JP2010134064A - マスクレス露光観察装置 - Google Patents

マスクレス露光観察装置 Download PDF

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Publication number
JP2010134064A
JP2010134064A JP2008308226A JP2008308226A JP2010134064A JP 2010134064 A JP2010134064 A JP 2010134064A JP 2008308226 A JP2008308226 A JP 2008308226A JP 2008308226 A JP2008308226 A JP 2008308226A JP 2010134064 A JP2010134064 A JP 2010134064A
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Japan
Prior art keywords
substrate
exposure
observation
optical system
pattern
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JP2008308226A
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Japanese (ja)
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JP2010134064A5 (enExample
Inventor
Hiromasa Shibata
浩匡 柴田
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Nikon Corp
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Nikon Corp
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Priority to JP2008308226A priority Critical patent/JP2010134064A/ja
Publication of JP2010134064A publication Critical patent/JP2010134064A/ja
Publication of JP2010134064A5 publication Critical patent/JP2010134064A5/ja
Pending legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2008308226A 2008-12-03 2008-12-03 マスクレス露光観察装置 Pending JP2010134064A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008308226A JP2010134064A (ja) 2008-12-03 2008-12-03 マスクレス露光観察装置

Applications Claiming Priority (1)

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JP2008308226A JP2010134064A (ja) 2008-12-03 2008-12-03 マスクレス露光観察装置

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JP2010134064A true JP2010134064A (ja) 2010-06-17
JP2010134064A5 JP2010134064A5 (enExample) 2012-08-09

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JP2008308226A Pending JP2010134064A (ja) 2008-12-03 2008-12-03 マスクレス露光観察装置

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021021816A (ja) * 2019-07-26 2021-02-18 株式会社ピーエムティー 露光方法
KR20250025877A (ko) * 2023-08-16 2025-02-25 세종대학교산학협력단 레이저 기반 직접 기록 리소그래피 시스템

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11204411A (ja) * 1998-01-19 1999-07-30 Nikon Corp 塗布現像露光装置
JP2001015408A (ja) * 1999-06-29 2001-01-19 Toshiba Corp レジストパターン形成装置及び基板検査装置
WO2002039189A1 (fr) * 2000-11-10 2002-05-16 National Institute Of Advanced Industrial Science And Technology Dispositif de transfert de motif comportant un projecteur pour circuits imprimes
JP2006140223A (ja) * 2004-11-10 2006-06-01 Toshiba Corp 露光システム、偏光モニタマスク及び偏光モニタ方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11204411A (ja) * 1998-01-19 1999-07-30 Nikon Corp 塗布現像露光装置
JP2001015408A (ja) * 1999-06-29 2001-01-19 Toshiba Corp レジストパターン形成装置及び基板検査装置
WO2002039189A1 (fr) * 2000-11-10 2002-05-16 National Institute Of Advanced Industrial Science And Technology Dispositif de transfert de motif comportant un projecteur pour circuits imprimes
JP2006140223A (ja) * 2004-11-10 2006-06-01 Toshiba Corp 露光システム、偏光モニタマスク及び偏光モニタ方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021021816A (ja) * 2019-07-26 2021-02-18 株式会社ピーエムティー 露光方法
KR20250025877A (ko) * 2023-08-16 2025-02-25 세종대학교산학협력단 레이저 기반 직접 기록 리소그래피 시스템
KR102894492B1 (ko) * 2023-08-16 2025-12-02 세종대학교산학협력단 레이저 기반 직접 기록 리소그래피 시스템

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