JP2010541292A5 - - Google Patents

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Publication number
JP2010541292A5
JP2010541292A5 JP2010528290A JP2010528290A JP2010541292A5 JP 2010541292 A5 JP2010541292 A5 JP 2010541292A5 JP 2010528290 A JP2010528290 A JP 2010528290A JP 2010528290 A JP2010528290 A JP 2010528290A JP 2010541292 A5 JP2010541292 A5 JP 2010541292A5
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JP
Japan
Prior art keywords
correction
light
plane
projection
intensity distribution
Prior art date
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Application number
JP2010528290A
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English (en)
Japanese (ja)
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JP5487110B2 (ja
JP2010541292A (ja
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Publication date
Priority claimed from EP07019674A external-priority patent/EP2048540A1/en
Application filed filed Critical
Publication of JP2010541292A publication Critical patent/JP2010541292A/ja
Publication of JP2010541292A5 publication Critical patent/JP2010541292A5/ja
Application granted granted Critical
Publication of JP5487110B2 publication Critical patent/JP5487110B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010528290A 2007-10-09 2008-09-29 マイクロリソグラフィ投影露光装置 Expired - Fee Related JP5487110B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07019674.6 2007-10-09
EP07019674A EP2048540A1 (en) 2007-10-09 2007-10-09 Microlithographic projection exposure apparatus
PCT/EP2008/008251 WO2009046895A1 (en) 2007-10-09 2008-09-29 Microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2010541292A JP2010541292A (ja) 2010-12-24
JP2010541292A5 true JP2010541292A5 (OSRAM) 2011-10-20
JP5487110B2 JP5487110B2 (ja) 2014-05-07

Family

ID=38988122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010528290A Expired - Fee Related JP5487110B2 (ja) 2007-10-09 2008-09-29 マイクロリソグラフィ投影露光装置

Country Status (7)

Country Link
US (1) US8773638B2 (OSRAM)
EP (2) EP2048540A1 (OSRAM)
JP (1) JP5487110B2 (OSRAM)
KR (1) KR101443421B1 (OSRAM)
CN (1) CN101821678B (OSRAM)
TW (1) TWI459160B (OSRAM)
WO (1) WO2009046895A1 (OSRAM)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010040811A1 (de) * 2010-09-15 2012-03-15 Carl Zeiss Smt Gmbh Abbildende Optik
DE102010041298A1 (de) 2010-09-24 2012-03-29 Carl Zeiss Smt Gmbh EUV-Mikrolithographie-Projektionsbelichtungsanlage mit einer Heizlichtquelle
WO2012062501A1 (en) 2010-11-12 2012-05-18 Asml Netherlands B.V. Metrology method and apparatus, and device manufacturing method
JP5661194B2 (ja) 2010-11-12 2015-01-28 エーエスエムエル ネザーランズ ビー．ブイ． メトロロジ方法及び装置、リソグラフィシステム並びにデバイス製造方法
DE102010062763A1 (de) 2010-12-09 2012-06-14 Carl Zeiss Smt Gmbh Verfahren zum Vermessen eines optischen Systems
NL2008335A (en) * 2011-04-07 2012-10-09 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and method of correcting a mask.
NL2009079A (en) * 2011-08-23 2013-02-27 Asml Netherlands Bv Metrology method and apparatus, and device manufacturing method.
WO2013044936A1 (en) 2011-09-29 2013-04-04 Carl Zeiss Smt Gmbh Projection objective of a microlithographic projection exposure apparatus
CN102411264B (zh) * 2011-11-22 2014-07-16 上海华力微电子有限公司 光刻机投影物镜温度均衡装置及均衡方法
DE102012205096B3 (de) * 2012-03-29 2013-08-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
DE102014218474A1 (de) * 2014-09-15 2016-03-17 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren für die EUV-Mikrolithographie
CN105068381A (zh) * 2015-07-27 2015-11-18 江苏影速光电技术有限公司 一种曝光机光阑承载结构及曝光机光阑更换方法
DE102016205619A1 (de) 2016-04-05 2017-10-05 Carl Zeiss Smt Gmbh Abschwächungsfilter für Projektionsobjektiv, Projektionsobjektiv mit Abschwächungsfilter für Projektionsbelichtungsanlage und Projektionsbelichtungsanlage mit Projektionsobjektiv
DE102016225701A1 (de) 2016-12-21 2017-03-02 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer EUV-Lithographieanlage
TWI627440B (zh) * 2017-05-17 2018-06-21 力晶科技股份有限公司 影像亮度重配模組及影像亮度重配方法
DE102019208232A1 (de) * 2019-06-05 2020-12-10 Carl Zeiss Microscopy Gmbh Optische Anordnung und Verfahren zur Korrektur von Zentrierfehlern und/oder Winkelfehlern
CN112711163A (zh) 2019-10-25 2021-04-27 台达电子工业股份有限公司 投影装置
TWI709810B (zh) * 2019-10-25 2020-11-11 台達電子工業股份有限公司 投影裝置
DE102021210243A1 (de) 2021-09-16 2023-03-16 Carl Zeiss Smt Gmbh Optische Anordnung für die DUV-Lithographie

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US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
WO1991017483A1 (de) 1990-05-02 1991-11-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Belichtungsvorrichtung
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JP3368091B2 (ja) * 1994-04-22 2003-01-20 キヤノン株式会社 投影露光装置及びデバイスの製造方法
JPH09329742A (ja) * 1996-06-10 1997-12-22 Nikon Corp 光学系の収差補正方法および収差補正光学系を備えた投影露光装置
EP0823662A2 (en) * 1996-08-07 1998-02-11 Nikon Corporation Projection exposure apparatus
JP3790833B2 (ja) * 1996-08-07 2006-06-28 株式会社ニコン 投影露光方法及び装置
JP3646757B2 (ja) * 1996-08-22 2005-05-11 株式会社ニコン 投影露光方法及び装置
JP2000019165A (ja) 1998-06-30 2000-01-21 Shimadzu Corp ガスクロマトグラフ装置
KR100584538B1 (ko) * 1999-11-04 2006-05-30 삼성전자주식회사 마이크로미러 가동장치를 채용한 반사형 프로젝터
DE19963588C2 (de) * 1999-12-29 2002-01-10 Zeiss Carl Optische Anordnung
DE19963587B4 (de) 1999-12-29 2007-10-04 Carl Zeiss Smt Ag Projektions-Belichtungsanlage
DE10000191B8 (de) 2000-01-05 2005-10-06 Carl Zeiss Smt Ag Projektbelichtungsanlage der Mikrolithographie
TW519574B (en) * 2000-10-20 2003-02-01 Nikon Corp Multilayer mirror and method for making the same, and EUV optical system comprising the same, and EUV microlithography system comprising the same
DE10140208C2 (de) 2001-08-16 2003-11-06 Zeiss Carl Optische Anordnung
WO2003065427A1 (en) * 2002-01-29 2003-08-07 Nikon Corporation Exposure device and exposure method
TW594431B (en) * 2002-03-01 2004-06-21 Asml Netherlands Bv Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
WO2003075096A2 (de) 2002-03-01 2003-09-12 Carl Zeiss Smt Ag Refraktives projektionsobjektiv
US20030235682A1 (en) * 2002-06-21 2003-12-25 Sogard Michael R. Method and device for controlling thermal distortion in elements of a lithography system
WO2004019128A2 (en) 2002-08-23 2004-03-04 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
WO2005022614A1 (ja) * 2003-08-28 2005-03-10 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
CN102207608B (zh) 2004-01-14 2013-01-02 卡尔蔡司Smt有限责任公司 反射折射投影物镜
WO2007017089A1 (en) 2005-07-25 2007-02-15 Carl Zeiss Smt Ag Projection objective of a microlithographic projection exposure apparatus

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