JP2009510321A - ガスをポンピングする方法 - Google Patents
ガスをポンピングする方法 Download PDFInfo
- Publication number
- JP2009510321A JP2009510321A JP2008532854A JP2008532854A JP2009510321A JP 2009510321 A JP2009510321 A JP 2009510321A JP 2008532854 A JP2008532854 A JP 2008532854A JP 2008532854 A JP2008532854 A JP 2008532854A JP 2009510321 A JP2009510321 A JP 2009510321A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- gas
- pump
- intake
- slm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims abstract description 188
- 238000010926 purge Methods 0.000 claims abstract description 77
- 238000005086 pumping Methods 0.000 claims abstract description 68
- 238000000034 method Methods 0.000 claims abstract description 37
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 17
- 230000005494 condensation Effects 0.000 claims abstract description 12
- 238000009833 condensation Methods 0.000 claims abstract description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 24
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 14
- 239000001257 hydrogen Substances 0.000 abstract description 14
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 14
- 239000013626 chemical specie Substances 0.000 abstract description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 19
- 229910052698 phosphorus Inorganic materials 0.000 description 19
- 239000011574 phosphorus Substances 0.000 description 19
- 238000005137 deposition process Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000006835 compression Effects 0.000 description 4
- 238000007906 compression Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 210000000078 claw Anatomy 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- -1 polysiloxanes Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 1
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
- F04C29/0092—Removing solid or liquid contaminants from the gas under pumping, e.g. by filtering or deposition; Purging; Scrubbing; Cleaning
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/123—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially or approximately radially from the rotor body extending tooth-like elements, co-operating with recesses in the other rotor, e.g. one tooth
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/126—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially from the rotor body extending elements, not necessarily co-operating with corresponding recesses in the other rotor, e.g. lobes, Roots type
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2280/00—Arrangements for preventing or removing deposits or corrosion
- F04C2280/02—Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0519742.1A GB0519742D0 (en) | 2005-09-28 | 2005-09-28 | Method of pumping gas |
| PCT/GB2006/003286 WO2007036689A1 (en) | 2005-09-28 | 2006-09-06 | Method of pumping gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009510321A true JP2009510321A (ja) | 2009-03-12 |
| JP2009510321A5 JP2009510321A5 (enExample) | 2009-10-01 |
Family
ID=35394887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008532854A Pending JP2009510321A (ja) | 2005-09-28 | 2006-09-06 | ガスをポンピングする方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20090269231A1 (enExample) |
| EP (1) | EP1931880A1 (enExample) |
| JP (1) | JP2009510321A (enExample) |
| KR (1) | KR20080049788A (enExample) |
| GB (1) | GB0519742D0 (enExample) |
| WO (1) | WO2007036689A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023103911A (ja) * | 2022-01-14 | 2023-07-27 | 三菱重工業株式会社 | 放射性物質収納容器の乾燥装置および方法 |
| JP2024506811A (ja) * | 2021-01-25 | 2024-02-15 | ファイファー バキユーム | 乾式真空ポンプ式の真空ポンプおよび吸排気ユニット |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5481019B2 (ja) * | 2007-06-05 | 2014-04-23 | エドワーズ株式会社 | 真空ポンプ配管構造とその真空ポンプ配管の洗浄方法 |
| GB0719394D0 (en) * | 2007-10-04 | 2007-11-14 | Edwards Ltd | A multi stage clam shell vacuum pump |
| JP5102068B2 (ja) * | 2008-02-29 | 2012-12-19 | 株式会社荏原製作所 | 多段真空ポンプ |
| GB0922564D0 (en) * | 2009-12-24 | 2010-02-10 | Edwards Ltd | Pump |
| JP5908922B2 (ja) * | 2010-12-10 | 2016-04-26 | アテリエ ビスク ソシエテ アノニムAtelier Busch SA | 真空包装機に応用する真空ポンプ |
| GB2500610A (en) | 2012-03-26 | 2013-10-02 | Edwards Ltd | Apparatus to supply purge gas to a multistage vacuum pump |
| GB2535703B (en) * | 2015-02-23 | 2019-09-18 | Edwards Ltd | Gas supply apparatus |
| DE202017003212U1 (de) * | 2017-06-17 | 2018-09-18 | Leybold Gmbh | Mehrstufige Wälzkolbenpumpe |
| FR3092879B1 (fr) * | 2019-02-14 | 2021-02-19 | Pfeiffer Vacuum | Pompe à vide primaire de type sèche |
| GB2590663B (en) * | 2019-12-23 | 2022-06-29 | Edwards S R O | Vacuum pump |
| GB2608381A (en) * | 2021-06-29 | 2023-01-04 | Edwards Korea Ltd | Stator assembly for a roots vacuum pump |
| GB2621854A (en) * | 2022-08-24 | 2024-02-28 | Edwards Korea Ltd | Apparatus and method for delivering purge gas to a vacuum pump |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01177486A (ja) * | 1987-12-28 | 1989-07-13 | Ebara Corp | 真空ポンプ |
| JPH02294589A (ja) * | 1989-05-10 | 1990-12-05 | Unozawagumi Tekkosho:Kk | ガス希釈をともなう逆流冷却式多段ロータリー形真空ポンプ |
| JPH0727089A (ja) * | 1993-07-07 | 1995-01-27 | Osaka Shinku Kiki Seisakusho:Kk | 真空ポンプ装置 |
| JPH10209058A (ja) * | 1997-12-17 | 1998-08-07 | Furukawa Electric Co Ltd:The | 有機金属気相成長装置 |
| JP2003129978A (ja) * | 2001-10-24 | 2003-05-08 | Aisin Seiki Co Ltd | 多段真空ポンプ |
| WO2004083643A1 (en) * | 2003-03-19 | 2004-09-30 | Ebara Corporation | Positive-displacement vacuum pump |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8809621D0 (en) * | 1988-04-22 | 1988-05-25 | Boc Group Plc | Dry pump with closed loop filter |
| EP0365695B1 (de) * | 1988-10-24 | 1992-11-25 | Leybold Aktiengesellschaft | Zweiwellenvakuumpumpe mit Schöpfraum |
| EP0574442B1 (de) * | 1991-03-04 | 1994-08-17 | Leybold Aktiengesellschaft | Einrichtung zur inertgasversorgung einer mehrstufigen trockenlaufenden vakuumpumpe |
| FR2691382B1 (fr) * | 1992-05-22 | 1994-09-09 | Cit Alcatel | Installation de pompage pour pomper une enceinte contenant des gaz mélangés à des particules solides ou susceptibles de générer des particules ou condensats solides. |
| JP2001304115A (ja) * | 2000-04-26 | 2001-10-31 | Toyota Industries Corp | 真空ポンプにおけるガス供給装置 |
| JP4232505B2 (ja) * | 2003-03-27 | 2009-03-04 | アイシン精機株式会社 | 真空ポンプ |
-
2005
- 2005-09-28 GB GBGB0519742.1A patent/GB0519742D0/en active Pending
-
2006
- 2006-09-06 US US11/992,454 patent/US20090269231A1/en not_active Abandoned
- 2006-09-06 EP EP06779305A patent/EP1931880A1/en not_active Withdrawn
- 2006-09-06 KR KR1020087007439A patent/KR20080049788A/ko not_active Ceased
- 2006-09-06 JP JP2008532854A patent/JP2009510321A/ja active Pending
- 2006-09-06 WO PCT/GB2006/003286 patent/WO2007036689A1/en not_active Ceased
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01177486A (ja) * | 1987-12-28 | 1989-07-13 | Ebara Corp | 真空ポンプ |
| JPH02294589A (ja) * | 1989-05-10 | 1990-12-05 | Unozawagumi Tekkosho:Kk | ガス希釈をともなう逆流冷却式多段ロータリー形真空ポンプ |
| JPH0727089A (ja) * | 1993-07-07 | 1995-01-27 | Osaka Shinku Kiki Seisakusho:Kk | 真空ポンプ装置 |
| JPH10209058A (ja) * | 1997-12-17 | 1998-08-07 | Furukawa Electric Co Ltd:The | 有機金属気相成長装置 |
| JP2003129978A (ja) * | 2001-10-24 | 2003-05-08 | Aisin Seiki Co Ltd | 多段真空ポンプ |
| WO2004083643A1 (en) * | 2003-03-19 | 2004-09-30 | Ebara Corporation | Positive-displacement vacuum pump |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024506811A (ja) * | 2021-01-25 | 2024-02-15 | ファイファー バキユーム | 乾式真空ポンプ式の真空ポンプおよび吸排気ユニット |
| JP2023103911A (ja) * | 2022-01-14 | 2023-07-27 | 三菱重工業株式会社 | 放射性物質収納容器の乾燥装置および方法 |
| JP7692374B2 (ja) | 2022-01-14 | 2025-06-13 | 三菱重工業株式会社 | 放射性物質収納容器の乾燥装置および方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1931880A1 (en) | 2008-06-18 |
| GB0519742D0 (en) | 2005-11-09 |
| WO2007036689A1 (en) | 2007-04-05 |
| US20090269231A1 (en) | 2009-10-29 |
| KR20080049788A (ko) | 2008-06-04 |
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