JP2009524110A5 - - Google Patents
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- Publication number
- JP2009524110A5 JP2009524110A5 JP2008551287A JP2008551287A JP2009524110A5 JP 2009524110 A5 JP2009524110 A5 JP 2009524110A5 JP 2008551287 A JP2008551287 A JP 2008551287A JP 2008551287 A JP2008551287 A JP 2008551287A JP 2009524110 A5 JP2009524110 A5 JP 2009524110A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- weight
- carbon atoms
- imaged
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004432 carbon atom Chemical group C* 0.000 claims 7
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 239000001257 hydrogen Substances 0.000 claims 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 4
- 239000000178 monomer Substances 0.000 claims 4
- 229920005596 polymer binder Polymers 0.000 claims 3
- 239000002491 polymer binding agent Substances 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 2
- 239000011230 binding agent Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- -1 oxy, carbonyl Chemical group 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 238000001931 thermography Methods 0.000 claims 2
- 239000004925 Acrylic resin Substances 0.000 claims 1
- 229920000178 Acrylic resin Polymers 0.000 claims 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 claims 1
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 150000001408 amides Chemical class 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 125000002993 cycloalkylene group Chemical group 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 claims 1
- 125000004149 thio group Chemical group *S* 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/337,778 US7163770B1 (en) | 2006-01-23 | 2006-01-23 | Multilayer imageable element containing sulfonamido resin |
| US11/337,778 | 2006-01-23 | ||
| PCT/US2007/000515 WO2007087162A2 (en) | 2006-01-23 | 2007-01-09 | Multilayer imageable element containing sulfonamido resin |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009524110A JP2009524110A (ja) | 2009-06-25 |
| JP2009524110A5 true JP2009524110A5 (enExample) | 2010-02-18 |
| JP4938798B2 JP4938798B2 (ja) | 2012-05-23 |
Family
ID=37648742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008551287A Expired - Fee Related JP4938798B2 (ja) | 2006-01-23 | 2007-01-09 | スルホンアミド樹脂を含有する多層画像形成性要素 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7163770B1 (enExample) |
| EP (1) | EP1984180B1 (enExample) |
| JP (1) | JP4938798B2 (enExample) |
| CN (1) | CN101370659B (enExample) |
| DE (1) | DE602007013703D1 (enExample) |
| WO (1) | WO2007087162A2 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7824840B2 (en) * | 2007-08-10 | 2010-11-02 | Eastman Kodak Company | Multi-layer imageable element with improved properties |
| US8323874B2 (en) * | 2008-01-22 | 2012-12-04 | Eastman Kodak Company | Method of making lithographic printing plates |
| EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| CN101770170B (zh) * | 2008-12-30 | 2012-03-21 | 乐凯集团第二胶片厂 | 适合于热敏阳图ctp的感光组合物及含该组合物的平印版 |
| US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
| EP2284005B1 (en) | 2009-08-10 | 2012-05-02 | Eastman Kodak Company | Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers |
| US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
| EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
| US20110097666A1 (en) | 2009-10-27 | 2011-04-28 | Celin Savariar-Hauck | Lithographic printing plate precursors |
| US8936899B2 (en) | 2012-09-04 | 2015-01-20 | Eastman Kodak Company | Positive-working lithographic printing plate precursors and use |
| US8828648B2 (en) | 2010-02-17 | 2014-09-09 | Fujifilm Corporation | Method for producing a planographic printing plate |
| US20110236832A1 (en) | 2010-03-26 | 2011-09-29 | Celin Savariar-Hauck | Lithographic processing solutions and methods of use |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| CN103309159B (zh) * | 2012-03-08 | 2015-06-17 | 中国科学院理化技术研究所 | 基于乙烯基吡咯烷酮共聚物树脂的阳离子光聚合型平版印刷版材料 |
| US20130255515A1 (en) | 2012-03-27 | 2013-10-03 | Celin Savariar-Hauck | Positive-working lithographic printing plate precursors |
| CN103365090B (zh) * | 2012-03-28 | 2015-06-17 | 中国科学院理化技术研究所 | 基于乙烯吡咯烷酮共聚物树脂的阳离子-自由基混杂光聚合型平版印刷版材料 |
| CN103365086B (zh) * | 2012-03-28 | 2015-06-17 | 中国科学院理化技术研究所 | 基于乙烯吡咯烷酮共聚物树脂的阳离子-自由基混杂光聚合的成像组合物 |
| EP2869123A4 (en) | 2012-06-29 | 2016-03-09 | Eastman Kodak Co | DEVELOPMENT SOLUTION COMPOSITION FOR LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE |
| CN106094438B (zh) * | 2016-08-24 | 2020-03-13 | 辽宁靖帆新材料有限公司 | 一种可烤版的丙烯酸成膜树脂及由其制成的阳图热敏ctp版 |
| CN106292183A (zh) * | 2016-08-24 | 2017-01-04 | 青岛蓝帆新材料有限公司 | 一种阳图热敏平版印刷版版材 |
| CN112103509B (zh) * | 2020-08-20 | 2023-06-06 | 欣旺达电动汽车电池有限公司 | 正极集流体、正极片、锂离子电池及电池模组 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3779444B2 (ja) | 1997-07-28 | 2006-05-31 | 富士写真フイルム株式会社 | 赤外線レーザ用ポジ型感光性組成物 |
| DE69815622T2 (de) * | 1997-10-17 | 2004-04-29 | Fuji Photo Film Co., Ltd., Fujinomiya | Positiv arbeitendes photoempfindliches Aufzeichnungsmaterial für Infrarotlaser |
| US6152036A (en) | 1998-05-28 | 2000-11-28 | Agfa-Gevaert, N.V. | Heat mode sensitive imaging element for making positive working printing plates |
| US6352812B1 (en) | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6352811B1 (en) | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6358669B1 (en) | 1998-06-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| EP1354701B1 (en) * | 1998-08-24 | 2006-03-01 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition and planographic printing plate using the same |
| JP3660505B2 (ja) * | 1998-08-24 | 2005-06-15 | 富士写真フイルム株式会社 | 画像記録材料および平版印刷用原版 |
| JP2000330265A (ja) | 1999-05-24 | 2000-11-30 | Fuji Photo Film Co Ltd | 画像形成材料 |
| US6528228B2 (en) | 1999-12-22 | 2003-03-04 | Kodak Polychrome Graphics, Llc | Chemical resistant underlayer for positive-working printing plates |
| US6294311B1 (en) | 1999-12-22 | 2001-09-25 | Kodak Polychrome Graphics Llc | Lithographic printing plate having high chemical resistance |
| US6593055B2 (en) | 2001-09-05 | 2003-07-15 | Kodak Polychrome Graphics Llc | Multi-layer thermally imageable element |
| JP4090307B2 (ja) * | 2002-08-22 | 2008-05-28 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| US6858359B2 (en) | 2002-10-04 | 2005-02-22 | Kodak Polychrome Graphics, Llp | Thermally sensitive, multilayer imageable element |
| EP1433594B1 (en) | 2002-12-27 | 2008-04-09 | FUJIFILM Corporation | Heat-sensitive lithographic printing plate precursor |
| US7425402B2 (en) | 2003-08-13 | 2008-09-16 | Agfa Graphics, N.V. | Heat-sensitive lithographic printing plate precursor |
| JP2005107112A (ja) * | 2003-09-30 | 2005-04-21 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US6969570B1 (en) | 2004-10-26 | 2005-11-29 | Kodak Polychrome Graphics, Llc | Solvent resistant imageable element |
| US7160653B1 (en) * | 2005-10-25 | 2007-01-09 | Eastman Kodak Company | Multilayer imageable element containing epoxy resin |
-
2006
- 2006-01-23 US US11/337,778 patent/US7163770B1/en not_active Expired - Fee Related
- 2006-10-23 US US11/551,753 patent/US7241556B1/en not_active Expired - Fee Related
-
2007
- 2007-01-09 DE DE602007013703T patent/DE602007013703D1/de active Active
- 2007-01-09 CN CN2007800029099A patent/CN101370659B/zh not_active Expired - Fee Related
- 2007-01-09 WO PCT/US2007/000515 patent/WO2007087162A2/en not_active Ceased
- 2007-01-09 JP JP2008551287A patent/JP4938798B2/ja not_active Expired - Fee Related
- 2007-01-09 EP EP07716446A patent/EP1984180B1/en not_active Not-in-force
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