JP2010219080A5 - - Google Patents

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Publication number
JP2010219080A5
JP2010219080A5 JP2009060372A JP2009060372A JP2010219080A5 JP 2010219080 A5 JP2010219080 A5 JP 2010219080A5 JP 2009060372 A JP2009060372 A JP 2009060372A JP 2009060372 A JP2009060372 A JP 2009060372A JP 2010219080 A5 JP2010219080 A5 JP 2010219080A5
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JP
Japan
Prior art keywords
optical
optical element
shape
driven body
lens barrel
Prior art date
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Pending
Application number
JP2009060372A
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English (en)
Japanese (ja)
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JP2010219080A (ja
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Publication date
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Priority to JP2009060372A priority Critical patent/JP2010219080A/ja
Priority claimed from JP2009060372A external-priority patent/JP2010219080A/ja
Publication of JP2010219080A publication Critical patent/JP2010219080A/ja
Publication of JP2010219080A5 publication Critical patent/JP2010219080A5/ja
Pending legal-status Critical Current

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JP2009060372A 2009-03-13 2009-03-13 光学装置、ステージ装置、光学系及び露光装置 Pending JP2010219080A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009060372A JP2010219080A (ja) 2009-03-13 2009-03-13 光学装置、ステージ装置、光学系及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009060372A JP2010219080A (ja) 2009-03-13 2009-03-13 光学装置、ステージ装置、光学系及び露光装置

Publications (2)

Publication Number Publication Date
JP2010219080A JP2010219080A (ja) 2010-09-30
JP2010219080A5 true JP2010219080A5 (cg-RX-API-DMAC7.html) 2012-04-26

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ID=42977642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009060372A Pending JP2010219080A (ja) 2009-03-13 2009-03-13 光学装置、ステージ装置、光学系及び露光装置

Country Status (1)

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JP (1) JP2010219080A (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011076435B4 (de) * 2011-05-25 2013-09-19 Carl Zeiss Smt Gmbh Verfahren sowie Vorrichtung zur Einstellung einer Beleuchtungsoptik
DE102019201147A1 (de) * 2019-01-30 2020-07-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit einer optischen Anordnung
CN113933948B (zh) * 2020-06-29 2023-04-07 上海微电子装备（集团）股份有限公司 镜组调节机构、可调式光学系统及光刻设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2694043B2 (ja) * 1990-10-08 1997-12-24 キヤノン株式会社 投影型露光装置
JP3634563B2 (ja) * 1997-05-09 2005-03-30 キヤノン株式会社 露光方法および装置並びにデバイス製造方法
DE19827603A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
DE19859634A1 (de) * 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie
JP4945845B2 (ja) * 2000-03-31 2012-06-06 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
US6411426B1 (en) * 2000-04-25 2002-06-25 Asml, Us, Inc. Apparatus, system, and method for active compensation of aberrations in an optical system
JP4565261B2 (ja) * 2002-06-24 2010-10-20 株式会社ニコン 光学素子保持機構、光学系鏡筒及び露光装置
JP2007206643A (ja) * 2006-02-06 2007-08-16 Canon Inc 光学素子駆動装置、露光装置およびデバイス製造方法

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