JP2010146927A5 - - Google Patents

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Publication number
JP2010146927A5
JP2010146927A5 JP2008324894A JP2008324894A JP2010146927A5 JP 2010146927 A5 JP2010146927 A5 JP 2010146927A5 JP 2008324894 A JP2008324894 A JP 2008324894A JP 2008324894 A JP2008324894 A JP 2008324894A JP 2010146927 A5 JP2010146927 A5 JP 2010146927A5
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JP
Japan
Prior art keywords
sample
closed space
contact
adsorption
adsorption mechanism
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JP2008324894A
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English (en)
Japanese (ja)
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JP5178495B2 (ja
JP2010146927A (ja
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Priority to JP2008324894A priority Critical patent/JP5178495B2/ja
Priority claimed from JP2008324894A external-priority patent/JP5178495B2/ja
Publication of JP2010146927A publication Critical patent/JP2010146927A/ja
Publication of JP2010146927A5 publication Critical patent/JP2010146927A5/ja
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Publication of JP5178495B2 publication Critical patent/JP5178495B2/ja
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JP2008324894A 2008-12-22 2008-12-22 試料搬送機構、及び試料搬送機構を備えた走査電子顕微鏡 Expired - Fee Related JP5178495B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008324894A JP5178495B2 (ja) 2008-12-22 2008-12-22 試料搬送機構、及び試料搬送機構を備えた走査電子顕微鏡

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008324894A JP5178495B2 (ja) 2008-12-22 2008-12-22 試料搬送機構、及び試料搬送機構を備えた走査電子顕微鏡

Publications (3)

Publication Number Publication Date
JP2010146927A JP2010146927A (ja) 2010-07-01
JP2010146927A5 true JP2010146927A5 (enExample) 2011-05-12
JP5178495B2 JP5178495B2 (ja) 2013-04-10

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ID=42567103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008324894A Expired - Fee Related JP5178495B2 (ja) 2008-12-22 2008-12-22 試料搬送機構、及び試料搬送機構を備えた走査電子顕微鏡

Country Status (1)

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JP (1) JP5178495B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10825705B2 (en) * 2015-05-15 2020-11-03 Suss Microtec Lithography Gmbh Apparatus, system, and method for handling aligned wafer pairs
JP6609448B2 (ja) * 2015-09-30 2019-11-20 株式会社日立ハイテクマニファクチャ＆サービス 試料搬送装置
JP7497150B2 (ja) * 2019-12-03 2024-06-10 キヤノン株式会社 搬送装置、リソグラフィ装置及び物品の製造方法
JP2021163819A (ja) * 2020-03-31 2021-10-11 キヤノン株式会社 搬送装置、搬送方法、リソグラフィ装置、リソグラフィシステム、および物品製造方法
CN111710628B (zh) * 2020-06-03 2023-04-28 西安交通大学 一种超高真空环境多功能样品台及样品原位图案化的方法
JP7625420B2 (ja) * 2021-01-14 2025-02-03 キヤノン株式会社 基板搬送ハンド、基板搬送システム、コンピュータプログラム及び物品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58141536A (ja) * 1982-02-17 1983-08-22 Sanyo Electric Co Ltd 半導体ウエハ−の吸着ヘツド
JPH0650987Y2 (ja) * 1985-07-02 1994-12-21 東京エレクトロン株式会社 ウエハ吸着保持装置
JPS6371141U (enExample) * 1986-10-24 1988-05-13
JPH0750336A (ja) * 1993-08-04 1995-02-21 Hitachi Ltd 差動排気型真空吸着治具
JP4642787B2 (ja) * 2006-05-09 2011-03-02 東京エレクトロン株式会社 基板搬送装置及び縦型熱処理装置

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