JP2010523515A5 - - Google Patents

Download PDF

Info

Publication number
JP2010523515A5
JP2010523515A5 JP2010501474A JP2010501474A JP2010523515A5 JP 2010523515 A5 JP2010523515 A5 JP 2010523515A5 JP 2010501474 A JP2010501474 A JP 2010501474A JP 2010501474 A JP2010501474 A JP 2010501474A JP 2010523515 A5 JP2010523515 A5 JP 2010523515A5
Authority
JP
Japan
Prior art keywords
alkylene
substituted
alkyl
unsubstituted
interrupted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010501474A
Other languages
English (en)
Japanese (ja)
Other versions
JP5606308B2 (ja
JP2010523515A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2008/053456 external-priority patent/WO2008119688A1/en
Publication of JP2010523515A publication Critical patent/JP2010523515A/ja
Publication of JP2010523515A5 publication Critical patent/JP2010523515A5/ja
Application granted granted Critical
Publication of JP5606308B2 publication Critical patent/JP5606308B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010501474A 2007-04-03 2008-03-25 光活性窒素塩基 Expired - Fee Related JP5606308B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07105510.7 2007-04-03
EP07105510 2007-04-03
PCT/EP2008/053456 WO2008119688A1 (en) 2007-04-03 2008-03-25 Photoactivable nitrogen bases

Publications (3)

Publication Number Publication Date
JP2010523515A JP2010523515A (ja) 2010-07-15
JP2010523515A5 true JP2010523515A5 (show.php) 2011-11-10
JP5606308B2 JP5606308B2 (ja) 2014-10-15

Family

ID=38016564

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010501474A Expired - Fee Related JP5606308B2 (ja) 2007-04-03 2008-03-25 光活性窒素塩基

Country Status (9)

Country Link
US (3) US9921477B2 (show.php)
EP (1) EP2145231B1 (show.php)
JP (1) JP5606308B2 (show.php)
KR (2) KR101514093B1 (show.php)
CN (1) CN101641643B (show.php)
AT (1) ATE524765T1 (show.php)
CA (1) CA2681201C (show.php)
MX (1) MX2009010309A (show.php)
WO (1) WO2008119688A1 (show.php)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2009115962A (ru) * 2006-09-29 2010-11-10 Циба Холдинг Инк. (Ch) Фотолатентные основания для систем, основанных на блокированных изоцианатах
EP2145231B1 (en) 2007-04-03 2011-09-14 Basf Se Photoactivable nitrogen bases
US9624171B2 (en) * 2008-06-06 2017-04-18 Basf Se Photoinitiator mixtures
CN101967343A (zh) * 2010-10-22 2011-02-09 广州市博兴化工科技有限公司 一种光固化色漆
GB2491643A (en) 2011-06-10 2012-12-12 Lambson Ltd Method of forming a polymeric material on a substrate
US9616460B2 (en) 2011-12-02 2017-04-11 Toyota Motor Engineering & Manufacturing North America, Inc. Terminate-on-demand cationic polymerization method for forming a two-dimensional coating
US9758607B2 (en) 2013-10-10 2017-09-12 Research Foundation Of The City University Of New York Polymer with antibacterial activity
DE102014202609B4 (de) 2014-02-13 2020-06-04 tooz technologies GmbH Aminkatalysierte Thiolhärtung von Epoxidharzen
WO2015157983A1 (en) * 2014-04-18 2015-10-22 Dow Global Technologies Llc Anthraquinone compound used for color filter of lcd
CN114734628A (zh) 2014-06-23 2022-07-12 卡本有限公司 由具有多重硬化机制的材料制备三维物体的方法
WO2016126796A2 (en) 2015-02-05 2016-08-11 Carbon3D, Inc. Method of additive manufacturing by intermittent exposure
WO2016140886A1 (en) 2015-03-05 2016-09-09 Carbon3D, Inc. Fabrication of three dimensional objects with multiple operating modes
CA2984145A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Method of making a polymer network from a polythiol and a polyepoxide
CN108350145B (zh) 2015-09-04 2021-06-22 卡本有限公司 用于增材制造的氰酸酯双重固化树脂
US10975193B2 (en) 2015-09-09 2021-04-13 Carbon, Inc. Epoxy dual cure resins for additive manufacturing
US10647873B2 (en) 2015-10-30 2020-05-12 Carbon, Inc. Dual cure article of manufacture with portions of differing solubility
US11891485B2 (en) 2015-11-05 2024-02-06 Carbon, Inc. Silicone dual cure resins for additive manufacturing
US10501572B2 (en) 2015-12-22 2019-12-10 Carbon, Inc. Cyclic ester dual cure resins for additive manufacturing
US10343331B2 (en) 2015-12-22 2019-07-09 Carbon, Inc. Wash liquids for use in additive manufacturing with dual cure resins
WO2017112571A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products
EP3394673A1 (en) 2015-12-22 2018-10-31 Carbon, Inc. Fabrication of compound products from multiple intermediates by additive manufacturing with dual cure resins
US10647054B2 (en) 2015-12-22 2020-05-12 Carbon, Inc. Accelerants for additive manufacturing with dual cure resins
CN115195104B (zh) 2015-12-22 2023-12-05 卡本有限公司 用于用双重固化树脂的增材制造的双重前体树脂系统
WO2017112751A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Blocked silicone dual cure resins for additive manufacturing
US10500786B2 (en) 2016-06-22 2019-12-10 Carbon, Inc. Dual cure resins containing microwave absorbing materials and methods of using the same
KR102426999B1 (ko) 2016-10-14 2022-08-01 바스프 에스이 경질화가능한 중합체 조성물
CN110023056B (zh) * 2016-11-21 2021-08-24 卡本有限公司 通过递送反应性组分用于后续固化来制造三维物体的方法
EP3548969A1 (en) 2016-12-05 2019-10-09 Arkema, Inc. Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing
US11535686B2 (en) 2017-03-09 2022-12-27 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
US10367228B2 (en) 2017-04-07 2019-07-30 Seeo, Inc. Diester-based polymer electrolytes for high voltage lithium ion batteries
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
EP3600843B1 (en) 2017-06-21 2021-07-21 Carbon, Inc. Resin dispenser for additive manufacturing
RU2020120686A (ru) 2017-11-24 2021-12-24 Лунелла Байотек, Инк. Соединения производных трифенилфосфония для эрадикации раковых стволовых клеток
US11135649B2 (en) 2018-02-27 2021-10-05 Arizona Board Of Regents On Behalf Of Arizona State University Direct metal printing with stereolithography
US11504903B2 (en) 2018-08-28 2022-11-22 Carbon, Inc. 1K alcohol dual cure resins for additive manufacturing
EP3848179A1 (de) 2020-01-10 2021-07-14 Carl Zeiss Vision International GmbH Inkjet-verfahren zur herstellung eines brillenglases
US20220011670A1 (en) * 2020-07-08 2022-01-13 International Business Machines Corporation Resist underlayer surface modification
DE102022110540A1 (de) 2022-04-29 2023-11-02 tooz technologies GmbH Verfahren zur anpassung des brechungsindex
CN117466862B (zh) * 2022-07-20 2025-10-21 天津久日新材料股份有限公司 一种含硫光引发剂及其制备方法和应用

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0448154A1 (en) 1990-03-20 1991-09-25 Akzo Nobel N.V. Coating composition including a blocked basic catalyst
WO1994028075A1 (en) 1993-05-26 1994-12-08 Akzo Nobel N.V. Coating composition including a uv-deblockable basic catalyst
US6362301B1 (en) 1994-06-13 2002-03-26 Rohm And Haas Company Curable composition
US5998496A (en) 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
DE69703480T3 (de) 1996-02-22 2006-07-06 Ciba Speciality Chemicals Holding Inc. Anionischer photokatalysator
DE69807322T2 (de) 1997-01-22 2003-04-17 Ciba Speciality Chemicals Holding Inc., Basel Fotoaktivierbare stickstoffhaltige basen, die auf alpha-aminoketonen basieren
KR100542419B1 (ko) 1997-02-26 2006-01-11 시바 스페셜티 케미칼스 홀딩 인크. α-암모늄 케톤, 이미늄 케톤 또는 아미디늄 케톤 및 아릴 보레이트계의 광활성화 가능한 질소 함유 염기, 이의 제조방법 및 이를 포함하는 조성물
WO1998041524A1 (en) 1997-03-18 1998-09-24 Ciba Specialty Chemicals Holding Inc. PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMINO ALKENES
EP0898202B1 (en) 1997-08-22 2000-07-19 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones
DE59903270D1 (de) 1998-08-21 2002-12-05 Ciba Sc Holding Ag Photoaktivierbare stickstoffhaltige basen
DE60125929T2 (de) 2000-05-26 2007-11-08 Akzo Nobel Coatings International B.V. Photoaktivierbare beschichtungszusammensetzung
EP1436297B1 (en) * 2001-10-17 2007-04-25 Ciba Specialty Chemicals Holding Inc. Photoactivable nitrogen bases
AU2003227644B2 (en) * 2002-04-19 2008-08-21 Ciba Specialty Chemicals Holding Inc. Curing of coatings induced by plasma
WO2006008251A2 (en) 2004-07-21 2006-01-26 Ciba Specialty Chemicals Holding Inc. Process for the photoactivation and use of a catalyst by an inverted two-stage procedure
US20100236707A1 (en) 2006-07-17 2010-09-23 Katia Studer Method of bonding
RU2009115962A (ru) 2006-09-29 2010-11-10 Циба Холдинг Инк. (Ch) Фотолатентные основания для систем, основанных на блокированных изоцианатах
EP2145231B1 (en) 2007-04-03 2011-09-14 Basf Se Photoactivable nitrogen bases

Similar Documents

Publication Publication Date Title
JP2010523515A5 (show.php)
JP7196229B2 (ja) 真マイケル付加架橋性組成物のための接着促進剤
JP6107660B2 (ja) 再加工可能なエポキシ樹脂のための新規薬剤
TWI481660B (zh) A curable resin composition
JP2018517011A5 (show.php)
TWI412513B (zh) An amine imide compound that is activated by irradiation with an active energy ray, a composition using the same and a hardening method thereof
KR101021045B1 (ko) 고에너지 방사선에 의해 경화 가능한 아크릴옥시 작용성실리콘 조성물
JP5900253B2 (ja) (メタ)アクリル変性オルガノポリシロキサン、放射線硬化性シリコーン組成物及びシリコーン剥離紙並びにそれらの製造方法
JP4973868B2 (ja) 硬化性樹脂組成物および硬化方法
JPH08104706A (ja) 有機官能性基含有重合体の陽イオン架橋用開始剤、これらの開始剤を含有する架橋性ポリオルガノシロキサン基材組成物及び付着防止におけるかかる組成物の適用
JP5772235B2 (ja) 硬化性樹脂組成物
TW200904822A (en) Hydrolyzable silanes of low VOC-generating potential and resinous compositions containing same
TW201247768A (en) Curable resin composition
JPS59124954A (ja) 硬化性組成物
TW201005039A (en) Low-viscosity ultraviolet-curable silicone composition for release paper
KR20190021403A (ko) 알콕시실란을 기재로 하는 1액형 조성물 및 그 조성물을 사용하여 부품들을 접합 또는 캡슐화하는 방법
JP2001220512A (ja) 放射線硬化性シリコーン組成物
KR20120032484A (ko) 염기 및 라디칼 발생제, 및 그것을 이용한 조성물 및 그의 경화 방법
CN107532061B (zh) 压敏黏接剂
TW201231560A (en) Radiation curable silicone composition
JP4803937B2 (ja) 架橋性官能基を有するポリオルガノシロキサンの重合用及び/又は架橋用開始剤、相当する組成物及びそれらの使用
CN110234715A (zh) 抗菌聚合物涂料组合物和抗菌聚合物膜
TWI586728B (zh) 固化性樹脂組合物
CN100473681C (zh) 用具有反应性功能的可聚合和/或可交联有机组合物处理塑料材料表面
JP6524938B2 (ja) 放射線硬化型剥離シート用軽剥離添加剤及び剥離シート用放射線硬化型オルガノポリシロキサン組成物並びに剥離シート