JP2010169722A5 - - Google Patents
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- Publication number
- JP2010169722A5 JP2010169722A5 JP2009009619A JP2009009619A JP2010169722A5 JP 2010169722 A5 JP2010169722 A5 JP 2010169722A5 JP 2009009619 A JP2009009619 A JP 2009009619A JP 2009009619 A JP2009009619 A JP 2009009619A JP 2010169722 A5 JP2010169722 A5 JP 2010169722A5
- Authority
- JP
- Japan
- Prior art keywords
- grid
- substrate
- diffractive structure
- optical element
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 claims description 12
- 230000003287 optical effect Effects 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- 238000001312 dry etching Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000000206 photolithography Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009009619A JP2010169722A (ja) | 2009-01-20 | 2009-01-20 | 光学素子の製造方法及び光学素子 |
| US12/633,981 US8248697B2 (en) | 2009-01-20 | 2009-12-09 | Method for manufacturing an optical element to polarize and split incident light |
| CN201010004571A CN101806931A (zh) | 2009-01-20 | 2010-01-19 | 光学元件的制造方法及光学元件 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009009619A JP2010169722A (ja) | 2009-01-20 | 2009-01-20 | 光学素子の製造方法及び光学素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010169722A JP2010169722A (ja) | 2010-08-05 |
| JP2010169722A5 true JP2010169722A5 (enExample) | 2012-02-23 |
Family
ID=42336772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009009619A Withdrawn JP2010169722A (ja) | 2009-01-20 | 2009-01-20 | 光学素子の製造方法及び光学素子 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8248697B2 (enExample) |
| JP (1) | JP2010169722A (enExample) |
| CN (1) | CN101806931A (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8913320B2 (en) * | 2011-05-17 | 2014-12-16 | Moxtek, Inc. | Wire grid polarizer with bordered sections |
| US8873144B2 (en) * | 2011-05-17 | 2014-10-28 | Moxtek, Inc. | Wire grid polarizer with multiple functionality sections |
| US8922890B2 (en) * | 2012-03-21 | 2014-12-30 | Moxtek, Inc. | Polarizer edge rib modification |
| JP6341857B2 (ja) * | 2012-06-21 | 2018-06-13 | マクセル株式会社 | 光学素子および光学装置 |
| KR101942363B1 (ko) * | 2012-07-26 | 2019-04-12 | 삼성디스플레이 주식회사 | 편광 소자, 이의 제조 방법, 이를 포함하는 표시 패널 및 이를 포함하는 표시 장치 |
| KR20140060058A (ko) * | 2012-11-09 | 2014-05-19 | 삼성디스플레이 주식회사 | 편광판, 편광판의 제조방법 및 이를 포함하는 표시장치 |
| US9348076B2 (en) | 2013-10-24 | 2016-05-24 | Moxtek, Inc. | Polarizer with variable inter-wire distance |
| CN106461962B (zh) | 2014-02-06 | 2020-10-27 | 视觉缓解公司 | 线栅偏振器及制造方法 |
| DK3401711T3 (da) | 2016-01-08 | 2023-04-24 | Dainippon Printing Co Ltd | Diffraktivt optisk element og lysbestrålingsapparat |
| JP2017129887A (ja) * | 2017-05-01 | 2017-07-27 | デクセリアルズ株式会社 | 偏光素子、偏光素子の製造方法 |
| CN107316949B (zh) * | 2017-07-11 | 2020-07-31 | 京东方科技集团股份有限公司 | 显示面板及其制造方法、显示装置 |
| TWI641878B (zh) * | 2017-09-22 | 2018-11-21 | 友達光電股份有限公司 | 線柵偏光器以及使用此線柵偏光器的顯示面板 |
| JP7327907B2 (ja) * | 2018-04-25 | 2023-08-16 | デクセリアルズ株式会社 | 偏光板及び偏光板の製造方法 |
| JP2019095817A (ja) * | 2019-03-25 | 2019-06-20 | デクセリアルズ株式会社 | 偏光素子、偏光素子の製造方法 |
| US11662524B2 (en) * | 2020-03-13 | 2023-05-30 | Applied Materials, Inc. | Forming variable depth structures with laser ablation |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006003447A (ja) * | 2004-06-15 | 2006-01-05 | Sony Corp | 偏光分離素子及びその製造方法 |
| JP4551738B2 (ja) | 2004-11-02 | 2010-09-29 | キヤノン株式会社 | 現像ローラ、プロセスカートリッジ及び画像形成装置 |
| JP4457854B2 (ja) * | 2004-11-02 | 2010-04-28 | ソニー株式会社 | 偏光子、液晶パネルおよび投射型表示装置 |
| US7570424B2 (en) * | 2004-12-06 | 2009-08-04 | Moxtek, Inc. | Multilayer wire-grid polarizer |
| US7800823B2 (en) * | 2004-12-06 | 2010-09-21 | Moxtek, Inc. | Polarization device to polarize and further control light |
| JP4449841B2 (ja) * | 2005-07-05 | 2010-04-14 | セイコーエプソン株式会社 | ワイヤーグリッド偏光子の製造方法、液晶装置、プロジェクタ |
| US7755718B2 (en) * | 2007-08-10 | 2010-07-13 | Seiko Epson Corporation | Optical element, liquid crystal device, and display |
| JP4535121B2 (ja) * | 2007-11-28 | 2010-09-01 | セイコーエプソン株式会社 | 光学素子及びその製造方法、液晶装置、電子機器 |
| US8248696B2 (en) * | 2009-06-25 | 2012-08-21 | Moxtek, Inc. | Nano fractal diffuser |
-
2009
- 2009-01-20 JP JP2009009619A patent/JP2010169722A/ja not_active Withdrawn
- 2009-12-09 US US12/633,981 patent/US8248697B2/en not_active Expired - Fee Related
-
2010
- 2010-01-19 CN CN201010004571A patent/CN101806931A/zh active Pending
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