JP2009545652A5 - - Google Patents
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- Publication number
- JP2009545652A5 JP2009545652A5 JP2009522887A JP2009522887A JP2009545652A5 JP 2009545652 A5 JP2009545652 A5 JP 2009545652A5 JP 2009522887 A JP2009522887 A JP 2009522887A JP 2009522887 A JP2009522887 A JP 2009522887A JP 2009545652 A5 JP2009545652 A5 JP 2009545652A5
- Authority
- JP
- Japan
- Prior art keywords
- coating
- oxysilane
- substrate
- refractive index
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 claims description 41
- 239000002245 particle Substances 0.000 claims description 28
- 239000007787 solid Substances 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 26
- 239000011248 coating agent Substances 0.000 claims description 22
- 238000000576 coating method Methods 0.000 claims description 22
- -1 acryloyloxy Chemical group 0.000 claims description 21
- 239000006117 anti-reflective coating Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- 239000003431 cross linking reagent Substances 0.000 claims description 15
- 229920001973 fluoroelastomer Polymers 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 11
- 239000007870 radical polymerization initiator Substances 0.000 claims description 11
- 125000000524 functional group Chemical group 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 8
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 6
- 239000007795 chemical reaction product Substances 0.000 claims description 5
- 150000004819 silanols Chemical class 0.000 claims description 4
- 239000010408 film Substances 0.000 claims description 3
- 230000007062 hydrolysis Effects 0.000 claims description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 239000012788 optical film Substances 0.000 claims description 3
- 230000003667 anti-reflective effect Effects 0.000 claims description 2
- 239000011253 protective coating Substances 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 150000008378 aryl ethers Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000005702 oxyalkylene group Chemical group 0.000 description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical group FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000746 allylic group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical compound CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83558106P | 2006-08-04 | 2006-08-04 | |
| PCT/US2007/017362 WO2008019078A1 (en) | 2006-08-04 | 2007-08-03 | Low refractive index composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009545652A JP2009545652A (ja) | 2009-12-24 |
| JP2009545652A5 true JP2009545652A5 (cg-RX-API-DMAC7.html) | 2010-09-16 |
Family
ID=38698877
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009522887A Pending JP2009545652A (ja) | 2006-08-04 | 2007-08-03 | 低屈折率組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20080032052A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2009545652A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20090046856A (cg-RX-API-DMAC7.html) |
| CN (1) | CN101501118A (cg-RX-API-DMAC7.html) |
| TW (1) | TW200831588A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2008019078A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2215172B1 (en) * | 2007-11-30 | 2012-11-07 | E. I. du Pont de Nemours and Company | Low refractive index composition, abrasion resistant anti-reflective coating, and method for forming abrasion resistant anti-reflective coating |
| US8092905B2 (en) * | 2008-10-10 | 2012-01-10 | E.I Du Pont De Nemours And Company | Compositions containing multifunctional nanoparticles |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| EP2524252A2 (en) | 2010-01-13 | 2012-11-21 | 3M Innovative Properties Company | Illumination device having viscoelastic lightguide |
| CN103109234A (zh) * | 2010-09-16 | 2013-05-15 | 株式会社Lg化学 | 光敏树脂组合物、干膜阻焊膜以及电路板 |
| CN102634277A (zh) * | 2011-02-14 | 2012-08-15 | 住龙纳米技术材料(深圳)有限公司 | 用于形成低折射率膜的涂料、低折射率膜的制造方法以及低折射率膜 |
| KR20140015443A (ko) | 2011-03-09 | 2014-02-06 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 입자 크기가 큰 건식 실리카를 포함하는 반사 방지 필름 |
| JP6011527B2 (ja) * | 2011-04-26 | 2016-10-19 | 大日本印刷株式会社 | 反射防止フィルム、偏光板及び画像表示装置 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| EP3138875B1 (en) * | 2011-08-04 | 2019-11-20 | 3M Innovative Properties Company | Crosslinked fluorinated polymers with manganese or cerium as additives |
| CN103389530A (zh) * | 2012-08-22 | 2013-11-13 | 宁波东旭成化学有限公司 | 一种反射膜 |
| KR101900538B1 (ko) * | 2015-03-31 | 2018-09-20 | 삼성에스디아이 주식회사 | 투명도전체, 이의 제조방법 및 이를 포함하는 광학표시장치 |
| JP6803842B2 (ja) | 2015-04-13 | 2020-12-23 | ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
| WO2019018352A1 (en) * | 2017-07-20 | 2019-01-24 | 3M Innovative Properties Company | ACTINIC RAY-CURED FLUORINATED ELASTOMERS AND ASSOCIATED METHODS |
| US20200299533A1 (en) * | 2017-12-18 | 2020-09-24 | 3M Innovative Properties Company | Fluorinated elastomers cured by actinic radiation and methods thereof |
| US11873357B2 (en) * | 2018-02-09 | 2024-01-16 | Solvay Specialty Polymers Italy S.P.A. | Fluoroelastomer curable composition |
| EP4038143A2 (en) | 2019-10-03 | 2022-08-10 | 3M Innovative Properties Company | Silicone elastomers by free radical mediated cure |
| EP4055109A1 (en) | 2019-11-04 | 2022-09-14 | 3M Innovative Properties Company | Fluoropolymer compositions comprising a curing agent with ethylenically unsaturated and electron donor groups, and substrates coated therewith |
| CN119661958A (zh) * | 2023-09-21 | 2025-03-21 | 北京小米移动软件有限公司 | 一种组合物、塑胶的制作方法、塑胶、腕带及穿戴式设备 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491508A (en) * | 1981-06-01 | 1985-01-01 | General Electric Company | Method of preparing curable coating composition from alcohol, colloidal silica, silylacrylate and multiacrylate monomer |
| DE4114598A1 (de) * | 1991-05-04 | 1992-11-05 | Bayer Ag | Unvernetzte copolymerisate mit reaktiven doppelbindungen aus fluormonomeren und nicht konjugierten dienen und verfahren zu ihrer herstellung |
| US5739180A (en) * | 1996-05-02 | 1998-04-14 | Lucent Technologies Inc. | Flat panel displays and methods and substrates therefor |
| JP4240716B2 (ja) * | 1999-02-01 | 2009-03-18 | ユニマテック株式会社 | 含フッ素エラストマー組成物 |
| US6238798B1 (en) * | 1999-02-22 | 2001-05-29 | 3M Innovative Properties Company | Ceramer composition and composite comprising free radically curable fluorochemical component |
| US6974845B1 (en) * | 1999-08-31 | 2005-12-13 | Daikin Industries, Ltd. | Polymer composition crosslinkable with ultraviolet |
| KR100711156B1 (ko) * | 2000-08-29 | 2007-04-24 | 다이킨 고교 가부시키가이샤 | 경화성 함불소 중합체, 이것을 이용한 경화성 수지 조성물및 반사 방지막 |
| US6896958B1 (en) * | 2000-11-29 | 2005-05-24 | Nanophase Technologies Corporation | Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles |
| US7351471B2 (en) * | 2000-12-06 | 2008-04-01 | 3M Innovative Properties Company | Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films |
| WO2003027189A1 (fr) * | 2001-09-04 | 2003-04-03 | Dai Nippon Printing Co., Ltd. | Composition de revetement, revetement forme a partir de celle-ci, revetement antireflet, film antireflet et dispositif d'affichage d'image |
| US7371439B2 (en) * | 2002-08-15 | 2008-05-13 | Fujifilm Corporation | Antireflection film, polarizing plate and image display device |
| KR101304381B1 (ko) * | 2003-08-28 | 2013-09-11 | 다이니폰 인사츠 가부시키가이샤 | 반사 방지 적층체의 제조방법 |
| TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板，其製造方法，液晶顯示元件，液晶顯示裝置，及影像顯示裝置 |
| JP2005283872A (ja) * | 2004-03-29 | 2005-10-13 | Fuji Photo Film Co Ltd | 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置 |
| EP1769033A1 (en) * | 2004-06-30 | 2007-04-04 | Dow Corning Corporation | Fluorocarbon elastomer silicone vulcanizates |
| JP4895343B2 (ja) * | 2004-09-22 | 2012-03-14 | 富士フイルム株式会社 | 反射防止フィルム、その製造方法、偏光板、及び画像表示装置 |
| US20060147177A1 (en) * | 2004-12-30 | 2006-07-06 | Naiyong Jing | Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films |
| US7323514B2 (en) * | 2004-12-30 | 2008-01-29 | 3M Innovative Properties Company | Low refractive index fluoropolymer coating compositions for use in antireflective polymer films |
| US7691459B2 (en) * | 2005-03-22 | 2010-04-06 | Fujifilm Corporation | Inorganic fine particle-containing composition, optical film, antireflection film and polarizing film, and polarizing plate and display device using the same |
| US7553543B2 (en) * | 2005-12-16 | 2009-06-30 | E. I. Du Pont De Nemours And Company | Composite structure having a fluoroelastomeric anti-reflective coating with non-fluorinated cross-linking |
-
2007
- 2007-08-01 US US11/888,382 patent/US20080032052A1/en not_active Abandoned
- 2007-08-03 JP JP2009522887A patent/JP2009545652A/ja active Pending
- 2007-08-03 TW TW096128693A patent/TW200831588A/zh unknown
- 2007-08-03 WO PCT/US2007/017362 patent/WO2008019078A1/en not_active Ceased
- 2007-08-03 KR KR1020097003729A patent/KR20090046856A/ko not_active Withdrawn
- 2007-08-03 CN CNA2007800291556A patent/CN101501118A/zh active Pending
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