JP4883133B2 - 紫外光洗浄装置 - Google Patents
紫外光洗浄装置 Download PDFInfo
- Publication number
- JP4883133B2 JP4883133B2 JP2009114870A JP2009114870A JP4883133B2 JP 4883133 B2 JP4883133 B2 JP 4883133B2 JP 2009114870 A JP2009114870 A JP 2009114870A JP 2009114870 A JP2009114870 A JP 2009114870A JP 4883133 B2 JP4883133 B2 JP 4883133B2
- Authority
- JP
- Japan
- Prior art keywords
- ultraviolet
- ultraviolet light
- lamp
- workpiece
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims description 44
- 239000007789 gas Substances 0.000 claims description 44
- 239000012298 atmosphere Substances 0.000 claims description 36
- 239000011261 inert gas Substances 0.000 claims description 28
- 238000009792 diffusion process Methods 0.000 claims description 21
- 230000007723 transport mechanism Effects 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 44
- 239000001301 oxygen Substances 0.000 description 44
- 229910052760 oxygen Inorganic materials 0.000 description 44
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 41
- 229910001873 dinitrogen Inorganic materials 0.000 description 24
- 239000000758 substrate Substances 0.000 description 14
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 238000012545 processing Methods 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000005416 organic matter Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 3
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 3
- 235000011130 ammonium sulphate Nutrition 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000006552 photochemical reaction Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Landscapes
- Liquid Crystal (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009114870A JP4883133B2 (ja) | 2009-05-11 | 2009-05-11 | 紫外光洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009114870A JP4883133B2 (ja) | 2009-05-11 | 2009-05-11 | 紫外光洗浄装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003435401A Division JP4337547B2 (ja) | 2003-12-26 | 2003-12-26 | 紫外光洗浄装置および紫外光洗浄装置用紫外線ランプ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009183949A JP2009183949A (ja) | 2009-08-20 |
| JP2009183949A5 JP2009183949A5 (enExample) | 2011-04-14 |
| JP4883133B2 true JP4883133B2 (ja) | 2012-02-22 |
Family
ID=41067764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009114870A Expired - Lifetime JP4883133B2 (ja) | 2009-05-11 | 2009-05-11 | 紫外光洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4883133B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012003980A (ja) * | 2010-06-17 | 2012-01-05 | Sumitomo Electric Ind Ltd | 酸化物超電導薄膜線材の製造方法および製造装置 |
| CN103962346B (zh) * | 2014-05-21 | 2016-08-24 | 深圳市华星光电技术有限公司 | 可调整紫外光照射能量的紫外光清洗基板的方法 |
| JP7281083B2 (ja) * | 2019-05-14 | 2023-05-25 | ウシオ電機株式会社 | エキシマ光照射装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000260396A (ja) * | 1999-03-05 | 2000-09-22 | Quark Systems Co Ltd | エキシマランプ、エキシマ照射装置および有機化合物の分解方法 |
| JP4218192B2 (ja) * | 1999-08-05 | 2009-02-04 | 株式会社日立ハイテクノロジーズ | 基板処理装置及び処理方法 |
| JP2001300451A (ja) * | 2000-04-25 | 2001-10-30 | Hoya Schott Kk | 紫外光照射装置 |
| TWI251506B (en) * | 2000-11-01 | 2006-03-21 | Shinetsu Eng Co Ltd | Excimer UV photo reactor |
-
2009
- 2009-05-11 JP JP2009114870A patent/JP4883133B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009183949A (ja) | 2009-08-20 |
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