JP2010271603A5 - - Google Patents
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- JP2010271603A5 JP2010271603A5 JP2009124810A JP2009124810A JP2010271603A5 JP 2010271603 A5 JP2010271603 A5 JP 2010271603A5 JP 2009124810 A JP2009124810 A JP 2009124810A JP 2009124810 A JP2009124810 A JP 2009124810A JP 2010271603 A5 JP2010271603 A5 JP 2010271603A5
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- Prior art keywords
- substrate
- holding
- surface position
- detecting
- refractive index
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Description
本発明の第１の態様にかかる面位置検出装置は、光透過性を有する可撓性の基板の表面で反射された光を検出し、その検出結果に基づいて表面の面位置を検出する面位置検出装置である。その面位置検出装置は、基板の裏面を保持する保持部と該保持部に対して凹状に形成された凹部とを有する保持装置と、基板の屈折率と同等の屈折率を有する流体を、凹部に供給する流体供給装置と、保持装置の凹部に対応した基板の表面に面位置を検出する為の光を照射する照射装置とを備える。
The surface position detection apparatus according to the first aspect of the present invention detects light reflected by the surface of a flexible substrate having optical transparency, and detects the surface position of the surface based on the detection result. It is a position detection device. The surface position detecting device includes a holding device that holds a back surface of a substrate and a concave portion formed in a concave shape with respect to the holding portion, and a fluid having a refractive index equivalent to the refractive index of the substrate. And a irradiating device for irradiating light for detecting the surface position on the surface of the substrate corresponding to the concave portion of the holding device.
本発明の第３の態様にかかる面位置検出方法は、光透過性を有する可撓性の基板の表面で反射された光を検出し、その検出結果に基づいて基板の表面の面位置を検出する面位置検出方法である。その面位置検出方法は、保持部によって基板の裏面を保持する保持工程と、その保持部に対して凹状に形成された凹部に、基板の屈折率と同等の屈折率を有する流体を、その保持部に保持された基板の裏面とその流体とが接するように供給する供給工程と、その保持部に対して凹状の凹部に対応した前記基板の表面に、前記面位置を検出する為の光を照射する照射工程とを備える。 The surface position detection method according to the third aspect of the present invention detects light reflected by the surface of a flexible substrate having light transmission, and detects the surface position of the surface of the substrate based on the detection result. This is a surface position detection method. The surface position detection method includes a holding step of holding the back surface of the substrate by the holding portion, and holding a fluid having a refractive index equivalent to the refractive index of the substrate in the concave portion formed concavely with respect to the holding portion. Supplying the substrate so that the fluid is in contact with the back surface of the substrate held by the portion, and light for detecting the surface position on the surface of the substrate corresponding to the concave portion with respect to the holding portion. An irradiation step of irradiating.
Claims (2)
前記基板の裏面を保持する保持部と、該保持部に対して凹状に形成された凹部とを有する保持装置と、
前記基板の屈折率と同等の屈折率を有する流体を、前記凹部に供給する流体供給装置と、
前記保持装置の凹部に対応した前記基板の表面に、前記面位置を検出する為の光を照射する照射装置と、
を備える面位置検出装置。
In a surface position detection device that detects light reflected by the surface of a flexible substrate having light permeability, and detects the surface position of the surface based on the detection result,
A holding device having a holding portion for holding the back surface of the substrate, and a recess formed in a concave shape with respect to the holding portion;
A fluid supply device for supplying a fluid having a refractive index equivalent to the refractive index of the substrate to the recess;
An irradiation device for irradiating the surface of the substrate corresponding to the concave portion of the holding device with light for detecting the surface position;
A surface position detecting device.
保持部によって前記基板の裏面を保持する保持工程と、
前記保持部に対して凹状に形成された凹部に、前記基板の屈折率と同等の屈折率を有する流体を、前記保持部に保持された前記基板の裏面と該流体とが接するように供給する供給工程と、
前記保持部に対して凹状の凹部に対応した前記基板の表面に、前記面位置を検出する為の光を照射する照射工程と、
を備える面位置検出方法。
In a surface position detection method for detecting light reflected by the surface of a flexible substrate having light transmission and detecting the surface position of the surface of the substrate based on the detection result,
A holding step of holding the back surface of the substrate by a holding unit;
A fluid having a refractive index equivalent to the refractive index of the substrate is supplied to a concave portion formed in a concave shape with respect to the holding portion so that the back surface of the substrate held by the holding portion is in contact with the fluid. A supply process;
An irradiation step of irradiating the surface of the substrate corresponding to the concave portion with respect to the holding portion with light for detecting the surface position;
A surface position detection method comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009124810A JP2010271603A (en) | 2009-05-25 | 2009-05-25 | Apparatus for detecting surface position, apparatus for forming pattern, method for detecting surface position, method for forming pattern, and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009124810A JP2010271603A (en) | 2009-05-25 | 2009-05-25 | Apparatus for detecting surface position, apparatus for forming pattern, method for detecting surface position, method for forming pattern, and device manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010271603A JP2010271603A (en) | 2010-12-02 |
| JP2010271603A5 true JP2010271603A5 (en) | 2012-06-07 |
Family
ID=43419658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009124810A Pending JP2010271603A (en) | 2009-05-25 | 2009-05-25 | Apparatus for detecting surface position, apparatus for forming pattern, method for detecting surface position, method for forming pattern, and device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2010271603A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2013035696A1 (en) * | 2011-09-05 | 2015-03-23 | 株式会社ニコン | Substrate transport apparatus and substrate processing apparatus |
| WO2013121625A1 (en) * | 2012-02-17 | 2013-08-22 | 株式会社ニコン | Substrate delivery device, substrate processing device and substrate processing method |
| JP6137796B2 (en) * | 2012-09-18 | 2017-05-31 | 株式会社ディスコ | Processing equipment |
| KR20160073415A (en) * | 2013-10-22 | 2016-06-24 | 어플라이드 머티어리얼스, 인코포레이티드 | Roll to roll mask-less lithography with active alignment |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58156210U (en) * | 1982-04-14 | 1983-10-19 | パイオニアビデオ株式会社 | Anti-reflection structure on the back side of flatness measuring machine |
| JPS62217250A (en) * | 1986-03-19 | 1987-09-24 | Fujitsu Ltd | Focusing method |
| JP2617754B2 (en) * | 1988-02-03 | 1997-06-04 | 旭光学工業株式会社 | Method for measuring surface shape of transmission optical element and measuring jig used for the method |
| JP3180229B2 (en) * | 1992-03-31 | 2001-06-25 | キヤノン株式会社 | Automatic focusing device |
| JPH06188173A (en) * | 1992-12-16 | 1994-07-08 | Nikon Corp | Surface position detector |
| JP3265504B2 (en) * | 1993-10-12 | 2002-03-11 | 株式会社ニコン | Exposure method and apparatus, and method for manufacturing semiconductor element |
| JPH11230860A (en) * | 1998-02-12 | 1999-08-27 | Fujitsu Ltd | Method and device for measuring optical thin film, and device for removing interfering light in optical thin film measurement used for same device |
| JP3003671B2 (en) * | 1998-06-01 | 2000-01-31 | 株式会社日立製作所 | Method and apparatus for detecting height of sample surface |
| JP2004273828A (en) * | 2003-03-10 | 2004-09-30 | Nikon Corp | Method and device for surface position detection, focusing device, aligner, and manufacturing method for device |
| US7375795B2 (en) * | 2004-12-22 | 2008-05-20 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| JP2006313866A (en) * | 2005-05-09 | 2006-11-16 | Canon Inc | Exposure device and method therefor |
-
2009
- 2009-05-25 JP JP2009124810A patent/JP2010271603A/en active Pending
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