JP2010096866A5 - - Google Patents

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Publication number
JP2010096866A5
JP2010096866A5 JP2008265715A JP2008265715A JP2010096866A5 JP 2010096866 A5 JP2010096866 A5 JP 2010096866A5 JP 2008265715 A JP2008265715 A JP 2008265715A JP 2008265715 A JP2008265715 A JP 2008265715A JP 2010096866 A5 JP2010096866 A5 JP 2010096866A5
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JP
Japan
Prior art keywords
lens
optical system
projection optical
intersection
center position
Prior art date
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Application number
JP2008265715A
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English (en)
Japanese (ja)
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JP2010096866A (ja
JP5253081B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2008265715A priority Critical patent/JP5253081B2/ja
Priority claimed from JP2008265715A external-priority patent/JP5253081B2/ja
Priority to US12/577,635 priority patent/US8432532B2/en
Publication of JP2010096866A publication Critical patent/JP2010096866A/ja
Publication of JP2010096866A5 publication Critical patent/JP2010096866A5/ja
Application granted granted Critical
Publication of JP5253081B2 publication Critical patent/JP5253081B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008265715A 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法 Expired - Fee Related JP5253081B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法
US12/577,635 US8432532B2 (en) 2008-10-14 2009-10-12 Projection optical system with rarefaction compensation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2010096866A JP2010096866A (ja) 2010-04-30
JP2010096866A5 true JP2010096866A5 (OSRAM) 2011-12-01
JP5253081B2 JP5253081B2 (ja) 2013-07-31

Family

ID=42098605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008265715A Expired - Fee Related JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

Country Status (2)

Country Link
US (1) US8432532B2 (OSRAM)
JP (1) JP5253081B2 (OSRAM)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106659851B (zh) 2014-04-25 2020-05-19 拜耳医药保健有限公司 具有滚动膜片的注射器
CN107847192A (zh) 2015-04-24 2018-03-27 拜耳医药保健有限公司 具有卷动膜片的针筒
AR109649A1 (es) 2016-09-16 2019-01-09 Bayer Healthcare Llc Camisa de presión con elemento de retención de jeringa
EP4302808A3 (en) 2016-10-17 2024-04-17 Bayer Healthcare LLC Fluid injector with syringe engagement mechanism
US11207462B2 (en) 2016-10-17 2021-12-28 Bayer Healthcare Llc Fluid injector with syringe engagement mechanism
CA3075481A1 (en) 2017-09-13 2019-03-21 Bayer Healthcare Llc Sliding syringe cap for separate filling and delivery
CN112912119A (zh) 2018-09-11 2021-06-04 拜耳医药保健有限责任公司 流体注入器系统的注射器固定特征
WO2021050507A1 (en) 2019-09-10 2021-03-18 Bayer Healthcare Llc Pressure jackets and syringe retention features for angiography fluid injectors
CR20220394A (es) 2020-02-21 2023-01-23 Bayer Healthcare Llc Conectores para vía de fluido para suministro de fluidos médicos
RS66407B1 (sr) 2020-02-28 2025-02-28 Bayer Healthcare Llc Komplet za mešanje tečnosti
US12427247B2 (en) 2020-03-16 2025-09-30 Bayer Healthcare Llc Stopcock apparatus for angiography injector fluid paths
CN115697435A (zh) 2020-06-18 2023-02-03 拜耳医药保健有限责任公司 用于血管造影注入器流体路径的在线气泡悬浮装置
CR20230084A (es) 2020-08-11 2023-03-23 Bayer Healthcare Llc Características para jeringa de angiografía
JP7695360B2 (ja) 2020-12-01 2025-06-18 バイエル・ヘルスケア・エルエルシー 流体注入器システム用の流体経路構成要素の保持のためのカセット
AU2022295668A1 (en) 2021-06-17 2023-11-30 Bayer Healthcare Llc System and method for detecting fluid type in tubing for fluid injector apparatus

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US6339505B1 (en) * 2000-06-26 2002-01-15 International Business Machines Corporation Method for radiation projection and lens assembly for semiconductor exposure tools
EP1330679A4 (en) * 2000-10-03 2006-09-06 Corning Inc PHOTOLITHOGRAPHIC PROCESSES AND SYSTEMS
US7190527B2 (en) * 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
KR20040104691A (ko) * 2002-05-03 2004-12-10 칼 짜이스 에스엠테 아게 높은 개구를 갖는 투영 대물렌즈
JP4174400B2 (ja) * 2003-09-24 2008-10-29 信越石英株式会社 シリカガラスの選別方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
CN1910494B (zh) 2004-01-14 2011-08-10 卡尔蔡司Smt有限责任公司 反射折射投影物镜
TWI395069B (zh) 2004-02-18 2013-05-01 尼康股份有限公司 投影光學系統、曝光裝置以及曝光方法
JP2006073687A (ja) 2004-09-01 2006-03-16 Nikon Corp 投影光学系、投影光学系の製造方法、露光装置、および露光方法
US20080123074A1 (en) 2004-11-10 2008-05-29 Nikon Corporation Projection Optical System, Exposure Equipment and Exposure Method
JP4868209B2 (ja) 2004-11-10 2012-02-01 株式会社ニコン 投影光学系、露光装置、および露光方法
DE102006027787A1 (de) * 2005-07-05 2007-01-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage und Betriebsmethode dieser
JP2008063181A (ja) 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法

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