JP2010146927A5 - - Google Patents
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- JP2010146927A5 JP2010146927A5 JP2008324894A JP2008324894A JP2010146927A5 JP 2010146927 A5 JP2010146927 A5 JP 2010146927A5 JP 2008324894 A JP2008324894 A JP 2008324894A JP 2008324894 A JP2008324894 A JP 2008324894A JP 2010146927 A5 JP2010146927 A5 JP 2010146927A5
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- Prior art keywords
- sample
- closed space
- contact
- adsorption
- adsorption mechanism
- Prior art date
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- 239000007921 spray Substances 0.000 claims 3
- 238000010894 electron beam technology Methods 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 1
Claims (4)
前記ハンドには、前記試料の吸着によって、前記試料に接する接触面が設けられ、当該接触面と、前記試料の接触によって、前記吹付口と前記吸引口を内在する閉空間が形成されることを特徴とする試料搬送装置。 In claim 1,
The hand is provided with a contact surface in contact with the sample by adsorption of the sample, and a closed space containing the spray port and the suction port is formed by contact of the contact surface and the sample. Characteristic sample transport device.
前記閉空間内での気体の吹付け及び吸引は、前記吸着機構による試料の吸着後に行われることを特徴とする試料搬送装置。 In claim 1,
The sample transport apparatus according to claim 1, wherein the gas is blown and sucked in the closed space after the sample is adsorbed by the adsorption mechanism.
当該搬送機構によって搬送された試料に電子ビームを照射する電子顕微鏡鏡体を備えた走査電子顕微鏡において、
当該電子ビームが照射される試料に電圧を印加するための接触端子を備え、
前記試料に対する当該接触端子の接触個所に付着する異物を除去するための異物除去機構が、前記搬送機構に設けられると共に、当該異物除去機構は、前記試料カセットに向かって搬送される試料に付着した異物を除去するように動作することを特徴とする走査電子顕微鏡。 A transport mechanism for transporting the sample held in the sample cassette;
In a scanning electron microscope equipped with an electron microscope body that irradiates an electron beam onto a sample conveyed by the conveyance mechanism,
A contact terminal for applying a voltage to the sample irradiated with the electron beam;
A foreign matter removal mechanism for removing foreign matter adhering to the contact portion of the contact terminal with respect to the sample is provided in the transport mechanism, and the foreign matter removal mechanism is attached to the sample transported toward the sample cassette. A scanning electron microscope which operates to remove foreign substances.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008324894A JP5178495B2 (en) | 2008-12-22 | 2008-12-22 | Sample transport mechanism and scanning electron microscope equipped with sample transport mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008324894A JP5178495B2 (en) | 2008-12-22 | 2008-12-22 | Sample transport mechanism and scanning electron microscope equipped with sample transport mechanism |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010146927A JP2010146927A (en) | 2010-07-01 |
JP2010146927A5 true JP2010146927A5 (en) | 2011-05-12 |
JP5178495B2 JP5178495B2 (en) | 2013-04-10 |
Family
ID=42567103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008324894A Expired - Fee Related JP5178495B2 (en) | 2008-12-22 | 2008-12-22 | Sample transport mechanism and scanning electron microscope equipped with sample transport mechanism |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5178495B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10825705B2 (en) * | 2015-05-15 | 2020-11-03 | Suss Microtec Lithography Gmbh | Apparatus, system, and method for handling aligned wafer pairs |
JP6609448B2 (en) * | 2015-09-30 | 2019-11-20 | 株式会社日立ハイテクマニファクチャ&サービス | Sample transport device |
CN111710628B (en) * | 2020-06-03 | 2023-04-28 | 西安交通大学 | Multifunctional sample stage in ultrahigh vacuum environment and sample in-situ patterning method |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58141536A (en) * | 1982-02-17 | 1983-08-22 | Sanyo Electric Co Ltd | Attracting head of semiconductor wafer |
JPH0650987Y2 (en) * | 1985-07-02 | 1994-12-21 | 東京エレクトロン株式会社 | Wafer suction holding device |
JPS6371141U (en) * | 1986-10-24 | 1988-05-13 | ||
JPH0750336A (en) * | 1993-08-04 | 1995-02-21 | Hitachi Ltd | Differential suction type vacuum chuck |
JP4642787B2 (en) * | 2006-05-09 | 2011-03-02 | 東京エレクトロン株式会社 | Substrate transfer device and vertical heat treatment device |
-
2008
- 2008-12-22 JP JP2008324894A patent/JP5178495B2/en not_active Expired - Fee Related
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