JP2010271603A5 - - Google Patents

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Publication number
JP2010271603A5
JP2010271603A5 JP2009124810A JP2009124810A JP2010271603A5 JP 2010271603 A5 JP2010271603 A5 JP 2010271603A5 JP 2009124810 A JP2009124810 A JP 2009124810A JP 2009124810 A JP2009124810 A JP 2009124810A JP 2010271603 A5 JP2010271603 A5 JP 2010271603A5
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JP
Japan
Prior art keywords
substrate
holding
surface position
detecting
refractive index
Prior art date
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Pending
Application number
JP2009124810A
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English (en)
Japanese (ja)
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JP2010271603A (ja
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Publication date
Application filed filed Critical
Priority to JP2009124810A priority Critical patent/JP2010271603A/ja
Priority claimed from JP2009124810A external-priority patent/JP2010271603A/ja
Publication of JP2010271603A publication Critical patent/JP2010271603A/ja
Publication of JP2010271603A5 publication Critical patent/JP2010271603A5/ja
Pending legal-status Critical Current

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JP2009124810A 2009-05-25 2009-05-25 面位置検出装置、パターン形成装置、面位置検出方法、パターン形成方法及びデバイス製造方法 Pending JP2010271603A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009124810A JP2010271603A (ja) 2009-05-25 2009-05-25 面位置検出装置、パターン形成装置、面位置検出方法、パターン形成方法及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009124810A JP2010271603A (ja) 2009-05-25 2009-05-25 面位置検出装置、パターン形成装置、面位置検出方法、パターン形成方法及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2010271603A JP2010271603A (ja) 2010-12-02
JP2010271603A5 true JP2010271603A5 (enExample) 2012-06-07

Family

ID=43419658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009124810A Pending JP2010271603A (ja) 2009-05-25 2009-05-25 面位置検出装置、パターン形成装置、面位置検出方法、パターン形成方法及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2010271603A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013035696A1 (ja) * 2011-09-05 2013-03-14 株式会社ニコン 基板搬送装置及び基板処理装置
JPWO2013121625A1 (ja) * 2012-02-17 2015-05-11 株式会社ニコン 基板搬送装置、基板処理装置、及び基板処理方法
JP6137796B2 (ja) * 2012-09-18 2017-05-31 株式会社ディスコ 加工装置
WO2015060972A1 (en) * 2013-10-22 2015-04-30 Applied Materials, Inc. Roll to roll mask-less lithography with active alignment

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58156210U (ja) * 1982-04-14 1983-10-19 パイオニアビデオ株式会社 平面度測定機の裏面反射防止構造
JPS62217250A (ja) * 1986-03-19 1987-09-24 Fujitsu Ltd 焦点合わせ方法
JP2617754B2 (ja) * 1988-02-03 1997-06-04 旭光学工業株式会社 透過用光学素子の表面形状測定方法及びその測定方法に用いる測定治具
JP3180229B2 (ja) * 1992-03-31 2001-06-25 キヤノン株式会社 自動焦点合わせ装置
JPH06188173A (ja) * 1992-12-16 1994-07-08 Nikon Corp 表面位置検出装置
JP3265504B2 (ja) * 1993-10-12 2002-03-11 株式会社ニコン 露光方法及び装置、並びに半導体素子の製造方法
JPH11230860A (ja) * 1998-02-12 1999-08-27 Fujitsu Ltd 光学的薄膜計測方法及び装置並びにこの装置に用いられる光学的薄膜計測妨害光除去装置
JP3003671B2 (ja) * 1998-06-01 2000-01-31 株式会社日立製作所 試料表面の高さ検出方法及びその装置
JP2004273828A (ja) * 2003-03-10 2004-09-30 Nikon Corp 面位置検出方法、面位置検出装置、合焦装置、露光装置及びデバイスの製造方法
US7375795B2 (en) * 2004-12-22 2008-05-20 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2006313866A (ja) * 2005-05-09 2006-11-16 Canon Inc 露光装置及び方法

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