KR101389722B1 - 고출력 펄스 레이저 어플리케이션을 위한 빔 형상 및 대칭도를 안정화시키는 디바이스 및 방법 - Google Patents
고출력 펄스 레이저 어플리케이션을 위한 빔 형상 및 대칭도를 안정화시키는 디바이스 및 방법 Download PDFInfo
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- KR101389722B1 KR101389722B1 KR1020087030013A KR20087030013A KR101389722B1 KR 101389722 B1 KR101389722 B1 KR 101389722B1 KR 1020087030013 A KR1020087030013 A KR 1020087030013A KR 20087030013 A KR20087030013 A KR 20087030013A KR 101389722 B1 KR101389722 B1 KR 101389722B1
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- 238000000034 method Methods 0.000 title description 9
- 230000003287 optical effect Effects 0.000 claims abstract description 13
- 230000003321 amplification Effects 0.000 claims description 2
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 12
- 239000007787 solid Substances 0.000 description 5
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 238000005499 laser crystallization Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005542 laser surface treatment Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0061—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0977—Reflective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Lasers (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/447,380 US7433372B2 (en) | 2006-06-05 | 2006-06-05 | Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications |
| US11/447,380 | 2006-06-05 | ||
| PCT/US2007/012389 WO2007145791A2 (en) | 2006-06-05 | 2007-05-22 | Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20090015962A KR20090015962A (ko) | 2009-02-12 |
| KR101389722B1 true KR101389722B1 (ko) | 2014-04-29 |
Family
ID=38789765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020087030013A Active KR101389722B1 (ko) | 2006-06-05 | 2007-05-22 | 고출력 펄스 레이저 어플리케이션을 위한 빔 형상 및 대칭도를 안정화시키는 디바이스 및 방법 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7433372B2 (enExample) |
| EP (1) | EP2036168B1 (enExample) |
| JP (1) | JP2009540567A (enExample) |
| KR (1) | KR101389722B1 (enExample) |
| TW (1) | TWI344014B (enExample) |
| WO (1) | WO2007145791A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11282872B2 (en) | 2019-04-12 | 2022-03-22 | Samsung Display Co., Ltd. | Laser apparatus and manufacturing method of display apparatus using the same |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7564888B2 (en) * | 2004-05-18 | 2009-07-21 | Cymer, Inc. | High power excimer laser with a pulse stretcher |
| US7778302B2 (en) * | 2005-11-01 | 2010-08-17 | Cymer, Inc. | Laser system |
| US7715459B2 (en) * | 2005-11-01 | 2010-05-11 | Cymer, Inc. | Laser system |
| US7746913B2 (en) | 2005-11-01 | 2010-06-29 | Cymer, Inc. | Laser system |
| EP1952493A4 (en) * | 2005-11-01 | 2017-05-10 | Cymer, LLC | Laser system |
| US7885309B2 (en) * | 2005-11-01 | 2011-02-08 | Cymer, Inc. | Laser system |
| US7630424B2 (en) * | 2005-11-01 | 2009-12-08 | Cymer, Inc. | Laser system |
| US7643529B2 (en) * | 2005-11-01 | 2010-01-05 | Cymer, Inc. | Laser system |
| US20090296755A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| US7999915B2 (en) * | 2005-11-01 | 2011-08-16 | Cymer, Inc. | Laser system |
| US20090296758A1 (en) * | 2005-11-01 | 2009-12-03 | Cymer, Inc. | Laser system |
| US7920616B2 (en) * | 2005-11-01 | 2011-04-05 | Cymer, Inc. | Laser system |
| US8803027B2 (en) * | 2006-06-05 | 2014-08-12 | Cymer, Llc | Device and method to create a low divergence, high power laser beam for material processing applications |
| WO2012120563A1 (ja) * | 2011-03-08 | 2012-09-13 | パナソニック株式会社 | 薄膜トランジスタアレイ装置、有機el表示装置、及び、薄膜トランジスタアレイ装置の製造方法 |
| KR102369090B1 (ko) | 2015-09-15 | 2022-03-02 | 삼성디스플레이 주식회사 | 레이저 장치 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02166783A (ja) * | 1988-12-21 | 1990-06-27 | Adomon Sci Kk | エキシマレーザーのホモジナイザー |
| US20040136417A1 (en) * | 2002-05-07 | 2004-07-15 | Webb R. Kyle | Long delay and high TIS pulse stretcher |
| JP2005502211A (ja) | 2001-08-29 | 2005-01-20 | サイマー インコーポレイテッド | ビームデリバリーを備えたレーザリソグラフィー光源 |
| US20050259709A1 (en) | 2002-05-07 | 2005-11-24 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5122239B2 (enExample) * | 1973-08-21 | 1976-07-08 | ||
| JPH01319727A (ja) * | 1988-06-22 | 1989-12-26 | Sony Corp | 光学装置 |
| JPH0990265A (ja) * | 1995-09-26 | 1997-04-04 | Asahi Optical Co Ltd | 像反転光学系 |
| JPH11283933A (ja) * | 1998-01-29 | 1999-10-15 | Toshiba Corp | レ―ザ照射装置,非単結晶半導体膜の製造方法及び液晶表示装置の製造方法 |
| JPH11312631A (ja) * | 1998-04-27 | 1999-11-09 | Nikon Corp | 照明光学装置および露光装置 |
| JP3437088B2 (ja) * | 1998-06-04 | 2003-08-18 | 住友重機械工業株式会社 | ビーム回転機能付ホモジナイザ装置及びこれを用いたレーザ加工装置 |
| JP2002139697A (ja) * | 2000-11-02 | 2002-05-17 | Mitsubishi Electric Corp | 複数レーザビームを用いたレーザ光学系とレーザアニーリング装置 |
| JP2002174767A (ja) * | 2000-12-08 | 2002-06-21 | Mitsubishi Electric Corp | レーザ処理用のレーザ光学系 |
| US6693930B1 (en) * | 2000-12-12 | 2004-02-17 | Kla-Tencor Technologies Corporation | Peak power and speckle contrast reduction for a single laser pulse |
| US7009140B2 (en) | 2001-04-18 | 2006-03-07 | Cymer, Inc. | Laser thin film poly-silicon annealing optical system |
| US7167499B2 (en) | 2001-04-18 | 2007-01-23 | Tcz Pte. Ltd. | Very high energy, high stability gas discharge laser surface treatment system |
| US7326948B2 (en) * | 2005-08-15 | 2008-02-05 | Asml Netherlands B.V. | Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method |
-
2006
- 2006-06-05 US US11/447,380 patent/US7433372B2/en active Active
-
2007
- 2007-05-14 TW TW096117040A patent/TWI344014B/zh active
- 2007-05-22 JP JP2009514300A patent/JP2009540567A/ja active Pending
- 2007-05-22 WO PCT/US2007/012389 patent/WO2007145791A2/en not_active Ceased
- 2007-05-22 KR KR1020087030013A patent/KR101389722B1/ko active Active
- 2007-05-22 EP EP07809174.1A patent/EP2036168B1/en not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02166783A (ja) * | 1988-12-21 | 1990-06-27 | Adomon Sci Kk | エキシマレーザーのホモジナイザー |
| JP2005502211A (ja) | 2001-08-29 | 2005-01-20 | サイマー インコーポレイテッド | ビームデリバリーを備えたレーザリソグラフィー光源 |
| US20040136417A1 (en) * | 2002-05-07 | 2004-07-15 | Webb R. Kyle | Long delay and high TIS pulse stretcher |
| US20050259709A1 (en) | 2002-05-07 | 2005-11-24 | Cymer, Inc. | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11282872B2 (en) | 2019-04-12 | 2022-03-22 | Samsung Display Co., Ltd. | Laser apparatus and manufacturing method of display apparatus using the same |
| US11961851B2 (en) | 2019-04-12 | 2024-04-16 | Samsung Display Co., Ltd. | Laser apparatus and manufacturing method of display apparatus using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200804869A (en) | 2008-01-16 |
| US7433372B2 (en) | 2008-10-07 |
| JP2009540567A (ja) | 2009-11-19 |
| KR20090015962A (ko) | 2009-02-12 |
| EP2036168A2 (en) | 2009-03-18 |
| EP2036168A4 (en) | 2011-07-13 |
| US20070279747A1 (en) | 2007-12-06 |
| TWI344014B (en) | 2011-06-21 |
| WO2007145791A2 (en) | 2007-12-21 |
| EP2036168B1 (en) | 2019-07-03 |
| WO2007145791A3 (en) | 2008-03-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20081209 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20120516 Comment text: Request for Examination of Application |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20130725 Patent event code: PE09021S01D |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20140128 |
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| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20140422 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
Payment date: 20140423 End annual number: 3 Start annual number: 1 |
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