JP2010078482A5 - - Google Patents
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- Publication number
- JP2010078482A5 JP2010078482A5 JP2008247800A JP2008247800A JP2010078482A5 JP 2010078482 A5 JP2010078482 A5 JP 2010078482A5 JP 2008247800 A JP2008247800 A JP 2008247800A JP 2008247800 A JP2008247800 A JP 2008247800A JP 2010078482 A5 JP2010078482 A5 JP 2010078482A5
- Authority
- JP
- Japan
- Prior art keywords
- mass spectrometry
- substrate
- reflector
- spectrometry according
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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- 238000004949 mass spectrometry Methods 0.000 claims 26
- 239000000758 substrate Substances 0.000 claims 22
- 239000010410 layer Substances 0.000 claims 10
- 239000002184 metal Substances 0.000 claims 10
- 239000000523 sample Substances 0.000 claims 10
- 238000000926 separation method Methods 0.000 claims 10
- 239000000126 substance Substances 0.000 claims 7
- 239000012491 analyte Substances 0.000 claims 4
- 239000002923 metal particle Substances 0.000 claims 4
- 230000004048 modification Effects 0.000 claims 3
- 238000012986 modification Methods 0.000 claims 3
- 229910001111 Fine metal Inorganic materials 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 238000003795 desorption Methods 0.000 claims 2
- 230000001939 inductive effect Effects 0.000 claims 2
- 230000003993 interaction Effects 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000002052 molecular layer Substances 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 239000012488 sample solution Substances 0.000 claims 2
- 239000002094 self assembled monolayer Substances 0.000 claims 2
- 239000013545 self-assembled monolayer Substances 0.000 claims 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000011148 porous material Substances 0.000 claims 1
- 150000003573 thiols Chemical class 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008247800A JP2010078482A (ja) | 2008-09-26 | 2008-09-26 | 質量分析用基板および質量分析方法 |
| US12/568,197 US8008620B2 (en) | 2008-09-26 | 2009-09-28 | Substrate for mass spectrometry and mass spectrometry method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008247800A JP2010078482A (ja) | 2008-09-26 | 2008-09-26 | 質量分析用基板および質量分析方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010078482A JP2010078482A (ja) | 2010-04-08 |
| JP2010078482A5 true JP2010078482A5 (https=) | 2011-03-17 |
Family
ID=42056363
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008247800A Abandoned JP2010078482A (ja) | 2008-09-26 | 2008-09-26 | 質量分析用基板および質量分析方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8008620B2 (https=) |
| JP (1) | JP2010078482A (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7888127B2 (en) | 2008-01-15 | 2011-02-15 | Sequenom, Inc. | Methods for reducing adduct formation for mass spectrometry analysis |
| TWI456195B (zh) * | 2011-01-27 | 2014-10-11 | Univ Nat Cheng Kung | 生醫及微奈米結構物質感測晶片及其製備方法 |
| US9391236B2 (en) * | 2011-08-31 | 2016-07-12 | Asahi Kasei E-Materials Corporation | Substrate for optics having a plurality of dot lines, semiconductor light emitting device. and exposure apparatus |
| JP6429318B2 (ja) * | 2012-08-17 | 2018-11-28 | 国立研究開発法人科学技術振興機構 | ラマン分光法を用いた生体分子の解析方法及び装置 |
| JP2014153183A (ja) * | 2013-02-08 | 2014-08-25 | Nitto Denko Corp | 表面支援レーザー脱離イオン化飛行時間型質量分析装置用イオン化支援部材 |
| US9305756B2 (en) * | 2013-03-13 | 2016-04-05 | Agena Bioscience, Inc. | Preparation enhancements and methods of use for MALDI mass spectrometry |
| JP6201369B2 (ja) | 2013-03-28 | 2017-09-27 | セイコーエプソン株式会社 | 検出装置及び電子機器 |
| KR20150107941A (ko) * | 2014-03-13 | 2015-09-24 | 삼성전자주식회사 | 전기광학 모듈레이터 및 이를 포함하는 tft 어레이 검사 장치 |
| CN110931344B (zh) * | 2019-12-09 | 2022-06-03 | 广东省半导体产业技术研究院 | 一种用于质谱检测的介电型样品靶片及其制作方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998010289A1 (en) * | 1996-09-04 | 1998-03-12 | The Penn State Research Foundation | Self-assembled metal colloid monolayers |
| JP4536866B2 (ja) | 1999-04-27 | 2010-09-01 | キヤノン株式会社 | ナノ構造体及びその製造方法 |
| JP3387897B2 (ja) | 1999-08-30 | 2003-03-17 | キヤノン株式会社 | 構造体の製造方法、並びに該製造方法により製造される構造体及び該構造体を用いた構造体デバイス |
| US7517496B2 (en) * | 2001-07-17 | 2009-04-14 | Bio-Rad Laboratories, Inc. | Latex based adsorbent chip |
| JPWO2004051231A1 (ja) * | 2002-11-29 | 2006-04-06 | 日本電気株式会社 | 分離装置および分離方法 |
| JP4074921B2 (ja) * | 2003-03-14 | 2008-04-16 | 日本電気株式会社 | 質量分析システムおよび分析方法 |
| JP2007024870A (ja) * | 2005-06-14 | 2007-02-01 | Fujifilm Holdings Corp | センサ、センシング装置、及びセンシング方法 |
| WO2007046162A1 (ja) * | 2005-10-20 | 2007-04-26 | Japan Science And Technology Agency | 質量分析法に用いられる試料ターゲットおよびその製造方法、並びに当該試料ターゲットを用いた質量分析装置 |
| JP2007171003A (ja) | 2005-12-22 | 2007-07-05 | Fujifilm Corp | 質量分析用基板並びに分析方法および装置 |
| JP2008025989A (ja) * | 2006-07-15 | 2008-02-07 | Keio Gijuku | 局在表面プラズモン共鳴法と質量分析法によるリガンドの分析方法及びそのためのセンサー素子 |
| JP2008026109A (ja) | 2006-07-20 | 2008-02-07 | Fujifilm Corp | 微細構造体及びその製造方法、センサデバイス及びラマン分光用デバイス |
| JP4911704B2 (ja) * | 2007-02-16 | 2012-04-04 | 学校法人 関西大学 | Ｌｄｉプレート製造方法 |
-
2008
- 2008-09-26 JP JP2008247800A patent/JP2010078482A/ja not_active Abandoned
-
2009
- 2009-09-28 US US12/568,197 patent/US8008620B2/en active Active
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