TWI344014B - Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications - Google Patents

Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications Download PDF

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Publication number
TWI344014B
TWI344014B TW096117040A TW96117040A TWI344014B TW I344014 B TWI344014 B TW I344014B TW 096117040 A TW096117040 A TW 096117040A TW 96117040 A TW96117040 A TW 96117040A TW I344014 B TWI344014 B TW I344014B
Authority
TW
Taiwan
Prior art keywords
path
mirror
laser
axis
edge
Prior art date
Application number
TW096117040A
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English (en)
Chinese (zh)
Other versions
TW200804869A (en
Inventor
Thomas Hofmann
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of TW200804869A publication Critical patent/TW200804869A/zh
Application granted granted Critical
Publication of TWI344014B publication Critical patent/TWI344014B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0061—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0977—Reflective elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Lasers (AREA)
  • Recrystallisation Techniques (AREA)
TW096117040A 2006-06-05 2007-05-14 Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications TWI344014B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/447,380 US7433372B2 (en) 2006-06-05 2006-06-05 Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications

Publications (2)

Publication Number Publication Date
TW200804869A TW200804869A (en) 2008-01-16
TWI344014B true TWI344014B (en) 2011-06-21

Family

ID=38789765

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096117040A TWI344014B (en) 2006-06-05 2007-05-14 Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications

Country Status (6)

Country Link
US (1) US7433372B2 (enExample)
EP (1) EP2036168B1 (enExample)
JP (1) JP2009540567A (enExample)
KR (1) KR101389722B1 (enExample)
TW (1) TWI344014B (enExample)
WO (1) WO2007145791A2 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7564888B2 (en) * 2004-05-18 2009-07-21 Cymer, Inc. High power excimer laser with a pulse stretcher
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7885309B2 (en) * 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
WO2007053335A2 (en) * 2005-11-01 2007-05-10 Cymer, Inc. Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US8803027B2 (en) * 2006-06-05 2014-08-12 Cymer, Llc Device and method to create a low divergence, high power laser beam for material processing applications
JP5891504B2 (ja) * 2011-03-08 2016-03-23 株式会社Ｊｏｌｅｄ 薄膜トランジスタアレイ装置の製造方法
KR102369090B1 (ko) 2015-09-15 2022-03-02 삼성디스플레이 주식회사 레이저 장치
KR102744480B1 (ko) 2019-04-12 2024-12-20 삼성디스플레이 주식회사 레이저 장치 및 이를 이용한 표시 장치의 제조 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5122239B2 (enExample) * 1973-08-21 1976-07-08
JPH01319727A (ja) * 1988-06-22 1989-12-26 Sony Corp 光学装置
JPH02166783A (ja) * 1988-12-21 1990-06-27 Adomon Sci Kk エキシマレーザーのホモジナイザー
JPH0990265A (ja) * 1995-09-26 1997-04-04 Asahi Optical Co Ltd 像反転光学系
JPH11283933A (ja) * 1998-01-29 1999-10-15 Toshiba Corp レ―ザ照射装置，非単結晶半導体膜の製造方法及び液晶表示装置の製造方法
JPH11312631A (ja) * 1998-04-27 1999-11-09 Nikon Corp 照明光学装置および露光装置
JP3437088B2 (ja) * 1998-06-04 2003-08-18 住友重機械工業株式会社 ビーム回転機能付ホモジナイザ装置及びこれを用いたレーザ加工装置
US6693939B2 (en) * 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
JP2002139697A (ja) * 2000-11-02 2002-05-17 Mitsubishi Electric Corp 複数レーザビームを用いたレーザ光学系とレーザアニーリング装置
JP2002174767A (ja) * 2000-12-08 2002-06-21 Mitsubishi Electric Corp レーザ処理用のレーザ光学系
US6693930B1 (en) * 2000-12-12 2004-02-17 Kla-Tencor Technologies Corporation Peak power and speckle contrast reduction for a single laser pulse
US7167499B2 (en) * 2001-04-18 2007-01-23 Tcz Pte. Ltd. Very high energy, high stability gas discharge laser surface treatment system
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US20050259709A1 (en) * 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US6928093B2 (en) * 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
US7326948B2 (en) * 2005-08-15 2008-02-05 Asml Netherlands B.V. Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method

Also Published As

Publication number Publication date
EP2036168A2 (en) 2009-03-18
US7433372B2 (en) 2008-10-07
WO2007145791A2 (en) 2007-12-21
WO2007145791A3 (en) 2008-03-13
KR20090015962A (ko) 2009-02-12
US20070279747A1 (en) 2007-12-06
JP2009540567A (ja) 2009-11-19
EP2036168B1 (en) 2019-07-03
EP2036168A4 (en) 2011-07-13
TW200804869A (en) 2008-01-16
KR101389722B1 (ko) 2014-04-29

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