JP2009512197A - 改良された薄膜ソーラーセル相互接続を形成するシステム及び方法 - Google Patents
改良された薄膜ソーラーセル相互接続を形成するシステム及び方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 85
- 239000010409 thin film Substances 0.000 title claims description 22
- 230000008569 process Effects 0.000 claims abstract description 39
- 239000012212 insulator Substances 0.000 claims abstract description 36
- 238000005520 cutting process Methods 0.000 claims abstract description 8
- 238000000151 deposition Methods 0.000 claims description 42
- 239000004020 conductor Substances 0.000 claims description 38
- 238000012545 processing Methods 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 238000009413 insulation Methods 0.000 claims description 2
- 230000008021 deposition Effects 0.000 abstract description 33
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 description 20
- 239000011521 glass Substances 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 229920000642 polymer Polymers 0.000 description 10
- 239000000835 fiber Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000003071 parasitic effect Effects 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- -1 CIGS Substances 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
- H01L31/0463—PV modules composed of a plurality of thin film solar cells deposited on the same substrate characterised by special patterning methods to connect the PV cells in a module, e.g. laser cutting of the conductive or active layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
- H01L31/0465—PV modules composed of a plurality of thin film solar cells deposited on the same substrate comprising particular structures for the electrical interconnection of adjacent PV cells in the module
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Abstract
【選択図】 図1
Description
Claims (20)
- 薄膜ソーラーセルのための相互接続を形成する方法において、
上記セルの活性層及び導電層のスタックを単一処理シーケンスで堆積するステップと、
上記相互接続を形成するステップと、
を備えた方法。 - 上記形成するステップは、上記スタックに2つ以上のカットを形成する段階を含み、上記カットのうちの少なくとも1つは、上記スタックを完全に通して下層絶縁体へと達している、請求項1に記載の方法。
- 上記形成するステップは、上記少なくとも1つのカットに隣接し、上記活性層を通して切られ、上記下層絶縁体に導電性レッジを露出させる別のカットを形成する段階を含む、請求項2に記載の方法。
- 上記カットのうちの少なくとも1つを形成するためにレーザーが使用される、請求項2に記載の方法。
- 上記カットのうちの少なくとも1つを形成するために機械的スクライブが使用される、請求項2に記載の方法。
- 上記形成するステップは、上記カットの領域に、絶縁体を堆積し、その後、導体を堆積する段階を更に含む、請求項2に記載の方法。
- 上記形成するステップは、上記カットの領域に、絶縁体を堆積し、その後、導体を堆積する段階を更に含む、請求項3に記載の方法。
- 上記形成するステップは、インクジェット処理を使用して上記相互接続の少なくとも1つの層を形成する段階を含む、請求項1に記載の方法。
- 上記相互接続の接触抵抗を改善するために、上記スタックの上部に付加的な層が堆積される、請求項1に記載の方法。
- 上記絶縁体は、感光性物質である、請求項6に記載の方法。
- 上記絶縁体は、感光性物質である、請求項7に記載の方法。
- 前記絶縁体は、上記スタックが堆積されている基板を通して自己整合形式で露光される、請求項10に記載の方法。
- 上記絶縁体は、上記スタックが堆積されている基板を通して自己整合形式で露光される、請求項11に記載の方法。
- 上記処理シーケンスは、真空内である、請求項1に記載の方法。
- 上記相互接続を形成するステップは、上記活性層を堆積するための上記単一処理シーケンスとは独立した処理で導電性層を堆積する段階を含む、請求項1に記載の方法。
- 上記別に堆積される導電性層は、不透明である、請求項15に記載の方法。
- 上記導電性層は、光導体上に被覆される、請求項16に記載の方法。
- 上記形成するステップは、上記スタックを通してカットを形成する段階を含み、上記カットの第1部分は、上記スタックを完全に通して下層絶縁体まで達し、上記カットの第2部分は、上記活性層を通していて、上記下層絶縁体に導電性レッジを形成している、請求項1に記載の方法。
- レーザーにより行われる上記カットは、上記下層絶縁体の切除により、上記活性層の少なくとも一部分に当接する上記セルの側壁部に絶縁被覆が与えられるようにする、請求項4に記載の方法。
- 上記カットは、レーザーによって行われ、上記下層絶縁体の切除により、上記活性層の少なくとも一部分に当接する上記セルの側壁部に絶縁被覆が与えられるようにする、請求項18に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/245,620 US20070079866A1 (en) | 2005-10-07 | 2005-10-07 | System and method for making an improved thin film solar cell interconnect |
PCT/US2006/039212 WO2007044555A2 (en) | 2005-10-07 | 2006-10-06 | System and method for making an improved thin film solar cell interconnect |
Publications (2)
Publication Number | Publication Date |
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JP2009512197A true JP2009512197A (ja) | 2009-03-19 |
JP2009512197A5 JP2009512197A5 (ja) | 2009-11-19 |
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Application Number | Title | Priority Date | Filing Date |
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JP2008534728A Pending JP2009512197A (ja) | 2005-10-07 | 2006-10-06 | 改良された薄膜ソーラーセル相互接続を形成するシステム及び方法 |
Country Status (7)
Country | Link |
---|---|
US (3) | US20070079866A1 (ja) |
EP (1) | EP1946434A2 (ja) |
JP (1) | JP2009512197A (ja) |
KR (1) | KR20080069597A (ja) |
CN (1) | CN101496273A (ja) |
AU (1) | AU2006302366A1 (ja) |
WO (1) | WO2007044555A2 (ja) |
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JP2013026339A (ja) * | 2011-07-19 | 2013-02-04 | Fujifilm Corp | 薄膜太陽電池およびその製造方法 |
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JP2015513230A (ja) * | 2012-04-12 | 2015-04-30 | ローベルト ボツシユ ゲゼルシヤフト ミツト ベシユレンクテル ハフツングRobert Bosch Gmbh | 光起電力による薄膜ソーラモジュールならびに該薄膜ソーラモジュールの製造方法 |
JP2015516110A (ja) * | 2012-05-03 | 2015-06-04 | ネクシスNexcis | 光電池セルの接続のための薄層スタックのレーザエッチング |
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Also Published As
Publication number | Publication date |
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US20070079866A1 (en) | 2007-04-12 |
US20090014052A1 (en) | 2009-01-15 |
US20090007957A1 (en) | 2009-01-08 |
AU2006302366A1 (en) | 2007-04-19 |
EP1946434A2 (en) | 2008-07-23 |
KR20080069597A (ko) | 2008-07-28 |
CN101496273A (zh) | 2009-07-29 |
WO2007044555A2 (en) | 2007-04-19 |
WO2007044555A3 (en) | 2009-04-23 |
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