JP2010134064A5 - - Google Patents

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Publication number
JP2010134064A5
JP2010134064A5 JP2008308226A JP2008308226A JP2010134064A5 JP 2010134064 A5 JP2010134064 A5 JP 2010134064A5 JP 2008308226 A JP2008308226 A JP 2008308226A JP 2008308226 A JP2008308226 A JP 2008308226A JP 2010134064 A5 JP2010134064 A5 JP 2010134064A5
Authority
JP
Japan
Prior art keywords
substrate
exposure
observation apparatus
pattern
maskless exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008308226A
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English (en)
Japanese (ja)
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JP2010134064A (ja
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Publication date
Application filed filed Critical
Priority to JP2008308226A priority Critical patent/JP2010134064A/ja
Priority claimed from JP2008308226A external-priority patent/JP2010134064A/ja
Publication of JP2010134064A publication Critical patent/JP2010134064A/ja
Publication of JP2010134064A5 publication Critical patent/JP2010134064A5/ja
Pending legal-status Critical Current

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JP2008308226A 2008-12-03 2008-12-03 マスクレス露光観察装置 Pending JP2010134064A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008308226A JP2010134064A (ja) 2008-12-03 2008-12-03 マスクレス露光観察装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008308226A JP2010134064A (ja) 2008-12-03 2008-12-03 マスクレス露光観察装置

Publications (2)

Publication Number Publication Date
JP2010134064A JP2010134064A (ja) 2010-06-17
JP2010134064A5 true JP2010134064A5 (enExample) 2012-08-09

Family

ID=42345433

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008308226A Pending JP2010134064A (ja) 2008-12-03 2008-12-03 マスクレス露光観察装置

Country Status (1)

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JP (1) JP2010134064A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021021816A (ja) * 2019-07-26 2021-02-18 株式会社ピーエムティー 露光方法
KR102894492B1 (ko) * 2023-08-16 2025-12-02 세종대학교산학협력단 레이저 기반 직접 기록 리소그래피 시스템

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11204411A (ja) * 1998-01-19 1999-07-30 Nikon Corp 塗布現像露光装置
JP2001015408A (ja) * 1999-06-29 2001-01-19 Toshiba Corp レジストパターン形成装置及び基板検査装置
WO2002039189A1 (fr) * 2000-11-10 2002-05-16 National Institute Of Advanced Industrial Science And Technology Dispositif de transfert de motif comportant un projecteur pour circuits imprimes
JP2006140223A (ja) * 2004-11-10 2006-06-01 Toshiba Corp 露光システム、偏光モニタマスク及び偏光モニタ方法

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