JP2010217877A5 - - Google Patents
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- Publication number
- JP2010217877A5 JP2010217877A5 JP2010026086A JP2010026086A JP2010217877A5 JP 2010217877 A5 JP2010217877 A5 JP 2010217877A5 JP 2010026086 A JP2010026086 A JP 2010026086A JP 2010026086 A JP2010026086 A JP 2010026086A JP 2010217877 A5 JP2010217877 A5 JP 2010217877A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- pattern
- optical system
- substrate
- exposure apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US20258009P | 2009-03-13 | 2009-03-13 | |
| US61/202,580 | 2009-03-13 | ||
| US12/692,443 US8264666B2 (en) | 2009-03-13 | 2010-01-22 | Exposure apparatus, exposure method, and method of manufacturing device |
| US12/692,443 | 2010-01-22 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010217877A JP2010217877A (ja) | 2010-09-30 |
| JP2010217877A5 true JP2010217877A5 (enExample) | 2013-02-28 |
| JP5534176B2 JP5534176B2 (ja) | 2014-06-25 |
Family
ID=42169502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010026086A Expired - Fee Related JP5534176B2 (ja) | 2009-03-13 | 2010-02-09 | 露光装置、露光方法、およびデバイス製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8264666B2 (enExample) |
| JP (1) | JP5534176B2 (enExample) |
| KR (1) | KR20110137309A (enExample) |
| CN (1) | CN102362227B (enExample) |
| TW (1) | TWI453547B (enExample) |
| WO (1) | WO2010104162A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5451175B2 (ja) * | 2009-05-15 | 2014-03-26 | サンエー技研株式会社 | 露光装置 |
| US9348462B2 (en) * | 2012-06-13 | 2016-05-24 | Maxim Integrated Products, Inc. | Gesture detection and recognition based upon measurement and tracking of light intensity ratios within an array of photodetectors |
| WO2014010274A1 (ja) * | 2012-07-13 | 2014-01-16 | 株式会社ニコン | 基板処理装置、及びデバイス製造方法 |
| CN104620178B (zh) | 2012-09-14 | 2016-10-26 | 株式会社尼康 | 基板处理装置及元件制造方法 |
| KR101984451B1 (ko) * | 2012-11-06 | 2019-05-30 | 가부시키가이샤 니콘 | 편광 빔 스플리터, 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
| CN110045580B (zh) * | 2013-06-14 | 2021-07-23 | 株式会社尼康 | 扫描曝光装置 |
| CN105684126A (zh) * | 2013-10-22 | 2016-06-15 | 应用材料公司 | 具有主动对准的卷对卷无掩模光刻 |
| KR102211609B1 (ko) * | 2014-09-04 | 2021-02-03 | 가부시키가이샤 니콘 | 처리 시스템 및 디바이스 제조 방법 |
| GB2530768B (en) * | 2014-10-01 | 2019-07-17 | Kratos Analytical Ltd | Method and apparatuses relating to cleaning an ion source |
| WO2016136974A1 (ja) * | 2015-02-27 | 2016-09-01 | 株式会社ニコン | 基板処理装置、デバイス製造システム及びデバイス製造方法 |
| JP6723831B2 (ja) * | 2016-06-01 | 2020-07-15 | 株式会社オーク製作所 | 露光装置 |
| CN109031899A (zh) * | 2018-09-29 | 2018-12-18 | 苏州源卓光电科技有限公司 | 一种高分辨率高效率投影光刻成像系统及曝光方法 |
| DE102022200539A1 (de) | 2022-01-18 | 2022-11-17 | Carl Zeiss Smt Gmbh | Optisches System für die Projektionslithographie |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5652645A (en) | 1995-07-24 | 1997-07-29 | Anvik Corporation | High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates |
| RU2084941C1 (ru) | 1996-05-06 | 1997-07-20 | Йелстаун Корпорейшн Н.В. | Адаптивный оптический модуль |
| US5923403A (en) * | 1997-07-08 | 1999-07-13 | Anvik Corporation | Simultaneous, two-sided projection lithography system |
| TW448487B (en) * | 1997-11-22 | 2001-08-01 | Nippon Kogaku Kk | Exposure apparatus, exposure method and manufacturing method of device |
| JP3376935B2 (ja) | 1999-01-25 | 2003-02-17 | ウシオ電機株式会社 | 帯状ワークの露光装置 |
| US6900915B2 (en) | 2001-11-14 | 2005-05-31 | Ricoh Company, Ltd. | Light deflecting method and apparatus efficiently using a floating mirror |
| JP4307813B2 (ja) | 2001-11-14 | 2009-08-05 | 株式会社リコー | 光偏向方法並びに光偏向装置及びその光偏向装置の製造方法並びにその光偏向装置を具備する光情報処理装置及び画像形成装置及び画像投影表示装置及び光伝送装置 |
| EP1324136A1 (en) * | 2001-12-28 | 2003-07-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
| JP2005222963A (ja) * | 2002-06-12 | 2005-08-18 | Asml Netherlands Bv | リソグラフィ装置およびその装置の製造方法 |
| US7095546B2 (en) | 2003-04-24 | 2006-08-22 | Metconnex Canada Inc. | Micro-electro-mechanical-system two dimensional mirror with articulated suspension structures for high fill factor arrays |
| CA2522790C (en) | 2003-04-24 | 2013-12-03 | Metconnex Canada Inc. | A micro-electro-mechanical-system two dimensional mirror with articulated suspension structures for high fill factor arrays |
| US7292308B2 (en) * | 2004-03-23 | 2007-11-06 | Asml Holding N.V. | System and method for patterning a flexible substrate in a lithography tool |
| CN100339754C (zh) * | 2004-04-28 | 2007-09-26 | 友达光电股份有限公司 | 应用于反射式平面显示器的反射电极的制作方法及光罩 |
| JP4335114B2 (ja) | 2004-10-18 | 2009-09-30 | 日本碍子株式会社 | マイクロミラーデバイス |
| EP1811547A4 (en) * | 2005-02-03 | 2010-06-02 | Nikon Corp | OPTICAL INTEGRATOR, OPTICAL LIGHTING DEVICE, EXPOSURE DEVICE AND EXPOSURE METHOD |
| US7738081B2 (en) * | 2005-05-06 | 2010-06-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a flat panel display handler with conveyor device and substrate handler |
| JP4542495B2 (ja) | 2005-10-19 | 2010-09-15 | 株式会社目白プレシジョン | 投影露光装置及びその投影露光方法 |
| KR20080103564A (ko) | 2006-02-16 | 2008-11-27 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
| JP4929762B2 (ja) | 2006-03-03 | 2012-05-09 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
| JP5362259B2 (ja) * | 2008-05-14 | 2013-12-11 | 大日本スクリーン製造株式会社 | 画像記録装置 |
| JP5487981B2 (ja) * | 2009-01-30 | 2014-05-14 | 株式会社ニコン | 露光方法及び装置、並びにデバイス製造方法 |
| JP5397748B2 (ja) * | 2009-02-25 | 2014-01-22 | 株式会社ニコン | 露光装置、走査露光方法、およびデバイス製造方法 |
-
2010
- 2010-01-22 US US12/692,443 patent/US8264666B2/en not_active Expired - Fee Related
- 2010-02-09 JP JP2010026086A patent/JP5534176B2/ja not_active Expired - Fee Related
- 2010-03-05 KR KR1020117021229A patent/KR20110137309A/ko not_active Ceased
- 2010-03-05 WO PCT/JP2010/054163 patent/WO2010104162A1/en not_active Ceased
- 2010-03-05 CN CN201080011781.4A patent/CN102362227B/zh not_active Expired - Fee Related
- 2010-03-12 TW TW099107186A patent/TWI453547B/zh not_active IP Right Cessation
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