1 (en) * 1999-12-22 2001-09-25 Kodak Polychrome Graphics Llc Lithographic printing plate having high chemical resistance
KR100709520B1 (ko) * 2000-02-29 2007-04-20 도오꾜오까고오교 가부시끼가이샤 페놀 노볼락 수지, 그것의 합성 방법, 및 이것을 사용한포지티브형 포토레지스트 조성물
US6555291B1 (en) * 2000-08-14 2003-04-29 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
TW200306324A (en) * 2002-04-22 2003-11-16 Tokyo Ind Co Ltd Novolak resin solution, positive photoresist composition, and method of producing same
JP4317682B2 (ja) * 2002-07-10 2009-08-19 富士フイルム株式会社 画像記録材料
DE10239505B4 (de) * 2002-08-28 2005-05-04 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit
US6939663B2 (en) * 2003-07-08 2005-09-06 Kodak Polychrome Graphics Llc Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins
US6992688B2 (en) * 2004-01-28 2006-01-31 Eastman Kodak Company Method for developing multilayer imageable elements
JP2005062875A (ja) * 2003-08-13 2005-03-10 Agfa Gevaert Nv 感熱性平版印刷版前駆体
JP4167160B2 (ja) * 2003-09-29 2008-10-15 富士フイルム株式会社 平版印刷版原版
DE10347682B4 (de) * 2003-10-14 2007-11-29 Kodak Polychrome Graphics Gmbh Verfahren zur Herstellung zweischichtiger wärmeempfindlicher bebilderbarer Elemente
JP4340586B2 (ja) * 2004-06-03 2009-10-07 富士フイルム株式会社 感光性組成物
JP2006106059A (ja) * 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 平版印刷版原版
US6969579B1 (en) * 2004-12-21 2005-11-29 Eastman Kodak Company Solvent resistant imageable element

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3563749A (en) * 1965-11-10 1971-02-16 Kalle Ag Light-sensitive reproduction material
EP0083971A2 (en) * 1982-01-08 1983-07-20 Konica Corporation Photosensitive composition
EP0823327A2 (en) * 1996-08-06 1998-02-11 Mitsubishi Chemical Corporation Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate
US6649324B1 (en) * 2000-08-14 2003-11-18 Kodak Polychrome Graphics Llc Aqueous developer for lithographic printing plates
EP1297950A2 (en) * 2001-09-27 2003-04-02 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
u. Westerwelle et al.Partially carboxymethylated novolaks for photoresist systems New photoresists for development under mildly alkaline conditions.《Microelectronic Engineering》.1998,第41-42卷343-346. *

Also Published As

Publication number Publication date
JP2010533312A (ja) 2010-10-21
US7582407B2 (en) 2009-09-01
EP2168009A1 (en) 2010-03-31
WO2009008961A1 (en) 2009-01-15
EP2168009B1 (en) 2016-01-27
US20090017399A1 (en) 2009-01-15
CN101689021A (zh) 2010-03-31

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