JP2010056113A5 - - Google Patents
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- Publication number
- JP2010056113A5 JP2010056113A5 JP2008216343A JP2008216343A JP2010056113A5 JP 2010056113 A5 JP2010056113 A5 JP 2010056113A5 JP 2008216343 A JP2008216343 A JP 2008216343A JP 2008216343 A JP2008216343 A JP 2008216343A JP 2010056113 A5 JP2010056113 A5 JP 2010056113A5
- Authority
- JP
- Japan
- Prior art keywords
- conductive sheet
- pressing member
- cleaning
- processing apparatus
- adhesive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims 16
- 239000000853 adhesive Substances 0.000 claims 13
- 230000001070 adhesive effect Effects 0.000 claims 13
- 239000000758 substrate Substances 0.000 claims 3
- 239000013013 elastic material Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008216343A JP5038259B2 (ja) | 2008-08-26 | 2008-08-26 | クリーニング装置およびクリーニング方法 |
| TW097136668A TWI409110B (zh) | 2008-08-26 | 2008-09-24 | Cleanliness and clean method |
| KR1020080095364A KR101071368B1 (ko) | 2008-08-26 | 2008-09-29 | 클리닝장치 및 클리닝방법 |
| US12/285,177 US8006340B2 (en) | 2008-08-26 | 2008-09-30 | Cleaning apparatus |
| US12/849,255 US8024831B2 (en) | 2008-08-26 | 2010-08-03 | Cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008216343A JP5038259B2 (ja) | 2008-08-26 | 2008-08-26 | クリーニング装置およびクリーニング方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010056113A JP2010056113A (ja) | 2010-03-11 |
| JP2010056113A5 true JP2010056113A5 (cg-RX-API-DMAC7.html) | 2011-08-04 |
| JP5038259B2 JP5038259B2 (ja) | 2012-10-03 |
Family
ID=41723171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008216343A Expired - Fee Related JP5038259B2 (ja) | 2008-08-26 | 2008-08-26 | クリーニング装置およびクリーニング方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US8006340B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5038259B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101071368B1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI409110B (cg-RX-API-DMAC7.html) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9289520B2 (en) | 2014-02-27 | 2016-03-22 | Kimberly-Clark Worldwide, Inc. | Method and system to clean microorganisms without chemicals |
| DE102014109349A1 (de) * | 2014-07-04 | 2016-01-21 | Aixtron Se | Vorrichtung zum Reinigen einer Gasaustrittsfläche eines Gaseinlassorgans eines CVD-Reaktors |
| JP6812264B2 (ja) * | 2017-02-16 | 2021-01-13 | 東京エレクトロン株式会社 | 真空処理装置、及びメンテナンス装置 |
| WO2019219163A1 (en) * | 2018-05-14 | 2019-11-21 | Applied Materials, Inc. | Cleaning device for attracting particles in a substrate processing system, processing system for processing a substrate, and method of operation of a cleaning device |
| CN111938521B (zh) * | 2018-07-25 | 2021-07-30 | 南京溧水高新产业股权投资有限公司 | 一种用于瓷砖地板的贴纸用水清除机构及使用方法 |
| US12080528B2 (en) * | 2019-11-01 | 2024-09-03 | Lam Research Corporation | Systems and methods for cleaning a showerhead |
| CN111822420B (zh) * | 2020-07-15 | 2022-06-24 | 郑州龙华机电工程有限公司 | 一种基于物联网的电力设备检修系统 |
| CN114308907B (zh) * | 2022-02-23 | 2023-11-28 | 深圳市震华等离子体智造有限公司 | 一种用于精密分析仪器的等离子清洗装置 |
| JP1783959S (ja) | 2023-11-01 | 2024-11-07 | ウェブ搬送用ガイド部材 |
Family Cites Families (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3201904A (en) * | 1961-11-09 | 1965-08-24 | Corning Glass Works | Apparatus for finishing glass surfaces |
| US3654654A (en) * | 1969-11-14 | 1972-04-11 | Xerox Corp | Cleaning apparatus |
| US4313284A (en) * | 1980-03-27 | 1982-02-02 | Monsanto Company | Apparatus for improving flatness of polished wafers |
| JP3313505B2 (ja) * | 1994-04-14 | 2002-08-12 | 株式会社日立製作所 | 研磨加工法 |
| US5671476A (en) * | 1995-02-02 | 1997-09-23 | Mita Industrial Co., Ltd. | Image forming machine with cleaning drum brush driven by rotating drum |
| US5908530A (en) * | 1995-05-18 | 1999-06-01 | Obsidian, Inc. | Apparatus for chemical mechanical polishing |
| JP3561070B2 (ja) * | 1996-02-01 | 2004-09-02 | 彰 水野 | 除塵方法及び除塵シ−ト |
| JPH10147037A (ja) | 1996-11-15 | 1998-06-02 | Ricoh Co Ltd | クリーニングシート |
| JP4427826B2 (ja) * | 1997-01-24 | 2010-03-10 | 日東電工株式会社 | 除塵方法 |
| US6769969B1 (en) * | 1997-03-06 | 2004-08-03 | Keltech Engineering, Inc. | Raised island abrasive, method of use and lapping apparatus |
| US6149506A (en) * | 1998-10-07 | 2000-11-21 | Keltech Engineering | Lapping apparatus and method for high speed lapping with a rotatable abrasive platen |
| JPH10321604A (ja) * | 1997-05-22 | 1998-12-04 | Nec Kyushu Ltd | プラズマ処理装置 |
| US5931719A (en) * | 1997-08-25 | 1999-08-03 | Lsi Logic Corporation | Method and apparatus for using pressure differentials through a polishing pad to improve performance in chemical mechanical polishing |
| JP2000021832A (ja) | 1998-07-03 | 2000-01-21 | Asahi Sunac Corp | ワーク洗浄方法及び装置 |
| US6439967B2 (en) * | 1998-09-01 | 2002-08-27 | Micron Technology, Inc. | Microelectronic substrate assembly planarizing machines and methods of mechanical and chemical-mechanical planarization of microelectronic substrate assemblies |
| US6227955B1 (en) * | 1999-04-20 | 2001-05-08 | Micron Technology, Inc. | Carrier heads, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies |
| JP4718667B2 (ja) * | 1999-11-09 | 2011-07-06 | 日東電工株式会社 | クリーニングシ―ト |
| US6979248B2 (en) * | 2002-05-07 | 2005-12-27 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
| US20040020789A1 (en) * | 2000-02-17 | 2004-02-05 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
| US6991526B2 (en) * | 2002-09-16 | 2006-01-31 | Applied Materials, Inc. | Control of removal profile in electrochemically assisted CMP |
| US7066800B2 (en) * | 2000-02-17 | 2006-06-27 | Applied Materials Inc. | Conductive polishing article for electrochemical mechanical polishing |
| US6962524B2 (en) * | 2000-02-17 | 2005-11-08 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
| US6991528B2 (en) * | 2000-02-17 | 2006-01-31 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
| US6848970B2 (en) * | 2002-09-16 | 2005-02-01 | Applied Materials, Inc. | Process control in electrochemically assisted planarization |
| US7141146B2 (en) * | 2000-02-23 | 2006-11-28 | Asm Nutool, Inc. | Means to improve center to edge uniformity of electrochemical mechanical processing of workpiece surface |
| US6581276B2 (en) * | 2000-04-04 | 2003-06-24 | Amerasia International Technology, Inc. | Fine-pitch flexible connector, and method for making same |
| EP2266717A2 (en) | 2000-06-06 | 2010-12-29 | Nitto Denko Corporation | Cleaning member |
| JP2002192084A (ja) | 2000-12-27 | 2002-07-10 | Nitto Denko Corp | クリーニングシ―ト、及びこれを用いた基板処理装置のクリーニング方法 |
| US7520800B2 (en) * | 2003-04-16 | 2009-04-21 | Duescher Wayne O | Raised island abrasive, lapping apparatus and method of use |
| EP1335814A1 (en) * | 2000-11-21 | 2003-08-20 | Memc Electronic Materials S.P.A. | Semiconductor wafer, polishing apparatus and method |
| US20040192172A1 (en) * | 2001-06-14 | 2004-09-30 | Dan Towery | Oxidizing polishing slurries for low dielectric constant materials |
| US6776693B2 (en) * | 2001-12-19 | 2004-08-17 | Applied Materials Inc. | Method and apparatus for face-up substrate polishing |
| JP2004082038A (ja) | 2002-08-28 | 2004-03-18 | Seiko Epson Corp | 超音波洗浄方法、超音波洗浄装置および、超音波洗浄ノズルのノズル部の製造方法 |
| US7289759B2 (en) * | 2004-08-27 | 2007-10-30 | Canon Kabushiki Kaisha | Cleaning apparatus |
| US7772295B2 (en) * | 2005-02-04 | 2010-08-10 | Denki Kagaku Kogyo Kabushiki Kaisha | Resin compositions, cured article obtained therefrom, and sheet |
| JP2007019443A (ja) * | 2005-07-06 | 2007-01-25 | Creative Technology:Kk | 導電性ウエハ |
| TWI420579B (zh) * | 2005-07-12 | 2013-12-21 | Creative Tech Corp | And a foreign matter removing method for a substrate |
| JP4817293B2 (ja) | 2005-10-26 | 2011-11-16 | 旭サナック株式会社 | ワーク洗浄方法及びワーク洗浄システム |
| JP2007277631A (ja) * | 2006-04-06 | 2007-10-25 | Konica Minolta Holdings Inc | ガスバリア性薄膜積層体の製造方法、ガスバリア性薄膜積層体、ガスバリア性樹脂基材及び有機エレクトロルミネッセンスデバイス |
| US7880371B2 (en) * | 2006-11-03 | 2011-02-01 | Danfoss A/S | Dielectric composite and a method of manufacturing a dielectric composite |
| JP2008141049A (ja) | 2006-12-04 | 2008-06-19 | Sharp Corp | 洗浄装置および洗浄方法 |
| JP2008172038A (ja) * | 2007-01-12 | 2008-07-24 | Hitachi High-Technologies Corp | プラズマ処理装置およびプラズマ処理方法 |
| US20080176018A1 (en) * | 2007-01-20 | 2008-07-24 | Enniss James P | Film having an electrically conductive coating |
-
2008
- 2008-08-26 JP JP2008216343A patent/JP5038259B2/ja not_active Expired - Fee Related
- 2008-09-24 TW TW097136668A patent/TWI409110B/zh active
- 2008-09-29 KR KR1020080095364A patent/KR101071368B1/ko active Active
- 2008-09-30 US US12/285,177 patent/US8006340B2/en active Active
-
2010
- 2010-08-03 US US12/849,255 patent/US8024831B2/en active Active
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