JP2009540567A5 - - Google Patents
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- Publication number
- JP2009540567A5 JP2009540567A5 JP2009514300A JP2009514300A JP2009540567A5 JP 2009540567 A5 JP2009540567 A5 JP 2009540567A5 JP 2009514300 A JP2009514300 A JP 2009514300A JP 2009514300 A JP2009514300 A JP 2009514300A JP 2009540567 A5 JP2009540567 A5 JP 2009540567A5
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- JP
- Japan
- Prior art keywords
- path
- mixer
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- inversion
- mirrors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 4
- 230000003321 amplification Effects 0.000 claims 1
- 238000003199 nucleic acid amplification method Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/447,380 US7433372B2 (en) | 2006-06-05 | 2006-06-05 | Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications |
| PCT/US2007/012389 WO2007145791A2 (en) | 2006-06-05 | 2007-05-22 | Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009540567A JP2009540567A (ja) | 2009-11-19 |
| JP2009540567A5 true JP2009540567A5 (enExample) | 2010-07-08 |
Family
ID=38789765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009514300A Pending JP2009540567A (ja) | 2006-06-05 | 2007-05-22 | 高エネルギー・パルスレーザ用途のためのビーム形状及び対称性を安定化させるための装置及び方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7433372B2 (enExample) |
| EP (1) | EP2036168B1 (enExample) |
| JP (1) | JP2009540567A (enExample) |
| KR (1) | KR101389722B1 (enExample) |
| TW (1) | TWI344014B (enExample) |
| WO (1) | WO2007145791A2 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7564888B2 (en) * | 2004-05-18 | 2009-07-21 | Cymer, Inc. | High power excimer laser with a pulse stretcher |
| US7630424B2 (en) * | 2005-11-01 | 2009-12-08 | Cymer, Inc. | Laser system |
| US7778302B2 (en) * | 2005-11-01 | 2010-08-17 | Cymer, Inc. | Laser system |
| US7920616B2 (en) * | 2005-11-01 | 2011-04-05 | Cymer, Inc. | Laser system |
| US20090296755A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| US7746913B2 (en) | 2005-11-01 | 2010-06-29 | Cymer, Inc. | Laser system |
| US7643529B2 (en) | 2005-11-01 | 2010-01-05 | Cymer, Inc. | Laser system |
| US7999915B2 (en) * | 2005-11-01 | 2011-08-16 | Cymer, Inc. | Laser system |
| US20090296758A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| EP1952493A4 (en) * | 2005-11-01 | 2017-05-10 | Cymer, LLC | Laser system |
| US7885309B2 (en) * | 2005-11-01 | 2011-02-08 | Cymer, Inc. | Laser system |
| US7715459B2 (en) * | 2005-11-01 | 2010-05-11 | Cymer, Inc. | Laser system |
| US8803027B2 (en) * | 2006-06-05 | 2014-08-12 | Cymer, Llc | Device and method to create a low divergence, high power laser beam for material processing applications |
| JP5891504B2 (ja) * | 2011-03-08 | 2016-03-23 | 株式会社Ｊｏｌｅｄ | 薄膜トランジスタアレイ装置の製造方法 |
| KR102369090B1 (ko) | 2015-09-15 | 2022-03-02 | 삼성디스플레이 주식회사 | 레이저 장치 |
| KR102744480B1 (ko) | 2019-04-12 | 2024-12-20 | 삼성디스플레이 주식회사 | 레이저 장치 및 이를 이용한 표시 장치의 제조 방법 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5122239B2 (enExample) * | 1973-08-21 | 1976-07-08 | ||
| JPH01319727A (ja) * | 1988-06-22 | 1989-12-26 | Sony Corp | 光学装置 |
| JPH02166783A (ja) * | 1988-12-21 | 1990-06-27 | Adomon Sci Kk | エキシマレーザーのホモジナイザー |
| JPH0990265A (ja) * | 1995-09-26 | 1997-04-04 | Asahi Optical Co Ltd | 像反転光学系 |
| JPH11283933A (ja) * | 1998-01-29 | 1999-10-15 | Toshiba Corp | レ―ザ照射装置，非単結晶半導体膜の製造方法及び液晶表示装置の製造方法 |
| JPH11312631A (ja) * | 1998-04-27 | 1999-11-09 | Nikon Corp | 照明光学装置および露光装置 |
| JP3437088B2 (ja) * | 1998-06-04 | 2003-08-18 | 住友重機械工業株式会社 | ビーム回転機能付ホモジナイザ装置及びこれを用いたレーザ加工装置 |
| US6693939B2 (en) * | 2001-01-29 | 2004-02-17 | Cymer, Inc. | Laser lithography light source with beam delivery |
| JP2002139697A (ja) * | 2000-11-02 | 2002-05-17 | Mitsubishi Electric Corp | 複数レーザビームを用いたレーザ光学系とレーザアニーリング装置 |
| JP2002174767A (ja) * | 2000-12-08 | 2002-06-21 | Mitsubishi Electric Corp | レーザ処理用のレーザ光学系 |
| US6693930B1 (en) * | 2000-12-12 | 2004-02-17 | Kla-Tencor Technologies Corporation | Peak power and speckle contrast reduction for a single laser pulse |
| US7167499B2 (en) | 2001-04-18 | 2007-01-23 | Tcz Pte. Ltd. | Very high energy, high stability gas discharge laser surface treatment system |
| US7009140B2 (en) | 2001-04-18 | 2006-03-07 | Cymer, Inc. | Laser thin film poly-silicon annealing optical system |
| US6928093B2 (en) * | 2002-05-07 | 2005-08-09 | Cymer, Inc. | Long delay and high TIS pulse stretcher |
| US20050259709A1 (en) | 2002-05-07 | 2005-11-24 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
| US7326948B2 (en) * | 2005-08-15 | 2008-02-05 | Asml Netherlands B.V. | Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method |
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2006
- 2006-06-05 US US11/447,380 patent/US7433372B2/en active Active
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2007
- 2007-05-14 TW TW096117040A patent/TWI344014B/zh active
- 2007-05-22 WO PCT/US2007/012389 patent/WO2007145791A2/en not_active Ceased
- 2007-05-22 JP JP2009514300A patent/JP2009540567A/ja active Pending
- 2007-05-22 EP EP07809174.1A patent/EP2036168B1/en not_active Ceased
- 2007-05-22 KR KR1020087030013A patent/KR101389722B1/ko active Active