JP2010034441A5 - - Google Patents

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Publication number
JP2010034441A5
JP2010034441A5 JP2008197412A JP2008197412A JP2010034441A5 JP 2010034441 A5 JP2010034441 A5 JP 2010034441A5 JP 2008197412 A JP2008197412 A JP 2008197412A JP 2008197412 A JP2008197412 A JP 2008197412A JP 2010034441 A5 JP2010034441 A5 JP 2010034441A5
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JP
Japan
Prior art keywords
base
wafer
pure water
cleaning
ejected
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JP2008197412A
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English (en)
Japanese (ja)
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JP5292974B2 (ja
JP2010034441A (ja
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Priority to JP2008197412A priority Critical patent/JP5292974B2/ja
Priority claimed from JP2008197412A external-priority patent/JP5292974B2/ja
Publication of JP2010034441A publication Critical patent/JP2010034441A/ja
Publication of JP2010034441A5 publication Critical patent/JP2010034441A5/ja
Application granted granted Critical
Publication of JP5292974B2 publication Critical patent/JP5292974B2/ja
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JP2008197412A 2008-07-31 2008-07-31 ウェーハの洗浄装置及びその方法 Active JP5292974B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008197412A JP5292974B2 (ja) 2008-07-31 2008-07-31 ウェーハの洗浄装置及びその方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008197412A JP5292974B2 (ja) 2008-07-31 2008-07-31 ウェーハの洗浄装置及びその方法

Publications (3)

Publication Number Publication Date
JP2010034441A JP2010034441A (ja) 2010-02-12
JP2010034441A5 true JP2010034441A5 (enrdf_load_stackoverflow) 2011-09-15
JP5292974B2 JP5292974B2 (ja) 2013-09-18

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ID=41738545

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008197412A Active JP5292974B2 (ja) 2008-07-31 2008-07-31 ウェーハの洗浄装置及びその方法

Country Status (1)

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JP (1) JP5292974B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5818751B2 (ja) * 2012-07-18 2015-11-18 三菱電機株式会社 太陽電池製造装置およびこれを用いた太陽電池の製造方法
KR101399836B1 (ko) * 2012-12-24 2014-06-27 주식회사 케이씨텍 화학 기계적 연마 공정이 행해진 웨이퍼의 웨팅 장치 및 방법
CN104319252A (zh) * 2014-11-03 2015-01-28 苏州同冠微电子有限公司 单片硅片清洗机台
CN117066242B (zh) * 2023-10-13 2024-02-02 济南晶博电子有限公司 一种硅片清洗装置及其使用方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10223593A (ja) * 1997-02-07 1998-08-21 Sumiere S Ii Z Kk 枚葉式ウェハ洗浄装置
JPH11265846A (ja) * 1998-03-17 1999-09-28 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2003017452A (ja) * 2001-07-02 2003-01-17 Ebara Corp 基板処理方法及び基板処理装置

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