JP2009183949A5 - - Google Patents

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Publication number
JP2009183949A5
JP2009183949A5 JP2009114870A JP2009114870A JP2009183949A5 JP 2009183949 A5 JP2009183949 A5 JP 2009183949A5 JP 2009114870 A JP2009114870 A JP 2009114870A JP 2009114870 A JP2009114870 A JP 2009114870A JP 2009183949 A5 JP2009183949 A5 JP 2009183949A5
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JP
Japan
Prior art keywords
ultraviolet light
ultraviolet
processed
gas supply
open
Prior art date
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Granted
Application number
JP2009114870A
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English (en)
Japanese (ja)
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JP2009183949A (ja
JP4883133B2 (ja
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Application filed filed Critical
Priority to JP2009114870A priority Critical patent/JP4883133B2/ja
Priority claimed from JP2009114870A external-priority patent/JP4883133B2/ja
Publication of JP2009183949A publication Critical patent/JP2009183949A/ja
Publication of JP2009183949A5 publication Critical patent/JP2009183949A5/ja
Application granted granted Critical
Publication of JP4883133B2 publication Critical patent/JP4883133B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2009114870A 2009-05-11 2009-05-11 紫外光洗浄装置 Expired - Lifetime JP4883133B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009114870A JP4883133B2 (ja) 2009-05-11 2009-05-11 紫外光洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009114870A JP4883133B2 (ja) 2009-05-11 2009-05-11 紫外光洗浄装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003435401A Division JP4337547B2 (ja) 2003-12-26 2003-12-26 紫外光洗浄装置および紫外光洗浄装置用紫外線ランプ

Publications (3)

Publication Number Publication Date
JP2009183949A JP2009183949A (ja) 2009-08-20
JP2009183949A5 true JP2009183949A5 (enExample) 2011-04-14
JP4883133B2 JP4883133B2 (ja) 2012-02-22

Family

ID=41067764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009114870A Expired - Lifetime JP4883133B2 (ja) 2009-05-11 2009-05-11 紫外光洗浄装置

Country Status (1)

Country Link
JP (1) JP4883133B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012003980A (ja) * 2010-06-17 2012-01-05 Sumitomo Electric Ind Ltd 酸化物超電導薄膜線材の製造方法および製造装置
CN103962346B (zh) * 2014-05-21 2016-08-24 深圳市华星光电技术有限公司 可调整紫外光照射能量的紫外光清洗基板的方法
JP7281083B2 (ja) * 2019-05-14 2023-05-25 ウシオ電機株式会社 エキシマ光照射装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000260396A (ja) * 1999-03-05 2000-09-22 Quark Systems Co Ltd エキシマランプ、エキシマ照射装置および有機化合物の分解方法
JP4218192B2 (ja) * 1999-08-05 2009-02-04 株式会社日立ハイテクノロジーズ 基板処理装置及び処理方法
JP2001300451A (ja) * 2000-04-25 2001-10-30 Hoya Schott Kk 紫外光照射装置
TWI251506B (en) * 2000-11-01 2006-03-21 Shinetsu Eng Co Ltd Excimer UV photo reactor

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