JP2009510526A - モデルを基にしたsrafの挿入 - Google Patents
モデルを基にしたsrafの挿入 Download PDFInfo
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- JP2009510526A JP2009510526A JP2008533555A JP2008533555A JP2009510526A JP 2009510526 A JP2009510526 A JP 2009510526A JP 2008533555 A JP2008533555 A JP 2008533555A JP 2008533555 A JP2008533555 A JP 2008533555A JP 2009510526 A JP2009510526 A JP 2009510526A
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- 230000037431 insertion Effects 0.000 title 1
- 238000003780 insertion Methods 0.000 title 1
- 238000000034 method Methods 0.000 claims abstract description 33
- 239000004065 semiconductor Substances 0.000 claims abstract description 14
- 238000000206 photolithography Methods 0.000 claims abstract description 6
- 238000004458 analytical method Methods 0.000 claims description 19
- 238000012545 processing Methods 0.000 abstract description 6
- 238000002360 preparation method Methods 0.000 abstract description 2
- 230000003287 optical effect Effects 0.000 description 5
- 230000006870 function Effects 0.000 description 4
- 238000005286 illumination Methods 0.000 description 3
- 238000004422 calculation algorithm Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000004590 computer program Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
Description
Claims (12)
- 半導体ウェハ上に特徴のパターンを作成するフォトリソグラフィの印刷システムにおいて使用するマスクのレイアウトデータを準備する方法であって、
該半導体ウェハ上に印刷される特徴のパターンを定義する標的のレイアウトデータを受信することと、
半導体ウェハ上に該特徴のパターンを作り出す最適化されたマスクのレイアウトパターンを決定することであって、該最適化されたマスクのレイアウトパターンは、印刷特徴に関するデータと多数の非印刷特徴に関するデータとを含む、ことと、
1つ以上の非印刷特徴を近似する、該マスクのレイアウトデータ内の1つ以上の準解像度の補助特徴を定義することと、
該マスクのレイアウトデータを作成するために、該準解像度の補助特徴に関するデータと、該印刷特徴に関するデータとを組み合わせることと
を包含する、方法。 - 前記非印刷特徴を近似する前記準解像度の補助特徴は、
前記最適化されたマスクのレイアウトパターン内の非印刷特徴に重なる、前記マスクのレイアウトデータ内の1つ以上の多角形を定義すること
によって定義される、請求項1に記載の方法。 - 前記最適化されたマスクのレイアウトパターンの一部分にわたって解析窓をステップし、該解析窓が非印刷特徴の±に配置されているかを決定することによって、前記マスクのレイアウトデータ内の前記多角形は定義され、該解析窓と非印刷特徴とが所定の量だけ重なる場合には、該解析窓の形状を有する多角形は、該マスクのレイアウトデータ内に定義される、請求項2に記載の方法。
- 前記マスクのレイアウトデータ内の重なっている多角形は、該重なっている多角形の外縁と等しい周囲を有する単一の多角形として定義され、準解像度の補助特徴を定義する、請求項1に記載の方法。
- 準解像度の補助特徴を定義する、前記マスクのレイアウトデータ内の前記多角形のサイズを調節し、該多角形が前記半導体ウェハ上に印刷しないということを確実にすることをさらに包含する、請求項4に記載の方法。
- 前記最適化されたマスクのレイアウトパターンは、
前記標的のレイアウトパターンのフーリエ変換の近似を計算すること
によって決定される、請求項1に記載の方法。 - 前記最適化されたマスクのレイアウトパターンは、
デコンボリューションを計算すること
によって決定される、請求項1に記載の方法。 - 前記最適化されたマスクのレイアウトパターンは、
デコンボリューションの逆フーリエ変換を計算すること
によってさらに決定される、請求項6に記載の方法。 - 前記最適化されたマスクのレイアウトパターンは、
前記標的のレイアウトデータを多数の画素に分割することと、
目的関数を決定することと、
前記標的のマスクのデータにおける画素の値を体系的に変更することと、
該目的関数の結果を改善する、該画素の値に関する変更を維持することと
によって決定される、請求項1に記載の方法。 - デコンボリューションによって解析的に前記目的関数の勾配を計算すること
をさらに包含する、請求項9に記載の方法。 - 一連のプログラム命令を含むコンピュータ読取り可能な媒体であって、該一連の命令は、コンピュータによって実行されると、
半導体ウェハ上に印刷される特徴のパターンを定義する標的のレイアウトデータを受信することと、
該半導体ウェハ上に該特徴のパターンを作り出す最適化されたマスクのレイアウトパターンを決定することであって、該最適化されたマスクのレイアウトパターンは、印刷特徴に関するデータと多数の非印刷特徴に関するデータとを含む、ことと、
1つ以上の非印刷特徴を近似する、該マスクのレイアウトデータ内の1つ以上の準解像度の補助特徴を定義することと、
該マスクのレイアウトデータを作成するために、該準解像度の補助特徴に関するデータと、該印刷特徴に関するデータとを組み合わせることと
を包含する方法を行う、コンピュータ読取り可能な媒体。 - 半導体ウェハ上に特徴の標的のパターンを作成するマスクであって、該マスクは、
作成される特徴のパターンに対応する、該マスク上に印刷された多数の多角形と、
該特徴の標的のパターンを印刷するために計算された最適化されたマスクのレイアウトパターンの非印刷特徴を近似する多数の準解像度の補助特徴と
を含む、マスク。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/241,732 US8037429B2 (en) | 2005-03-02 | 2005-09-30 | Model-based SRAF insertion |
PCT/US2006/037603 WO2007041135A1 (en) | 2005-09-30 | 2006-09-25 | Model-based sraf insertion |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2009510526A true JP2009510526A (ja) | 2009-03-12 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2008533555A Ceased JP2009510526A (ja) | 2005-09-30 | 2006-09-25 | モデルを基にしたsrafの挿入 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8037429B2 (ja) |
EP (2) | EP2357528B1 (ja) |
JP (1) | JP2009510526A (ja) |
TW (1) | TWI364679B (ja) |
WO (1) | WO2007041135A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012098397A (ja) * | 2010-10-29 | 2012-05-24 | Canon Inc | マスクのデータを作成するためのプログラム |
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WO2007041135A1 (en) | 2007-04-12 |
EP2357528A1 (en) | 2011-08-17 |
TWI364679B (en) | 2012-05-21 |
EP2357528B1 (en) | 2012-12-12 |
US20060200790A1 (en) | 2006-09-07 |
US8037429B2 (en) | 2011-10-11 |
TW200809558A (en) | 2008-02-16 |
EP1932058A1 (en) | 2008-06-18 |
EP1932058B1 (en) | 2012-11-14 |
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