JP2009545652A5 - - Google Patents
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- Publication number
- JP2009545652A5 JP2009545652A5 JP2009522887A JP2009522887A JP2009545652A5 JP 2009545652 A5 JP2009545652 A5 JP 2009545652A5 JP 2009522887 A JP2009522887 A JP 2009522887A JP 2009522887 A JP2009522887 A JP 2009522887A JP 2009545652 A5 JP2009545652 A5 JP 2009545652A5
- Authority
- JP
- Japan
- Prior art keywords
- coating
- oxysilane
- substrate
- refractive index
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 claims description 41
- 239000002245 particle Substances 0.000 claims description 28
- 239000007787 solid Substances 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 26
- 239000011248 coating agent Substances 0.000 claims description 22
- 238000000576 coating method Methods 0.000 claims description 22
- -1 acryloyloxy Chemical group 0.000 claims description 21
- 239000006117 anti-reflective coating Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- 239000003431 cross linking reagent Substances 0.000 claims description 15
- 229920001973 fluoroelastomer Polymers 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 11
- 239000007870 radical polymerization initiator Substances 0.000 claims description 11
- 125000000524 functional group Chemical group 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 8
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 6
- 239000007795 chemical reaction product Substances 0.000 claims description 5
- 150000004819 silanols Chemical class 0.000 claims description 4
- 239000010408 film Substances 0.000 claims description 3
- 230000007062 hydrolysis Effects 0.000 claims description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 239000012788 optical film Substances 0.000 claims description 3
- 230000003667 anti-reflective effect Effects 0.000 claims description 2
- 239000011253 protective coating Substances 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 150000008378 aryl ethers Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000005702 oxyalkylene group Chemical group 0.000 description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical group FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000746 allylic group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical compound CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83558106P | 2006-08-04 | 2006-08-04 | |
| PCT/US2007/017362 WO2008019078A1 (en) | 2006-08-04 | 2007-08-03 | Low refractive index composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009545652A JP2009545652A (ja) | 2009-12-24 |
| JP2009545652A5 true JP2009545652A5 (OSRAM) | 2010-09-16 |
Family
ID=38698877
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009522887A Pending JP2009545652A (ja) | 2006-08-04 | 2007-08-03 | 低屈折率組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20080032052A1 (OSRAM) |
| JP (1) | JP2009545652A (OSRAM) |
| KR (1) | KR20090046856A (OSRAM) |
| CN (1) | CN101501118A (OSRAM) |
| TW (1) | TW200831588A (OSRAM) |
| WO (1) | WO2008019078A1 (OSRAM) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009073441A1 (en) * | 2007-11-30 | 2009-06-11 | E. I. Du Pont De Nemours And Company | Low refractive index composition, abrasion resistant anti-reflective coating, and method for forming abrasion resistant anti-reflective coating |
| US8092905B2 (en) * | 2008-10-10 | 2012-01-10 | E.I Du Pont De Nemours And Company | Compositions containing multifunctional nanoparticles |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| EP2524252A2 (en) | 2010-01-13 | 2012-11-21 | 3M Innovative Properties Company | Illumination device having viscoelastic lightguide |
| JP2013539072A (ja) * | 2010-09-16 | 2013-10-17 | エルジー・ケム・リミテッド | 感光性樹脂組成物、ドライフィルムソルダーレジスト及び回路基板 |
| CN102634277A (zh) * | 2011-02-14 | 2012-08-15 | 住龙纳米技术材料(深圳)有限公司 | 用于形成低折射率膜的涂料、低折射率膜的制造方法以及低折射率膜 |
| US9310527B2 (en) | 2011-03-09 | 2016-04-12 | 3M Innovative Properties Company | Antireflective film comprising large particle size fumed silica |
| CN103460079B (zh) * | 2011-04-26 | 2016-01-20 | 大日本印刷株式会社 | 防反射膜、偏振片和图像显示装置 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US9711816B2 (en) * | 2011-08-04 | 2017-07-18 | 3M Innovative Properties Company | Low equivalent weight polymers |
| CN103389530A (zh) * | 2012-08-22 | 2013-11-13 | 宁波东旭成化学有限公司 | 一种反射膜 |
| KR101900538B1 (ko) * | 2015-03-31 | 2018-09-20 | 삼성에스디아이 주식회사 | 투명도전체, 이의 제조방법 및 이를 포함하는 광학표시장치 |
| US10544329B2 (en) | 2015-04-13 | 2020-01-28 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
| US11248117B2 (en) | 2017-07-20 | 2022-02-15 | 3M Innovative Properties Company | Fluorinated elastomers cured by actinic radiation and methods thereof |
| WO2019126016A1 (en) * | 2017-12-18 | 2019-06-27 | 3M Innovative Properties Company | Fluorinated elastomers cured by actinic radiation and methods thereof |
| EP3749711A1 (en) * | 2018-02-09 | 2020-12-16 | Solvay Specialty Polymers Italy S.p.A. | Fluoroelastomer curable composition |
| US12234389B2 (en) | 2019-10-03 | 2025-02-25 | 3M Innovative Properties Company | Silicone elastomers by free radical mediated cure |
| CN114630874B (zh) * | 2019-11-04 | 2023-12-05 | 3M创新有限公司 | 包含具有烯键式不饱和基团和电子供体基团的固化剂的含氟聚合物组合物及用其涂覆的基底 |
| CN119661958A (zh) * | 2023-09-21 | 2025-03-21 | 北京小米移动软件有限公司 | 一种组合物、塑胶的制作方法、塑胶、腕带及穿戴式设备 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491508A (en) * | 1981-06-01 | 1985-01-01 | General Electric Company | Method of preparing curable coating composition from alcohol, colloidal silica, silylacrylate and multiacrylate monomer |
| DE4114598A1 (de) * | 1991-05-04 | 1992-11-05 | Bayer Ag | Unvernetzte copolymerisate mit reaktiven doppelbindungen aus fluormonomeren und nicht konjugierten dienen und verfahren zu ihrer herstellung |
| US5739180A (en) * | 1996-05-02 | 1998-04-14 | Lucent Technologies Inc. | Flat panel displays and methods and substrates therefor |
| JP4240716B2 (ja) * | 1999-02-01 | 2009-03-18 | ユニマテック株式会社 | 含フッ素エラストマー組成物 |
| US6238798B1 (en) * | 1999-02-22 | 2001-05-29 | 3M Innovative Properties Company | Ceramer composition and composite comprising free radically curable fluorochemical component |
| WO2001016234A1 (en) * | 1999-08-31 | 2001-03-08 | Daikin Industries, Ltd. | Polymer composition crosslinkable with ultraviolet |
| US20040019176A1 (en) * | 2000-08-29 | 2004-01-29 | Takayuki Araki | Curable fluoropolymer, curable resin composition containing the same, and antireflection film |
| US6896958B1 (en) * | 2000-11-29 | 2005-05-24 | Nanophase Technologies Corporation | Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles |
| US7351471B2 (en) * | 2000-12-06 | 2008-04-01 | 3M Innovative Properties Company | Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films |
| WO2003027189A1 (fr) * | 2001-09-04 | 2003-04-03 | Dai Nippon Printing Co., Ltd. | Composition de revetement, revetement forme a partir de celle-ci, revetement antireflet, film antireflet et dispositif d'affichage d'image |
| EP2219051A1 (en) * | 2002-08-15 | 2010-08-18 | Fujifilm Corporation | Antireflection film, polarizing plate and image display device |
| KR101304381B1 (ko) * | 2003-08-28 | 2013-09-11 | 다이니폰 인사츠 가부시키가이샤 | 반사 방지 적층체의 제조방법 |
| TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板，其製造方法，液晶顯示元件，液晶顯示裝置，及影像顯示裝置 |
| JP2005283872A (ja) * | 2004-03-29 | 2005-10-13 | Fuji Photo Film Co Ltd | 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置 |
| WO2006007243A1 (en) * | 2004-06-30 | 2006-01-19 | Dow Corning Corporation | Fluorocarbon elastomer silicone vulcanizates |
| JP4895343B2 (ja) * | 2004-09-22 | 2012-03-14 | 富士フイルム株式会社 | 反射防止フィルム、その製造方法、偏光板、及び画像表示装置 |
| US7323514B2 (en) * | 2004-12-30 | 2008-01-29 | 3M Innovative Properties Company | Low refractive index fluoropolymer coating compositions for use in antireflective polymer films |
| US20060147177A1 (en) * | 2004-12-30 | 2006-07-06 | Naiyong Jing | Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films |
| US7691459B2 (en) * | 2005-03-22 | 2010-04-06 | Fujifilm Corporation | Inorganic fine particle-containing composition, optical film, antireflection film and polarizing film, and polarizing plate and display device using the same |
| US7553543B2 (en) * | 2005-12-16 | 2009-06-30 | E. I. Du Pont De Nemours And Company | Composite structure having a fluoroelastomeric anti-reflective coating with non-fluorinated cross-linking |
-
2007
- 2007-08-01 US US11/888,382 patent/US20080032052A1/en not_active Abandoned
- 2007-08-03 JP JP2009522887A patent/JP2009545652A/ja active Pending
- 2007-08-03 CN CNA2007800291556A patent/CN101501118A/zh active Pending
- 2007-08-03 KR KR1020097003729A patent/KR20090046856A/ko not_active Withdrawn
- 2007-08-03 TW TW096128693A patent/TW200831588A/zh unknown
- 2007-08-03 WO PCT/US2007/017362 patent/WO2008019078A1/en not_active Ceased
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